THIN FILM MATERIALS TECHNOLOGY

Size: px
Start display at page:

Download "THIN FILM MATERIALS TECHNOLOGY"

Transcription

1 THIN FILM MATERIALS TECHNOLOGY Sputtering of Compound Materials by Kiyotaka Wasa Yokohama City University Yokohama, Japan Makoto Kitabatake Matsushita Electric Industrial Co., Ltd. Kyoto, Japan Hideaki Adachi Matsushita Electric Industrial Co., Ltd. Kyoto, Japan YMam Andrew publishing Springer

2 Table of Contents 1 Thin Film Materials and Devices THIN FILM MATERIALS THIN FILM DEVICES 10 REFERENCES 14 2 Thin Film Processes THIN FILM GROWTH PROCESS Structural Consequences of the Growth Process Microstructure Surface Roughness and Density Adhesion Metastable Structure Solubility Relaxation THIN FILM DEPOSITION PROCESS Classification of Deposition Processes PVD Processes CVD Processes Deposition Conditions CHARACTERIZATION.' 60 REFERENCES 66 3 Sputtering Phenomena SPUTTER YIELD Ion Energy Incident Ions, Target Materials Effects of Incidence Angle 79 XI

3 aw Contents Crystal Structure of Target Sputter Yields of Alloys SPUTTERED ATOMS Features of Sputtered Atoms Velocity and Mean Free Path Velocity of Sputtered Atoms MeanFreePath MECHANISMS OF SPUTTERING Sputtering Collisions Sputtering Classical Empirical Formula of Sputtering Yield Linear Cascade Collision Theory Simplified Model and Modern Yield Formula 109 REFERENCES Ill 4 Sputtering Systems DISCHARGE IN A GAS Cold Cathode Discharge Discharge in a Magnetic Field Spark Voltage in a Magnetic Field Glow Discharge in a Magnetic Field Glow Discharge Modes in a Transverse Magnetic Field Plasma in a Glow Discharge SPUTTERING SYSTEMS DC Diode Sputtering RF Diode Sputtering Magnetron Sputtering Ion Beam Sputtering ECRPlasma Medium-Frequency Sputtering PRACTICAL ASPECTS OF SPUTTERING SYSTEMS Targets for Sputtering Compound Targets Powder Targets Auxiliary Cathode Sputtering Gas Thickness Distribution Substrate Temperature Off-Axis Sputtering; Facing-Target Sputtering Monitoring ' Gas Composition 177

4 Contents xiii Sputtering Discharge Plasma Parameters Substrate Temperature Monitoring Thickness Monitoring Film Structure 185 REFERENCES 187 Deposition of Compound Thin Films OXIDES ZnO Thin Films Deposition of ZnO Electrical Properties and Applications Sillenite Thin Films Amorphous/Polycrystalline Films Single-Crystal Films Perovskite Dielectric Thin Films PbTiO 3 Thin Films PLZTThinFilms Perovskite Superconducting Thin Films Studies of Thin Film Processes Basic Thin Film Processes Synthesis Temperature Low-Temperature Processes, In-Situ Deposition Deposition of Rare-Earth, High~r c Superconductors Deposition of Rare-Earth-Free, High-r c Superconductors Structure and Structural Control Phase Control by Layer-by-Layer Deposition DiamagnetizationProperties Passivation of Sputtered High-r c Thin Films Multilayers and Superconducting Devices Transparent Conducting Films NITRIDES TiN Thin Films Compound Nitride Thin Films Si-N Thin Films.' CARBIDES AND SILICIDES SiC Thin Films Tungsten Carbide Thin Films Mo-Si Thin Films DIAMOND SELENIDES AMORPHOUS THIN FILMS 368

5 xiv Contents Amorphous ABO Amorphous SiC SUPERLATTICE STRUCTURES ORGANIC THIN FILMS MAGNETRON SPUTTERING UNDER A STRONG MAGNETIC FIELD Abnormal Crystal Growth Low-Temperature Doping of Foreign Atoms into Semiconducting Films 382 REFERENCES Structural Control of Compound Thin Films: Perovskite and Nanometer Oxide Thin Films FERROELECTRIC MATERIALS AND STRUCTURES Ferroelectric Materials Microstructure of Heteroepitaxial Thin Films CONTROL OF STRUCTURE Growth Temperature Buffer Layers and Graded Interfaces Cooling Rate Vicinal Substrates Dielectric Properties of Structure-Controlled Thin Films NANOMETER STRUCTURE Nanometer Materials Nanometer Superlattice INTERFACIAL CONTROL 455 REFERENCES Microfabrication by Sputtering CLASSIFICATION OF SPUTTER ETCHING ION-BEAM SPUTTER ETCHING DIODE SPUTTER ETCHING DEPOSITION INTO DEEP-TRENCH STRUCTURES 487 REFERENCES 490 Appendix 493 Table A. 1. Electric Units, Their Symbols and Conversion Factors. 493 Table A.2. Fundamental Physical Constants 495 List of Acronyms.,*. 497 Index 501

1. Photon Beam Damage and Charging at Solid Surfaces John H. Thomas III

1. Photon Beam Damage and Charging at Solid Surfaces John H. Thomas III 1. Photon Beam Damage and Charging at Solid Surfaces John H. Thomas III 1. Introduction............................. 2. Electrostatic Charging of Samples in Photoemission Experiments............................

More information

Vacuum Evaporation Recap

Vacuum Evaporation Recap Sputtering Vacuum Evaporation Recap Use high temperatures at high vacuum to evaporate (eject) atoms or molecules off a material surface. Use ballistic flow to transport them to a substrate and deposit.

More information

2. Deposition process

2. Deposition process Properties of optical thin films produced by reactive low voltage ion plating (RLVIP) Antje Hallbauer Thin Film Technology Institute of Ion Physics & Applied Physics University of Innsbruck Investigations

More information

Coating Technology: Evaporation Vs Sputtering

Coating Technology: Evaporation Vs Sputtering Satisloh Italy S.r.l. Coating Technology: Evaporation Vs Sputtering Gianni Monaco, PhD R&D project manager, Satisloh Italy 04.04.2016 V1 The aim of this document is to provide basic technical information

More information

Tecnologie convenzionali nell approccio top-down; I: metodi e problematiche per la deposizione di film sottili

Tecnologie convenzionali nell approccio top-down; I: metodi e problematiche per la deposizione di film sottili LS Scienza dei Materiali - a.a. 2005/06 Fisica delle Nanotecnologie part 8 Version 4, Dec 2005 Francesco Fuso, tel 0502214305, 0502214293 - fuso@df.unipi.it http://www.df.unipi.it/~fuso/dida Tecnologie

More information

Graduate Student Presentations

Graduate Student Presentations Graduate Student Presentations Dang, Huong Chip packaging March 27 Call, Nathan Thin film transistors/ liquid crystal displays April 4 Feldman, Ari Optical computing April 11 Guerassio, Ian Self-assembly

More information

Sputtering by Particle Bombardment I

Sputtering by Particle Bombardment I Sputtering by Particle Bombardment I Physical Sputtering of Single-Element Solids Edited by R. Behrisch With Contributions by H. H. Andersen H. L. Bay R. Behrisch M. T. Robinson H. E. Roosendaal P. Sigmund

More information

A Remote Plasma Sputter Process for High Rate Web Coating of Low Temperature Plastic Film with High Quality Thin Film Metals and Insulators

A Remote Plasma Sputter Process for High Rate Web Coating of Low Temperature Plastic Film with High Quality Thin Film Metals and Insulators A Remote Plasma Sputter Process for High Rate Web Coating of Low Temperature Plastic Film with High Quality Thin Film Metals and Insulators Dr Peter Hockley and Professor Mike Thwaites, Plasma Quest Limited

More information

Spectroscopic Ellipsometry:

Spectroscopic Ellipsometry: Spectroscopic : What it is, what it will do, and what it won t do by Harland G. Tompkins Introduction Fundamentals Anatomy of an ellipsometric spectrum Analysis of an ellipsometric spectrum What you can

More information

and LUMINOUS CHEMICAL VAPOR DEPOSITION INTERFACE ENGINEERING HirotsuguYasuda University of Missouri-Columbia Columbia, Missouri, U.S.A.

and LUMINOUS CHEMICAL VAPOR DEPOSITION INTERFACE ENGINEERING HirotsuguYasuda University of Missouri-Columbia Columbia, Missouri, U.S.A. LUMINOUS CHEMICAL VAPOR DEPOSITION and INTERFACE ENGINEERING HirotsuguYasuda University of Missouri-Columbia Columbia, Missouri, U.S.A. MARCEL MARCEL DEKKER. NEW YORK DEKKER Contents Preface iii Part I.

More information

Thin film structures of diamond-like carbon prepared by pulsed plasma techniques 325. Publications

Thin film structures of diamond-like carbon prepared by pulsed plasma techniques 325. Publications PUBLICATIONS 324 Publications Thin film structures of diamond-like carbon prepared by pulsed plasma techniques 325 Publications The following list includes the published papers, attended conferences and

More information

Chapter 11 PVD and Metallization

Chapter 11 PVD and Metallization Chapter 11 PVD and Metallization 2006/5/23 1 Metallization Processes that deposit metal thin film on wafer surface. 2006/5/23 2 1 Metallization Definition Applications PVD vs. CVD Methods Vacuum Metals

More information

Introduction to VLSI Fabrication Technologies. Emanuele Baravelli

Introduction to VLSI Fabrication Technologies. Emanuele Baravelli Introduction to VLSI Fabrication Technologies Emanuele Baravelli 27/09/2005 Organization Materials Used in VLSI Fabrication VLSI Fabrication Technologies Overview of Fabrication Methods Device simulation

More information

Conductivity of silicon can be changed several orders of magnitude by introducing impurity atoms in silicon crystal lattice.

Conductivity of silicon can be changed several orders of magnitude by introducing impurity atoms in silicon crystal lattice. CMOS Processing Technology Silicon: a semiconductor with resistance between that of conductor and an insulator. Conductivity of silicon can be changed several orders of magnitude by introducing impurity

More information

For Touch Panel and LCD Sputtering/PECVD/ Wet Processing

For Touch Panel and LCD Sputtering/PECVD/ Wet Processing production Systems For Touch Panel and LCD Sputtering/PECVD/ Wet Processing Pilot and Production Systems Process Solutions with over 20 Years of Know-how Process Technology at a Glance for Touch Panel,

More information

Types of Epitaxy. Homoepitaxy. Heteroepitaxy

Types of Epitaxy. Homoepitaxy. Heteroepitaxy Epitaxy Epitaxial Growth Epitaxy means the growth of a single crystal film on top of a crystalline substrate. For most thin film applications (hard and soft coatings, optical coatings, protective coatings)

More information

Le nanotecnologie: dal Laboratorio al Mercato. Fabrizio Pirri Politecnico di Torino Istituto Italiano di Tecnologia

Le nanotecnologie: dal Laboratorio al Mercato. Fabrizio Pirri Politecnico di Torino Istituto Italiano di Tecnologia Le nanotecnologie: dal Laboratorio al Mercato Fabrizio Pirri Politecnico di Torino Istituto Italiano di Tecnologia Materials & Processes for micro nanotechnologies Laboratory http://www.polito.it/micronanotech

More information

Lecture 12. Physical Vapor Deposition: Evaporation and Sputtering Reading: Chapter 12. ECE 6450 - Dr. Alan Doolittle

Lecture 12. Physical Vapor Deposition: Evaporation and Sputtering Reading: Chapter 12. ECE 6450 - Dr. Alan Doolittle Lecture 12 Physical Vapor Deposition: Evaporation and Sputtering Reading: Chapter 12 Evaporation and Sputtering (Metalization) Evaporation For all devices, there is a need to go from semiconductor to metal.

More information

BIOACTIVE COATINGS ON 316L STAINLESS STEEL IMPLANTS

BIOACTIVE COATINGS ON 316L STAINLESS STEEL IMPLANTS Trends Biomater. Artif. Organs. Vol. 17(2) pp 43-47 (2004) http//www.sbaoi.org BIOACTIVE COATINGS ON 316L STAINLESS STEEL IMPLANTS N. Ramesh Babu*,+, Sushant Manwatkar*, K. Prasada Rao* and T. S. Sampath

More information

Ion Beam Sputtering: Practical Applications to Electron Microscopy

Ion Beam Sputtering: Practical Applications to Electron Microscopy Ion Beam Sputtering: Practical Applications to Electron Microscopy Applications Laboratory Report Introduction Electron microscope specimens, both scanning (SEM) and transmission (TEM), often require a

More information

The New PVD HI3-Technology: Latest Developments and Potential for Coining Dies.

The New PVD HI3-Technology: Latest Developments and Potential for Coining Dies. The New PVD HI3-Technology: Latest Developments and Potential for Coining Dies. Technical Forum - World Money Fair 2015, Berlin 29 th January 2015, Oerlikon The New Segment Surface Solutions Segment Manmade

More information

Decorative vacuum coating technologies 30.05.2014 Certottica Longarone. Thin Film Plasma Coating Technologies

Decorative vacuum coating technologies 30.05.2014 Certottica Longarone. Thin Film Plasma Coating Technologies Dr. Stefan Schlichtherle Dr. Georg Strauss PhysTech Coating Technology GmbH Decorative vacuum coating technologies 30.05.2014 Certottica Longarone Thin Film Plasma Coating Technologies Content The fascination

More information

DIEGO TONINI MORPHOLOGY OF NIOBIUM FILMS SPUTTERED AT DIFFERENT TARGET SUBSTRATE ANGLE

DIEGO TONINI MORPHOLOGY OF NIOBIUM FILMS SPUTTERED AT DIFFERENT TARGET SUBSTRATE ANGLE UNIVERSITÀ DEGLI STUDI DI PADOVA SCIENCE FACULTY MATERIAL SCIENCE DEGREE INFN LABORATORI NAZIONALI DI LEGNARO DIEGO TONINI MORPHOLOGY OF NIOBIUM FILMS SPUTTERED AT DIFFERENT TARGET SUBSTRATE ANGLE 2 QUESTIONS

More information

Neuere Entwicklungen zur Herstellung optischer Schichten durch reaktive. Wolfgang Hentsch, Dr. Reinhard Fendler. FHR Anlagenbau GmbH

Neuere Entwicklungen zur Herstellung optischer Schichten durch reaktive. Wolfgang Hentsch, Dr. Reinhard Fendler. FHR Anlagenbau GmbH Neuere Entwicklungen zur Herstellung optischer Schichten durch reaktive Sputtertechnologien Wolfgang Hentsch, Dr. Reinhard Fendler FHR Anlagenbau GmbH Germany Contents: 1. FHR Anlagenbau GmbH in Brief

More information

Plasma Source. Atom Source, Ion Source and Atom/Ion Hybrid Source

Plasma Source. Atom Source, Ion Source and Atom/Ion Hybrid Source Plasma Source Atom Source, Ion Source and Atom/Ion Hybrid Source The tectra Plasma Source* is a multi-purpose source which can easily be user configured to produce either atoms or ions and finds uses in

More information

State of the art in reactive magnetron sputtering

State of the art in reactive magnetron sputtering State of the art in reactive magnetron sputtering T. Nyberg, O. Kappertz, T. Kubart and S. Berg Solid State Electronics, The Ångström Laboratory, Uppsala University, Box 534, S-751 21 Uppsala, Sweden D.

More information

Sputtered AlN Thin Films on Si and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties

Sputtered AlN Thin Films on Si and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties Sputtered AlN Thin Films on and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties S. Mishin, D. R. Marx and B. Sylvia, Advanced Modular Sputtering,

More information

Chemical Sputtering. von Kohlenstoff durch Wasserstoff. W. Jacob

Chemical Sputtering. von Kohlenstoff durch Wasserstoff. W. Jacob Chemical Sputtering von Kohlenstoff durch Wasserstoff W. Jacob Centre for Interdisciplinary Plasma Science Max-Planck-Institut für Plasmaphysik, 85748 Garching Content: Definitions: Chemical erosion, physical

More information

Dr Marcin Adamiak marcin.adamiak. www.imiib.polsl.pl/

Dr Marcin Adamiak marcin.adamiak. www.imiib.polsl.pl/ FP7 NMP/INCO Brokerage Event Warsaw, 17-18 September 2009 Dr Marcin Adamiak marcin.adamiak adamiak@polsl.pl http://www.imiib.polsl.pl www.imiib.polsl.pl/ Institute of Engineering Materials and Biomaterials

More information

Sputtering. Ion-Solid Interactions

Sputtering. Ion-Solid Interactions ssistant Professor Department of Microelectronic Engineering Rochester Institute of Technology 82 Lomb Memorial Drive Rochester, NY 14623-5604 Tel (716) 475-2923 Fax (716) 475-5041 PDRDV@RIT.EDU Page 1

More information

Robert G. Hunsperger. Integrated Optics. Theory and Technology. Fourth Edition. With 195 Figures and 17 Tables. Springer

Robert G. Hunsperger. Integrated Optics. Theory and Technology. Fourth Edition. With 195 Figures and 17 Tables. Springer Robert G. Hunsperger Integrated Optics Theory and Technology Fourth Edition With 195 Figures and 17 Tables Springer Contents 1. Introduction 1 1.1 Advantages of Integrated Optics 2 1.1.1 Comparison of

More information

Abdullah GÖKTAŞ, Ph. D. -*- CURRICULUM VITAE-* 01.05.2015

Abdullah GÖKTAŞ, Ph. D. -*- CURRICULUM VITAE-* 01.05.2015 Name and Last Name: Abdullah GÖKTAŞ Date and Place of Birth: 24 April 1981, Sanliurfa (Turkey) Marital Status: Married with 1 children Foreign Languages: English, Japanese (Basic level) Address: Harran

More information

High performance. Architectural glazings utilise thin. low-emissivity coating. Coating technology

High performance. Architectural glazings utilise thin. low-emissivity coating. Coating technology Coating technology High performance low-emissivity coating Growing concern with energy efficiency has sparked the development of double low-emissivity coatings in architectural glass. BOC Coating has designed

More information

IBS - Ion Beam Services

IBS - Ion Beam Services IBS - Ion Beam Services Profile Technologies Devices & sensor fabricat ion Participation to R&D programs Researched partnership Présentation activité composant 1 Profile : Products and services Product

More information

Grade Selection... Coated Grades / CVD... Coated Grades / PVD... Cermet... PCBN (T-CBN)... PCD (T-DIA)... Ceramics...

Grade Selection... Coated Grades / CVD... Coated Grades / PVD... Cermet... PCBN (T-CBN)... PCD (T-DIA)... Ceramics... Products Grade Selection... Coated / CVD... Coated / PVD... Cermet... PCBN (T-CBN)... PCD (T-DIA)... Ceramics... Uncoated Cemented Carbides... Ultra fine Grain Cemented Carbides... -2-4 -6-8 -0-2 - -4-5

More information

Plasma Electronic is Partner of. Tailor-Made Surfaces by Plasma Technology

Plasma Electronic is Partner of. Tailor-Made Surfaces by Plasma Technology Precision Fair 2013 Stand 171 Plasma Electronic is Partner of Tailor-Made Surfaces by Plasma Technology Dr. J. Geng, Plasma Electronic GmbH Modern Surface Technology in 1900 Overview A short introduction

More information

Handbook of Thin Film Materials

Handbook of Thin Film Materials Handbook of Thin Film Materials Volume 1 Deposition and Processing of Thin Films Edited by Hari Singh Nalwa, M.Sc, Ph.D. Stanford Scientific Corporation Los Angeles, California, USA Formerly at Hitachi

More information

Deposition of Thin Metal Films " (on Polymer Substrates)!

Deposition of Thin Metal Films  (on Polymer Substrates)! Deposition of Thin Metal Films " (on Polymer Substrates)! Shefford P. Baker! Cornell University! Department of Materials Science and Engineering! Ithaca, New York, 14853! MS&E 5420 Flexible Electronics,

More information

Advanced VLSI Design CMOS Processing Technology

Advanced VLSI Design CMOS Processing Technology Isolation of transistors, i.e., their source and drains, from other transistors is needed to reduce electrical interactions between them. For technologies

More information

Deposition of Silicon Oxide, Silicon Nitride and Silicon Carbide Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology

Deposition of Silicon Oxide, Silicon Nitride and Silicon Carbide Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology General Plasma, Inc. 546 East 25th Street Tucson, Arizona 85713 tel. 520-882-5100 fax. 520-882-5165 and Silicon Carbide Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology M.

More information

This paper describes Digital Equipment Corporation Semiconductor Division s

This paper describes Digital Equipment Corporation Semiconductor Division s WHITEPAPER By Edd Hanson and Heather Benson-Woodward of Digital Semiconductor Michael Bonner of Advanced Energy Industries, Inc. This paper describes Digital Equipment Corporation Semiconductor Division

More information

AC coupled pitch adapters for silicon strip detectors

AC coupled pitch adapters for silicon strip detectors AC coupled pitch adapters for silicon strip detectors J. Härkönen1), E. Tuovinen1), P. Luukka1), T. Mäenpää1), E. Tuovinen1), E. Tuominen1), Y. Gotra2), L. Spiegel2) Helsinki Institute of Physics, Finland

More information

Implementation Of High-k/Metal Gates In High-Volume Manufacturing

Implementation Of High-k/Metal Gates In High-Volume Manufacturing White Paper Implementation Of High-k/Metal Gates In High-Volume Manufacturing INTRODUCTION There have been significant breakthroughs in IC technology in the past decade. The upper interconnect layers of

More information

CONTENTS. Preface. 1.1.2. Energy bands of a crystal (intuitive approach)

CONTENTS. Preface. 1.1.2. Energy bands of a crystal (intuitive approach) CONTENTS Preface. Energy Band Theory.. Electron in a crystal... Two examples of electron behavior... Free electron...2. The particle-in-a-box approach..2. Energy bands of a crystal (intuitive approach)..3.

More information

ALD Atomic Layer Deposition

ALD Atomic Layer Deposition Research - Services ALD Atomic Layer Deposition Atomic Layer Deposition is a deposition process for assembling of thin films on the nanometer scale. The self-limiting deposition of atomic monolayers occurs

More information

Lecture 030 DSM CMOS Technology (3/24/10) Page 030-1

Lecture 030 DSM CMOS Technology (3/24/10) Page 030-1 Lecture 030 DSM CMOS Technology (3/24/10) Page 030-1 LECTURE 030 - DEEP SUBMICRON (DSM) CMOS TECHNOLOGY LECTURE ORGANIZATION Outline Characteristics of a deep submicron CMOS technology Typical deep submicron

More information

Solar Photovoltaic (PV) Cells

Solar Photovoltaic (PV) Cells Solar Photovoltaic (PV) Cells A supplement topic to: Mi ti l S Micro-optical Sensors - A MEMS for electric power generation Science of Silicon PV Cells Scientific base for solar PV electric power generation

More information

Summary of Insert Grades. Insert Lineup Turning Milling Drilling Insert Selection Table Grade Properties PCD CBN. Ceramic. Cell Fiber. Cermet.

Summary of Insert Grades. Insert Lineup Turning Milling Drilling Insert Selection Table Grade Properties PCD CBN. Ceramic. Cell Fiber. Cermet. 1~15 Summary of Insert Lineup Milling Drilling Insert Selection Table Grade Properties PCD Ceramic Cell Fiber PVD Coated CVD Coated PVD Coated for PVD Coated for Milling and Drilling 2~7 2~3 4 5 5 6 7

More information

CRYSTAL DEFECTS: Point defects

CRYSTAL DEFECTS: Point defects CRYSTAL DEFECTS: Point defects Figure 10.15. Point defects. (a) Substitutional impurity. (b) Interstitial impurity. (c) Lattice vacancy. (d) Frenkeltype defect. 9 10/11/004 Ettore Vittone- Fisica dei Semiconduttori

More information

Results Overview Wafer Edge Film Removal using Laser

Results Overview Wafer Edge Film Removal using Laser Results Overview Wafer Edge Film Removal using Laser LEC- 300: Laser Edge Cleaning Process Apex Beam Top Beam Exhaust Flow Top Beam Scanning Top & Top Bevel Apex Beam Scanning Top Bevel, Apex, & Bo+om

More information

Observation of Long Transients in the Electrical Characterization of Thin Film BST Capacitors

Observation of Long Transients in the Electrical Characterization of Thin Film BST Capacitors Integrated Ferroelectrics, 53: 503 511, 2003 Copyright C Taylor & Francis Inc. ISSN: 1058-4587 print/ 1607-8489 online DOI: 10.1080/10584580390258651 Observation of Long Transients in the Electrical Characterization

More information

High Rate Oxide Deposition onto Web by Reactive Sputtering from Rotatable Magnetrons

High Rate Oxide Deposition onto Web by Reactive Sputtering from Rotatable Magnetrons High Rate Oxide Deposition onto Web by Reactive Sputtering from Rotatable Magnetrons D.Monaghan, V. Bellido-Gonzalez, M. Audronis. B. Daniel Gencoa, Physics Rd, Liverpool, L24 9HP, UK. www.gencoa.com,

More information

Planar Magnetron Sputtering Sources

Planar Magnetron Sputtering Sources Planar Magnetron puttering ources INTRODUCTION TABLE OF CONTENT PAGE Introduction........................ 2 MAK 1.3...........................3 MAK 2............................4 MAK 3............................5

More information

Tecnologie convenzionali nell approccio top-down; I: crescita di materiali e strati sottili

Tecnologie convenzionali nell approccio top-down; I: crescita di materiali e strati sottili LS Scienza dei Materiali - a.a. 2007/08 Fisica delle Nanotecnologie part 2 Version 6, Oct 2007 Francesco Fuso, tel 0502214305, 0502214293 - fuso@df.unipi.it http://www.df.unipi.it/~fuso/dida Tecnologie

More information

Reactive Sputtering Using a Dual-Anode Magnetron System

Reactive Sputtering Using a Dual-Anode Magnetron System Reactive Sputtering Using a Dual-Anode Magnetron System A. Belkind and Z. Zhao, Stevens Institute of Technology, Hoboken, NJ; and D. Carter, G. McDonough, G. Roche, and R. Scholl, Advanced Energy Industries,

More information

Picosun World Forum, Espoo 9.6.2009. 35 years of ALD. Tuomo Suntola, Picosun Oy. Tuomo Suntola, Picosun Oy

Picosun World Forum, Espoo 9.6.2009. 35 years of ALD. Tuomo Suntola, Picosun Oy. Tuomo Suntola, Picosun Oy 35 years of ALD Conventional methods for compound film deposition Heat treatment Final crystallization Nucleation Vacuum evaporation Sputtering CVD Buildup of thin film in source controlled deposition

More information

Interfacial thermal resistance of Au/SiO 2 produced by sputtering method

Interfacial thermal resistance of Au/SiO 2 produced by sputtering method High Temperatures-High Pressures, Vol. 37, pp. 31 39 Reprints available directly from the publisher Photocopying permitted by license only 2008 Old City Publishing, Inc. Published by license under the

More information

GD-Profiler Series RF Glow Discharge Optical Emission Spectrometers

GD-Profiler Series RF Glow Discharge Optical Emission Spectrometers GD-Profiler Series RF Glow Discharge Optical Emission Spectrometers For many applications, it is essential to know the chemical composition of a material, both at the surface, at the interfaces and in

More information

Helium-Neon Laser. Figure 1: Diagram of optical and electrical components used in the HeNe laser experiment.

Helium-Neon Laser. Figure 1: Diagram of optical and electrical components used in the HeNe laser experiment. Helium-Neon Laser Experiment objectives: assemble and align a 3-mW HeNe laser from readily available optical components, record photographically the transverse mode structure of the laser output beam,

More information

Basic Properties and Application Examples of PGS Graphite Sheet

Basic Properties and Application Examples of PGS Graphite Sheet Basic Properties and Application Examples of 1. Basic properties of Graphite sheet 2. Functions of Graphite sheet 3. Application Examples Presentation [Sales Liaison] Panasonic Electronic Devices Co.,

More information

Contents of Technology Course

Contents of Technology Course Contents of Technology Course General observations: The material is organized in modules. Each module treats a distinct part of device fabrication. There is also an introduction (Module 1), a part that

More information

OPTIMIZING OF THERMAL EVAPORATION PROCESS COMPARED TO MAGNETRON SPUTTERING FOR FABRICATION OF TITANIA QUANTUM DOTS

OPTIMIZING OF THERMAL EVAPORATION PROCESS COMPARED TO MAGNETRON SPUTTERING FOR FABRICATION OF TITANIA QUANTUM DOTS OPTIMIZING OF THERMAL EVAPORATION PROCESS COMPARED TO MAGNETRON SPUTTERING FOR FABRICATION OF TITANIA QUANTUM DOTS Vojtěch SVATOŠ 1, Jana DRBOHLAVOVÁ 1, Marian MÁRIK 1, Jan PEKÁREK 1, Jana CHOMOCKÁ 1,

More information

Phonon Scattering and Thermal Conduction in Nanostructured Semiconductors

Phonon Scattering and Thermal Conduction in Nanostructured Semiconductors Phonon Scattering and Thermal Conduction in Nanostructured Semiconductors David G. Cahill, Joe Feser, Yee Kan Koh Department of Materials Science and Engineering And Materials Research Laboratory University

More information

histaris Inline Sputtering Systems

histaris Inline Sputtering Systems vistaris histaris Inline Sputtering Systems Inline Sputtering Systems with Vertical Substrate Transport Modular System for Different Applications VISTARIS Sputtering Systems The system with the brand name

More information

Etching Etch Definitions Isotropic Etching: same in all direction Anisotropic Etching: direction sensitive Selectivity: etch rate difference between

Etching Etch Definitions Isotropic Etching: same in all direction Anisotropic Etching: direction sensitive Selectivity: etch rate difference between Etching Etch Definitions Isotropic Etching: same in all direction Anisotropic Etching: direction sensitive Selectivity: etch rate difference between 2 materials Other layers below one being etch Masking

More information

Optical Properties of Thin Film Molecular Mixtures

Optical Properties of Thin Film Molecular Mixtures Optical Properties of Thin Film Molecular Mixtures Donald A. Jaworske NASA Glenn Research Center 2 Brookpark Road Cleveland, OH 4435 e-maih Donald. A.J aworske((_grc.nasa.gov Dean A. Shumway Brigham Young

More information

Electron Beam and Sputter Deposition Choosing Process Parameters

Electron Beam and Sputter Deposition Choosing Process Parameters Electron Beam and Sputter Deposition Choosing Process Parameters General Introduction The choice of process parameters for any process is determined not only by the physics and/or chemistry of the process,

More information

SURFACE MODIFICATION OF METAL IMPLANTS WITH PLASMA SPRAYED LAYERS

SURFACE MODIFICATION OF METAL IMPLANTS WITH PLASMA SPRAYED LAYERS SURFACE MODIFICATION OF METAL IMPLANTS WITH PLASMA SPRAYED LAYERS Prof. János Takács Budapest University of Technology and Economics (BME) Ozsváth Péter MSc Budapest University of Technology and Economics

More information

Opening Note Report on Successful Short Courses Summary of Events in 2014/2015 Featured Article: Depth Profiling of OLED Materials Featured Students

Opening Note Report on Successful Short Courses Summary of Events in 2014/2015 Featured Article: Depth Profiling of OLED Materials Featured Students Issue 01 May 2015 2015 Officers Bill Theilacker, Chair Ali Rafati, Vice Chair Bing Luo, Treasurer Dave Carr, Secretary Anna Belu, Past Chair Other Leaders Bharat Jalan, Univ. MN Liaison Del Smith, Education

More information

TEM study of the sol-gel oxide thin films

TEM study of the sol-gel oxide thin films Microscopy: advances in scientific research and education (A. Méndez-Vilas, Ed.) TEM study of the sol-gel oxide thin films V.S. Teodorescu 1 and M-G. Blanchin 2 1 National Institute of Material Physics,

More information

A Plasma Doping Process for 3D FinFET Source/ Drain Extensions

A Plasma Doping Process for 3D FinFET Source/ Drain Extensions A Plasma Doping Process for 3D FinFET Source/ Drain Extensions JTG 2014 Cuiyang Wang*, Shan Tang, Harold Persing, Bingxi Wood, Helen Maynard, Siamak Salimian, and Adam Brand Cuiyang_wang@amat.com Varian

More information

COATED CARBIDE. TiN. Al 2 O 3

COATED CARBIDE. TiN. Al 2 O 3 COATED CARBIDE GENERAL INFORMATION CVD = Chemical Vapour Deposition coated grades GC2015, GC2025, GC2135, GC235, GC3005, GC3015, GC3020, GC3025, GC3115, GC4015, GC4025, GC4035, S05F, and CD1810. PVD =

More information

Excimer Laser Technology

Excimer Laser Technology D. Basting G. Marowsky (Eds.) Excimer Laser Technology With 257 Figures ^y Springer Contents 1 Introduction 1 1.1 Introductory Remarks 1 1.1.1 The Unique Microstructuring Capabilities of Excimer Lasers

More information

Microstockage d énergie Les dernières avancées. S. Martin (CEA-LITEN / LCMS Grenoble)

Microstockage d énergie Les dernières avancées. S. Martin (CEA-LITEN / LCMS Grenoble) Microstockage d énergie Les dernières avancées S. Martin (CEA-LITEN / LCMS Grenoble) 1 Outline What is a microbattery? Microbatteries developped at CEA Description Performances Integration and Demonstrations

More information

THIN-FILM SILICON SOLAR CELLS

THIN-FILM SILICON SOLAR CELLS ENGINEERING SCIENCES Micro- and Nanotechnology THIN-FILM SILICON SOLAR CELLS Arvind Shah, Editor The main authors of Thin-Film Silicon Solar Cells are Christophe Ballif, Wolfhard Beyer, Friedhelm Finger,

More information

The study of structural and optical properties of TiO 2 :Tb thin films

The study of structural and optical properties of TiO 2 :Tb thin films Optica Applicata, Vol. XXXVII, No. 4, 2007 The study of structural and optical properties of TiO 2 :Tb thin films AGNIESZKA BORKOWSKA, JAROSLAW DOMARADZKI, DANUTA KACZMAREK, DAMIAN WOJCIESZAK Faculty of

More information

NANOSTRUCTURED ZnO AND ZAO TRANSPARENT THIN FILMS BY SPUTTERING SURFACE CHARACTERIZATION

NANOSTRUCTURED ZnO AND ZAO TRANSPARENT THIN FILMS BY SPUTTERING SURFACE CHARACTERIZATION Rev.Adv.Mater.Sci. Nanostructured ZnO 10 and (2005) ZAO 335-340 transparent thin films by sputtering surface characterization 335 NANOSTRUCTURED ZnO AND ZAO TRANSPARENT THIN FILMS BY SPUTTERING SURFACE

More information

Plasma diagnostics focused on new magnetron sputtering devices for thin film deposition

Plasma diagnostics focused on new magnetron sputtering devices for thin film deposition Université Paris-Sud XI Laboratoire de Physique des Gaz et des Plasmas Orsay, France & Masaryk University in Brno Department of Physical Electronics Brno, Czech Republic Plasma diagnostics focused on new

More information

REVIEW ARTICLE. The search for novel, superhard materials

REVIEW ARTICLE. The search for novel, superhard materials REVIEW ARTICLE The search for novel, superhard materials Stan Vepřek a) Institute for Chemistry of Inorganic Materials, Technical University Munich, Lichtenbergstrasse 4, D-85747 Garching b. Munich, Germany

More information

GREEN NANOTECHNOLOGY. Geoffrey. Energy in the Built Environment. Solutions for Sustainability and. B. Smith Claes G. Granqvist.

GREEN NANOTECHNOLOGY. Geoffrey. Energy in the Built Environment. Solutions for Sustainability and. B. Smith Claes G. Granqvist. GREEN NANOTECHNOLOGY Solutions for Sustainability and Energy in the Built Environment Geoffrey B. Smith Claes G. Granqvist CRC Press Taylor & Francis Group Boca Raton London NewYork CRC Press is an imprint

More information

Secondary Ion Mass Spectrometry

Secondary Ion Mass Spectrometry Secondary Ion Mass Spectrometry A PRACTICAL HANDBOOK FOR DEPTH PROFILING AND BULK IMPURITY ANALYSIS R. G. Wilson Hughes Research Laboratories Malibu, California F. A. Stevie AT&T Bell Laboratories Allentown,

More information

Sandia Agile MEMS Prototyping, Layout Tools, Education and Services Program

Sandia Agile MEMS Prototyping, Layout Tools, Education and Services Program Sandia Agile MEMS Prototyping, Layout Tools, Education and Services Program Heather Schriner, Brady Davies, Jeffry Sniegowski, M. Steven Rodgers, James Allen, Charlene Shepard Sandia National Laboratories

More information

Quality. Now Certified to ISO 9001:2008

Quality. Now Certified to ISO 9001:2008 Quality Now Certified to ISO 90012008 Quality Policy It is Peptides International's goal is to achieve complete customer satisfaction by addressing customer needs and delivering what we promise. The company

More information

Damage-free, All-dry Via Etch Resist and Residue Removal Processes

Damage-free, All-dry Via Etch Resist and Residue Removal Processes Damage-free, All-dry Via Etch Resist and Residue Removal Processes Nirmal Chaudhary Siemens Components East Fishkill, 1580 Route 52, Bldg. 630-1, Hopewell Junction, NY 12533 Tel: (914)892-9053, Fax: (914)892-9068

More information

AN900 APPLICATION NOTE

AN900 APPLICATION NOTE AN900 APPLICATION NOTE INTRODUCTION TO SEMICONDUCTOR TECHNOLOGY INTRODUCTION by Microcontroller Division Applications An integrated circuit is a small but sophisticated device implementing several electronic

More information

Investigation of interlayer exchange coupling in ferro-/antiferro-/ferromagnetic trilayers

Investigation of interlayer exchange coupling in ferro-/antiferro-/ferromagnetic trilayers Lehrstuhl für Experimentalphysik E21 Investigation of interlayer exchange coupling in ferro-/antiferro-/ferromagnetic trilayers Christian Schanzer Vollständiger Abdruck der von der Fakultät für Physik

More information

STRUCTURAL STUDIES OF MULTIFERROIC THIN FILMS

STRUCTURAL STUDIES OF MULTIFERROIC THIN FILMS STRUCTURAL STUDIES OF MULTIFERROIC THIN FILMS Lisa Krayer (UCSD) Mentor: Daniel Pajerowski (NIST) Collaborating with: (University of Florida) Professor Amlan Biswas Daniel Grant NCNR

More information

MOS (metal-oxidesemiconductor) 李 2003/12/19

MOS (metal-oxidesemiconductor) 李 2003/12/19 MOS (metal-oxidesemiconductor) 李 2003/12/19 Outline Structure Ideal MOS The surface depletion region Ideal MOS curves The SiO 2 -Si MOS diode (real case) Structure A basic MOS consisting of three layers.

More information

Dry Etching and Reactive Ion Etching (RIE)

Dry Etching and Reactive Ion Etching (RIE) Dry Etching and Reactive Ion Etching (RIE) MEMS 5611 Feb 19 th 2013 Shengkui Gao Contents refer slides from UC Berkeley, Georgia Tech., KU, etc. (see reference) 1 Contents Etching and its terminologies

More information

Structure and properties of transparent conductive ZnO films grown by pulsed laser

Structure and properties of transparent conductive ZnO films grown by pulsed laser Structure and properties of transparent conductive ZnO films grown by pulsed laser deposition (PLD) by Yu Hsiu, Lin A dissertation submitted to the University of Birmingham for the degree of Master of

More information

Glancing XRD and XRF for the Study of Texture Development in SmCo Based Films Sputtered Onto Silicon Substrates

Glancing XRD and XRF for the Study of Texture Development in SmCo Based Films Sputtered Onto Silicon Substrates 161 162 Glancing XRD and XRF for the Study of Texture Development in SmCo Based Films Sputtered Onto Silicon Substrates F. J. Cadieu*, I. Vander, Y. Rong, and R. W. Zuneska Physics Department Queens College

More information

Session 2A2a Femtosecond Photonics: Microfabrication and Optical Data Storage 2

Session 2A2a Femtosecond Photonics: Microfabrication and Optical Data Storage 2 Session 2A2a Femtosecond Photonics: Microfabrication and Optical Data Storage 2 Femtosecond Photonics for Multilayered Optical Memory Yoshimasa Kawata (Shizuoka University, Japan); M. Miyamoto (Shizuoka

More information

HANDBOOK OF MODERN FERROMAGNETIC MATERIALS

HANDBOOK OF MODERN FERROMAGNETIC MATERIALS HANDBOOK OF MODERN FERROMAGNETIC MATERIALS Alex Goldman, B.S., A.M., Ph.D. Ferrite Technology Worldwide w Kluwer Academic Publishers Boston/Dordrecht/London TABLE OF CONTENTS Foreword by Takeshi Takei

More information

Displays. Cathode Ray Tube. Semiconductor Elements. Basic applications. Oscilloscope TV Old monitors. 2009, Associate Professor PhD. T.

Displays. Cathode Ray Tube. Semiconductor Elements. Basic applications. Oscilloscope TV Old monitors. 2009, Associate Professor PhD. T. Displays Semiconductor Elements 1 Cathode Ray Tube Basic applications Oscilloscope TV Old monitors 2 1 Idea of Electrostatic Deflection 3 Inside an Electrostatic Deflection Cathode Ray Tube Gun creates

More information

Micro-Power Generation

Micro-Power Generation Micro-Power Generation Elizabeth K. Reilly February 21, 2007 TAC-meeting 1 Energy Scavenging for Wireless Sensors Enabling Wireless Sensor Networks: Ambient energy source Piezoelectric transducer technology

More information

1. PECVD in ORGANOSILICON FED PLASMAS

1. PECVD in ORGANOSILICON FED PLASMAS F. FRACASSI Department of Chemistry, University of Bari (Italy) Plasma Solution srl SURFACE MODIFICATION OF POLYMERS AND METALS WITH LOW TEMPERATURE PLASMA OUTLINE METAL TREATMENTS 1 low pressure PECVD

More information

Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry

Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry Thomas Waechtler a, Bernd Gruska b, Sven Zimmermann a, Stefan E. Schulz a, Thomas Gessner a a Chemnitz University

More information

X-ray diffraction techniques for thin films

X-ray diffraction techniques for thin films X-ray diffraction techniques for thin films Rigaku Corporation Application Laboratory Takayuki Konya 1 Today s contents (PM) Introduction X-ray diffraction method Out-of-Plane In-Plane Pole figure Reciprocal

More information

Sputtering Targets and Sputtered Films: Technology and Markets

Sputtering Targets and Sputtered Films: Technology and Markets A BCC Research Semiconductor Manufacturing Report and Sputtered Films: SMC037E Use this report to: Understand the most important advances in sputtering technology and target fabrication Identify the current

More information

INTRODUCTION TO ION IMPLANTATION Dr. Lynn Fuller, Dr. Renan Turkman Dr Robert Pearson

INTRODUCTION TO ION IMPLANTATION Dr. Lynn Fuller, Dr. Renan Turkman Dr Robert Pearson Ion Implantation ROCHESTER INSTITUTE OF TECHNOLOGY MICROELECTRONIC ENGINEERING INTRODUCTION TO ION IMPLANTATION Dr. Lynn Fuller, Dr. Renan Turkman Dr Robert Pearson Webpage: http://people.rit.edu/lffeee

More information