Plasma Electronic is Partner of. Tailor-Made Surfaces by Plasma Technology

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1 Precision Fair 2013 Stand 171 Plasma Electronic is Partner of Tailor-Made Surfaces by Plasma Technology Dr. J. Geng, Plasma Electronic GmbH

2 Modern Surface Technology in 1900

3 Overview A short introduction to plasma technology - What is Plasma? -A little physics - Overview over industrial applications Activation / Cleaning of surfaces PECVD: principles, applications and machines PEALD: principles and applications PVD: principles, classification, applications

4 Introduction What is plasma? Gas discharge containing charged particles Stars / nuclear fusion - flames / lightnings / fluorescent lamps

5 Introduction Plasma technology utilizes this phenomenon for surface modifications

6 Introduction: Hot and cold!? Plasma = Gas + electronic excitation= molecules + excited molecules + molecule fragments + UV + Ions + Electrons Low- Pressure regime Flame Pressure

7 Introduction Technical applications in surface technology? Stand 171 Atmospheric plasmas: - Arc discharges (welding) - Flame coatings - Flaming of polymer surfaces - Atmospheric Plasma Sources for Surface Activation / Cleaning Low pressure plasmas: - Ion-Plating for metal coatings - Low pressure plasma activation / cleaning - PVD-Sputtering for metal contaning coatings - Arc-PVD for metallic coatings - Plasma-CVD or PECVD

8 LPP-machine principle Vacuum chamber Process gases Decomposition products ENERGY Modified surface Work piece

9 Activation / Cleaning Increases the wettability of surfaces ENERGY Exhaust O 2 H 2 O CO 2 Surface Modified Surface

10 Activation of automotive parts Painting of car outer parts Material mix Semi-Inline

11 Activation of toys Materials: Plastics (Polystyrole ) Batch process (tumbler)

12 Activation of ophtalmic lenses Batch process Inline

13 PECVD coating PECVD: coating from reactive gases ENERGY C 2 H 4 Surface Coated Surface

14 Example: Diamond Like Carbon DLC bridges coating characteristics PTFE/Teflon PVD: TiN, TiAlN etc. + anti sticking / hydrophobic corrosion protection low friction - thick soft DLC + thin hard temperature resistant - Sticking / hydrophilic corrosion high friction

15 Applications

16 Example: Multilayer

17 Machines Myplas: 10 l; 200W CVD-Domino: Porta900: Porta200: CVD-Piccolo: l; l; 3000W l; 5000W l; 2000W 1000W

18 Changing wettability

19 Example: Aquacer (hydrophilic) Aquacer properties Thickness: >10 nm Surface tension: dynes Static contact angle: Temperature stability: 400 C Good wetting

20 Example: Aquacer (Dish washer baskets) Material: PP Effect: - less drops - faster drying - less stains

21 Example: Aquacer (Biotech disposals) Good flow of blood in channnels of disposables Good flow of blood or other liquids in wells

22 Example: Lipocer (hydrophobic) Lipocer properties Thickness: >10 nm Surface tension: 20 dynes Static contact angle: 107 Temperature stability: 300 C Bad wetting

23 Example: Lipocer Application: Biotech disposals

24 Example: Lipocer (Coating of rubber) Applications: Why coating rubber? Polymer O-rings: properties: - High no flexibility sticking for together sealing tasks - Disadvantage: High tacking / sticking affinity noise reduction Consequence: - Problems High speed with automatic valves assembling - System faster risks opening (e.g. security (micro seconds ) valves) - Wear Security valves Thin PECVD-coating open at the mean on pressure rubber as even an alternative to lubricants after years (nuclear power plants)

25 Example: Polymer-Beschichtung Lipocer (Coating of rubber) Reactive O2-Plasma Inert Gas Gas Plasma-Coating(s) Contaminations: H 2 O, grease, oil... Crosslinked Layer Polymer: EPDM, FPM, NBR, TPE...

26 PEALD PEALD: Plasma Enhanced Atomic Layer Deposition Plasma

27 PEALD Plasma Enhanced Atomic Layer Deposition The most precise, conformal atom by atom deposition

28 PVD PVD: Physical Vapour Deposition Thermal Evaporation Electron Beam Evaporation Diode Sputtering Magnetron Sputtering Arc Evaporation Ionisation

29 PVD Ion-Sputtering: Coating from a solid target Source: ILP, Universität Essen

30 PVD Magnetron-Sputtering Ti DUAL design Al

31 PVD machine PVD-metallization machine (Cr on paint) Chamber size: 8500 l Base pressure: <0.02Pa Working pressure:0.5 Pa Cycle time: 30 min

32 Plasma A Powerful Tool!

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