Products. Emission spectrometer. NIR sensor. Ultrasonic analysis

Save this PDF as:
 WORD  PNG  TXT  JPG

Size: px
Start display at page:

Download "Products. Emission spectrometer. NIR sensor. Ultrasonic analysis"

Transcription

1 XXII. Erfahrungsaustausch Mühlleiten 2015 Plasmaanalyse und Prozessoptimierung mittels spektroskopischem Plasmamonitoring in industriellen Anwendungen Swen Marke,, Lichtenau Thomas Schütte, Plasus GmbH, Kissing 1

2 Products Emission spectrometer NIR sensor Ultrasonic analysis 2

3 Emission Spectroscopy excitation by electron collision E excitation =E up -E 0 de-excitation by spontaneous emission E hn =E up -E low 3

4 Low Temperature Plasma Free Ions Free Neutrals Free Electrons Quasi-Neutrality Thermal Non Equilibrium Hot Electrons Cold Ions and Neutral Interaction with Substrate Deposition, Etching, Surface Modification 4

5 Intensity [a. u.] Spectroscopic Plasma Monitoring Information included in line emission 1,0 0,8 I max Intensity: - plasma parameters - density of neutrals, ions and electrons 0,6 0,4 0,2 Full Width Half Maximum FWHM: - apparatus profile: system configuration - line profile: broadening mechanism e.g. Doppler broadening (particle temperature) 0, Wavelength [nm] Wavelength 0 : - element, species 0 5

6 Spectroscopic Plasma Monitoring Real-time observation of line intensities I( t) ~ n X ( Te ) n( t) e Features: - real time observation of n - monitoring of different species Spectrometer: - wavelength calibrated - no intensity calibration 6

7 EMICON SA Series Stand-alone system Operating system: Integrated processor and display with EMICON SA firmware Number of spectrometer channels: 1-8 Spectral range of each channel: approx. 1.5 nm Number of analog channels: 2-8 for external inputs 2-8 for external outputs Signal resolution: 16 Bit Interfaces for system integration: Profibus and LAN, DIOs 7

8 EMICON Systems Field of Applications Production: - Real-time plasma emission monitoring - Evaluation of plasma process - Control of process parameters - Endpoint detection - Fault detection - PID control of gas flow and/or power R&D: - Basic R&D tasks - Measurement of plasma parameters - Analysis of molecular radiation - Development of prototype applications - Design new plasma control techniques 8

9 Applications - Film deposition and coating - PECVD - System diagnostics - Fault detection - Plasma etching and endpoint control - EPD - Large area coating - MW application for foil coating - ATM plasma processes - Process control of plasma jets - Uniformity control of plasma flame application - Sputtering processes - PID - control of reactive sputtering processes - HiPIMS / HPPMS application - Solar cell production - CIGS cells - AR coating - PIN structure of a-si:h cells 9

10 Plasma homogeneity control of large area applications Process optimization of MW source for foil coating gas shower for Ar and O LAMPS system Gas shower for HMDSO Application: - Evaluation of 2D plasma homogeneity - Optimization of gas inlet positions for process gases (e.g. HMDSO/Ar/O 2 ) - Monitoring of local impurities/inhomogeneity (e.g. from substrate) - Recording of transient effects and long term stability 10

11 Process optimization by plasma monitoring Large area MW source Kanal 1: oben Kanal 2: oben mittig Features: - Monitoring of all spectroscopic channel in real time - Concurrent monitoring of monitor tracks from all channels Kanal 3: Mitte Kanal 4: unten mittig Benefit: Instant identification of: - transient effects - long term drifts - process stability - inhomogeneity 11

12 Signal [a.u.] Process optimization by plasma monitoring Large area MW source Line intensities of line-of-sights OH 309 nm (v) OH 309 nm (h) O 777 nm (v) O 777 nm (h) H 486 nm (v) H 486 nm (h) CH 431 nm (v) Evaluation features: - vertical and horizontal dependencies 8000 CH 431 nm (h) Si 288 nm (v) Si 288 nm (h) - Profile measurements for all plasma species Non-uniform gas input Ar of O 2 in cover plate? - Localization of Inhomogeneity - Real spatial resolution 2000 v: top h: right v: top centered h: right centered 50 v: center h: center 0 Position of line-of-sight [mm] vertical (v) / horizontal (h) -50 v: bottom centered h: left centered -100 v: bottom h: left

13 Process Control of Precursor Flow Control of HMDSO flow in ATM plasma jets Application: - Plasma jets with precursor HMDSO - Control of HMDSO flow using Si line intensity - Single and multiple plasma jet setups In cooperation with: 13

14 Intensity of metal line Reactive Sputtering Processes PID process control gases Ar, O 2 magnetron metal target plasma compound thin film substrate Si SiO x Ar, O, Si Si, SiO x SiO x glass No O 2 flow: - Sputtering by Ar - No film production - High signal from metal line (Si) High O 2 flow: - Target covered by oxygen (poisoned) - Low film production - Low signal from metal line (Si) Hysteresis curve: Controlled O 2 flow: - Effective sputtering by oxygen - High film production - Desired stoichiometric ratio (SiO x ) Control of O 2 flow ensures desired film production Intensity of metal line controls O 2 gas flow Reactive gas flow 14

15 Reactive Sputtering Processes PID process control Application: - Roll-to-roll (RTR) coater - SiO 2 reactive sputtering - PID control of O 2 gas flow Other applications: - Touch panel: TCO - Architectural glass: LowE coating - Decorative coatings: e.g. Al - E-Paper: TCO and Al/Cu 15

16 Reactive Sputtering Processes EMICON Multi-Channel setup 16

17 Reactive Sputtering Processes PID process control Closed-loop control of gas flow 100% 60% 60% 60% 100% Features: Determination of best PID parameters: - Fast response - Small overshoot - No oscillation - Long-term stability K p = 0.2 K i = 120 Ti = % K p = 0.2 K i = 200 T i = % K p = 0.2 K i = 200 Ti = % K p = 0.2 K i = 120 T i = 800 K p = 0.2 K i = 200 T i = 800 K p = 0.2 K i = 200 T i = 400 0% 17

18 Summary EMICON SA System Spectral broad-band monitoring: Multi-channel setup: Replay mode: Set-point functions: Advanced PID control: Recipe manager: Remote control interfaces: Advanced plasma process analysis Process control of multiple gases / target materials All time information on chamber status Multi-process chamber application Spatial resolution for large area plasmas Offline analysis of recorded process data Design and test of process recipes End-point detection Quality control Reactive magnetron sputtering Gas flow and/or power control Multi-process switching Multi-layer processes Industrial interfaces for system integration LAN API, Profibus, digital and analog I/Os, 18

19 Thank you for your attention! IfU Diagnostic Systems GmbH Gottfried-Schenker-Str Lichtenau Firmengebäude der IfU 19

Speedflo TM is a multi-channel feedback control system for high speed adjustment of a reactive gas during magnetron sputter processes.

Speedflo TM is a multi-channel feedback control system for high speed adjustment of a reactive gas during magnetron sputter processes. Speedflo TM is a multi-channel feedback control system for high speed adjustment of a reactive gas during magnetron sputter processes. GENCOA Speedflo TM 3 Background to Reactive Sputtering Feedback Control

More information

Correct flow of information linking the 3 elements of the control system is very important.

Correct flow of information linking the 3 elements of the control system is very important. UNIFORMITY CONTROL IN REACTIVE MAGNETRON SPUTTERING V. Bellido-Gonzalez 1, B. Daniel 1, Dr. D. Monaghan 1, J. Counsell 2 1 Gencoa Ltd, Physics Road, Liverpool, L24 9HP, UK 2 J. Counsell Ltd., Lynwood (54)

More information

Neuere Entwicklungen zur Herstellung optischer Schichten durch reaktive. Wolfgang Hentsch, Dr. Reinhard Fendler. FHR Anlagenbau GmbH

Neuere Entwicklungen zur Herstellung optischer Schichten durch reaktive. Wolfgang Hentsch, Dr. Reinhard Fendler. FHR Anlagenbau GmbH Neuere Entwicklungen zur Herstellung optischer Schichten durch reaktive Sputtertechnologien Wolfgang Hentsch, Dr. Reinhard Fendler FHR Anlagenbau GmbH Germany Contents: 1. FHR Anlagenbau GmbH in Brief

More information

Flexible Machine Concepts for Roll-to-Roll Web Coaters Combining Magnetron Sputtering and Electron Beam PVD

Flexible Machine Concepts for Roll-to-Roll Web Coaters Combining Magnetron Sputtering and Electron Beam PVD Flexible Machine Concepts for Roll-to-Roll Web Coaters Combining Magnetron Sputtering and Electron Beam PVD AIMCAL, Charleston, SC, USA, Oktober 29th, 2004 J. Strümpfel, H. Neumann E. Reinhold, C. Steuer

More information

High Rate Oxide Deposition onto Web by Reactive Sputtering from Rotatable Magnetrons

High Rate Oxide Deposition onto Web by Reactive Sputtering from Rotatable Magnetrons High Rate Oxide Deposition onto Web by Reactive Sputtering from Rotatable Magnetrons D.Monaghan, V. Bellido-Gonzalez, M. Audronis. B. Daniel Gencoa, Physics Rd, Liverpool, L24 9HP, UK. www.gencoa.com,

More information

Stress Control in AlN and Mo Films for Electro-Acoustic Devices

Stress Control in AlN and Mo Films for Electro-Acoustic Devices Stress Control in AlN and Mo Films for Electro-Acoustic Devices Valery Felmetsger and Pavel Laptev Tegal Corporation IFCS 2008 Paper ID 3077 Slide 1 1 Introduction Piezoelectric AlN films with strong (002)

More information

Coating Thickness and Composition Analysis by Micro-EDXRF

Coating Thickness and Composition Analysis by Micro-EDXRF Application Note: XRF Coating Thickness and Composition Analysis by Micro-EDXRF www.edax.com Coating Thickness and Composition Analysis by Micro-EDXRF Introduction: The use of coatings in the modern manufacturing

More information

QGA Quantitative Gas Analyser

QGA Quantitative Gas Analyser QGA Quantitative Gas Analyser A compact bench-top system for real-time gas and vapour analysis Detailed product information / introduction catalysis studies environmental gas analysis fermentation off-gas

More information

ITO coating by reactive magnetron sputtering±comparison of properties from DC and MF processing

ITO coating by reactive magnetron sputtering±comparison of properties from DC and MF processing Thin Solid Films 351 (1999) 48±52 ITO coating by reactive magnetron sputtering±comparison of properties from DC and MF processing C. May*, J. StruÈmpfel Von Ardenne Anlagentechnik GmbH, Plattleite 19/29,

More information

SILICON VLSI TECHNOLOGY

SILICON VLSI TECHNOLOGY SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling CHAPTER 9b-- --PVD EX0250 E-Beam Heat Source Formulation (point source) The flux F p k that strikes Ap k is F p k = R evap / r2 ; = da p

More information

For Touch Panel and LCD Sputtering/PECVD/ Wet Processing

For Touch Panel and LCD Sputtering/PECVD/ Wet Processing production Systems For Touch Panel and LCD Sputtering/PECVD/ Wet Processing Pilot and Production Systems Process Solutions with over 20 Years of Know-how Process Technology at a Glance for Touch Panel,

More information

Developpements des technologies sous vide pour le

Developpements des technologies sous vide pour le & Developpements des technologies sous vide pour le traitement au défilé de produits plats P. Choquet, CRP Gabirel Lippmann, Luxembourg D. Chaleix, ArcelorMittal Research Center, France 1981-1991: HFP

More information

3 - Atomic Absorption Spectroscopy

3 - Atomic Absorption Spectroscopy 3 - Atomic Absorption Spectroscopy Introduction Atomic-absorption (AA) spectroscopy uses the absorption of light to measure the concentration of gas-phase atoms. Since samples are usually liquids or solids,

More information

GSM OPTICAL MONITORING FOR HIGH PRECISION THIN FILM DEPOSITION

GSM OPTICAL MONITORING FOR HIGH PRECISION THIN FILM DEPOSITION GSM OPTICAL MONITORING FOR HIGH PRECISION THIN FILM DEPOSITION OPTICAL MONITORING TECHNOLOGIES ENABLING OUR NEW WORLD! - ACHIEVING MORE DEMANDING THIN FILM SPECIFICATIONS - DRIVING DOWN UNIT COSTS From

More information

Coating Technology: Evaporation Vs Sputtering

Coating Technology: Evaporation Vs Sputtering Satisloh Italy S.r.l. Coating Technology: Evaporation Vs Sputtering Gianni Monaco, PhD R&D project manager, Satisloh Italy 04.04.2016 V1 The aim of this document is to provide basic technical information

More information

Process power from TRUMPF Hüttinger. Generators for plasma excitation.

Process power from TRUMPF Hüttinger. Generators for plasma excitation. Process power from TRUMPF Hüttinger Generators for plasma excitation. TRUMPF Hüttinger harnesses one of nature s most awesome powers. How we are putting plasma excitation to work. We can see it in lightning,

More information

Lecture 10: Scale-up and Design: Industrial Systems and Practices

Lecture 10: Scale-up and Design: Industrial Systems and Practices Lecture 10: Scale-up and Design: Industrial Systems and Practices Outline Coating Systems for Cutting and Forming Tools Automotive Parts Coating Systems Examples of Coated Automotive Components Glass Coating

More information

histaris Inline Sputtering Systems

histaris Inline Sputtering Systems vistaris histaris Inline Sputtering Systems Inline Sputtering Systems with Vertical Substrate Transport Modular System for Different Applications VISTARIS Sputtering Systems The system with the brand name

More information

THIN FILM COATING PLANTS

THIN FILM COATING PLANTS P&P Thin Film Advanced Technologies THIN FILM COATING PLANTS Coating plants parts and technologies PVD COATING TECHNOLOGIES SUMMARY INTRODUCTION... 3 1. VACUUM COATING SYSTEM... 3 1.1 VACUUM SYSTEM...

More information

Peculiarities of Titanium Compound Films Formation on Heat Sensitive Substrates by Electric Arc Vaporization

Peculiarities of Titanium Compound Films Formation on Heat Sensitive Substrates by Electric Arc Vaporization Peculiarities of Titanium Compound Films Formation on Heat Sensitive Substrates by Electric Arc Vaporization A. Vovsi and Y. Lipin, J/S Co Sidrabe, Latvia Keywords: darc vaporization; Polymer substrates;

More information

Deposition of Magnesium Silicide Nanoparticles by the Combination of Vacuum Evaporation and Hydrogen Plasma Treatment

Deposition of Magnesium Silicide Nanoparticles by the Combination of Vacuum Evaporation and Hydrogen Plasma Treatment Proc. Int. Conf. and Summer School on Advanced Silicide Technology 2014 JJAP Conf. Proc. 3 (2015) 011301 2015 The Japan Society of Applied Physics Deposition of Magnesium Silicide Nanoparticles by the

More information

Studying Target Erosion in Planar Sputtering Magnetrons Using a Discrete Model for Energetic Electrons

Studying Target Erosion in Planar Sputtering Magnetrons Using a Discrete Model for Energetic Electrons Studying Target Erosion in Planar Sputtering Magnetrons Using a Discrete Model for Energetic Electrons C. Feist * CENUMERICS Austria A. Plankensteiner, J. Winkler PLANSEE SE Austria INTRODUCTION PLANSEE

More information

Plasma ion assisted deposition with radio frequency powered plasma sources

Plasma ion assisted deposition with radio frequency powered plasma sources Plasma ion assisted deposition with radio frequency powered plasma sources H. Hagedorn, M. Klosch, H. Reus, A. Zoeller Leybold Optics GmbH, Siemensstrasse 88, 63755 Alzenau, Germany ABSTRACT The deposition

More information

State of the art in reactive magnetron sputtering

State of the art in reactive magnetron sputtering State of the art in reactive magnetron sputtering T. Nyberg, O. Kappertz, T. Kubart and S. Berg Solid State Electronics, The Ångström Laboratory, Uppsala University, Box 534, S-751 21 Uppsala, Sweden D.

More information

Metallization ( Part 2 )

Metallization ( Part 2 ) 1 Metallization ( Part 2 ) Chapter 12 : Semiconductor Manufacturing Technology by M. Quirk & J. Serda Saroj Kumar Patra TFE4180 Semiconductor Manufacturing Technology, Norwegian University of Science and

More information

Dry Etching and Reactive Ion Etching (RIE)

Dry Etching and Reactive Ion Etching (RIE) Dry Etching and Reactive Ion Etching (RIE) MEMS 5611 Feb 19 th 2013 Shengkui Gao Contents refer slides from UC Berkeley, Georgia Tech., KU, etc. (see reference) 1 Contents Etching and its terminologies

More information

High performance components from Gencoa for Research and Development Simply better tools to build your devices

High performance components from Gencoa for Research and Development Simply better tools to build your devices High performance components from Gencoa for Research and Development Simply better tools to build your devices With the range of Gencoa advanced thin film development tools at your disposal your research

More information

Chemical Vapor Deposition

Chemical Vapor Deposition Chemical Vapor Deposition Physical Vapor Deposition (PVD) So far we have seen deposition techniques that physically transport material from a condensed phase source to a substrate. The material to be deposited

More information

A versatile coating tool for reactive in-line sputtering in different pulse modes

A versatile coating tool for reactive in-line sputtering in different pulse modes Surface and Coatings Technology 14144 001 68634 A versatile coating tool for reactive in-line sputtering in different pulse modes P. Frach, K. Goedicke, C. Gottfried, H. Bartzsch Fraunhofer-Institut fur

More information

USING OPTICAL EMISSION SPECTROSCOPY TO IMPROVE EQUIPMENT UPTIME FOR AN AL2O3 ALD PROCESS *

USING OPTICAL EMISSION SPECTROSCOPY TO IMPROVE EQUIPMENT UPTIME FOR AN AL2O3 ALD PROCESS * USING OPTICAL EMISSION SPECTROSCOPY TO IMPROVE EQUIPMENT UPTIME FOR AN AL2O3 ALD PROCESS * JOHN LOO Samsung Austin Semiconductor 12100 Samsung Blvd. Austin, Texas 78754 * Presented at the AVS 5 th International

More information

Layer Deposition: Thermal Oxidation and CVD. Rupesh Gupta IIT Delhi Supervisor: Dr. Chacko Jacob

Layer Deposition: Thermal Oxidation and CVD. Rupesh Gupta IIT Delhi Supervisor: Dr. Chacko Jacob 1 Layer Deposition: Thermal Oxidation and CVD Rupesh Gupta IIT Delhi Supervisor: Dr. Chacko Jacob 2 OUTLINE Thermal Oxidation and Model o Factors Affecting Kinetics o Future Trends: Oxidation o CVD and

More information

Sputtering (cont.) and Other Plasma Processes

Sputtering (cont.) and Other Plasma Processes Sputtering (cont.) and Other Plasma Processes Sputtering Summary Create an ionic plasma by applying a high voltage to a glow tube. Ions bombard the target material at the cathode. Target atoms are ejected

More information

BB-18 Black Body High Vacuum System Technical Description

BB-18 Black Body High Vacuum System Technical Description BB-18 Black Body High Vacuum System Technical Description The BB-18 Black Body is versatile and is programmed for use as a fixed cold target at 80 K or variable target, at 80 K- 350 K no extra cost. The

More information

Physical Vapor Deposition of Coatings On Glass D. J. O Shaughnessy

Physical Vapor Deposition of Coatings On Glass D. J. O Shaughnessy Physical Vapor Deposition of Coatings On Glass D. J. O Shaughnessy Acknowledgements: Tom Waynar, Andrew Wagner, Ed Kapura, (PPG Industries, Inc.) PPG Confidential and Proprietary Information Outline Solar

More information

Multi-elemental determination of gasoline using Agilent 5100 ICP-OES with oxygen injection and a temperature controlled spray chamber

Multi-elemental determination of gasoline using Agilent 5100 ICP-OES with oxygen injection and a temperature controlled spray chamber Multi-elemental determination of gasoline using Agilent 5100 ICP-OES with oxygen injection and a temperature controlled spray chamber Application note Energy & chemicals, petrochemicals Authors Elizabeth

More information

III. Wet and Dry Etching

III. Wet and Dry Etching III. Wet and Dry Etching Method Environment and Equipment Advantage Disadvantage Directionality Wet Chemical Solutions Atmosphere, Bath 1) Low cost, easy to implement 2) High etching rate 3) Good selectivity

More information

Advancements in Laser Doppler Vibrometry for Ultrasonic Applications. Ultrasonics Industry Symposium Eric Lawrence, Polytec Inc.

Advancements in Laser Doppler Vibrometry for Ultrasonic Applications. Ultrasonics Industry Symposium Eric Lawrence, Polytec Inc. Advancements in Laser Doppler Vibrometry for Ultrasonic Applications Ultrasonics Industry Symposium Eric Lawrence, Polytec Inc. Contents Introduction to Laser Vibrometry New PSV-500 Scanning Vibrometer

More information

Plasmalab System400. Magnetron sputtering process tool for physical vapour deposition (PVD) The Business of Science TM

Plasmalab System400. Magnetron sputtering process tool for physical vapour deposition (PVD) The Business of Science TM Plasmalab System400 Magnetron sputtering process tool for physical vapour deposition (PVD) The Business of Science TM PlasmalabSystem400 Flexible multi-mode PVD tool dc magnetron sputtering for metals

More information

High rate low pressure PECVD for barrier and optical coatings

High rate low pressure PECVD for barrier and optical coatings High rate low pressure PECVD for barrier and optical coatings Steffen Günther, Matthias Fahland, John Fahlteich, Björn Meyer, Steffen Straach, Nicolas Schiller steffen.guenther@fep.fraunhofer.de Phone:

More information

SALES SPECIFICATION. SC7640 Auto/Manual High Resolution Sputter Coater

SALES SPECIFICATION. SC7640 Auto/Manual High Resolution Sputter Coater SALES SPECIFICATION SC7640 Auto/Manual High Resolution Sputter Coater Document Number SS-SC7640 Issue 1 (01/02) Disclaimer The components and packages described in this document are mutually compatible

More information

1. PECVD in ORGANOSILICON FED PLASMAS

1. PECVD in ORGANOSILICON FED PLASMAS F. FRACASSI Department of Chemistry, University of Bari (Italy) Plasma Solution srl SURFACE MODIFICATION OF POLYMERS AND METALS WITH LOW TEMPERATURE PLASMA OUTLINE METAL TREATMENTS 1 low pressure PECVD

More information

Chemical Sputtering. von Kohlenstoff durch Wasserstoff. W. Jacob

Chemical Sputtering. von Kohlenstoff durch Wasserstoff. W. Jacob Chemical Sputtering von Kohlenstoff durch Wasserstoff W. Jacob Centre for Interdisciplinary Plasma Science Max-Planck-Institut für Plasmaphysik, 85748 Garching Content: Definitions: Chemical erosion, physical

More information

We bring quality to light. MAS 40 Mini-Array Spectrometer. light measurement

We bring quality to light. MAS 40 Mini-Array Spectrometer. light measurement MAS 40 Mini-Array Spectrometer light measurement Features at a glance Cost-effective and robust CCD spectrometer technology Standard USB interface Compatible with all Instrument Systems measuring adapters

More information

NEW. EVEN MORE data acquisition and test stand automation

NEW. EVEN MORE data acquisition and test stand automation NEW EVEN MORE data acquisition and test stand automation the new class of data The plug&play complete package User benefits Expert Series is the latest generation of data acquisition Complete hardware

More information

Physical Vapor Deposition (PVD) S. 1

Physical Vapor Deposition (PVD) S. 1 Physical Vapor Deposition (PVD) PVD@Rattanachan S. 1 PVD proceses are atomistic where material vaporized from a solid or liquid source is transported as a vapor through a vacuum or low-pressure gaseous

More information

TVA tungsten plasma parameters for hard coatings

TVA tungsten plasma parameters for hard coatings TVA tungsten plasma parameters for hard coatings C. Porosnicu 1,M.Osiac 2,E.Osiac 3,C.P.Lungu 1 1 National Institute for Laser, Plasma and Radiation Physics, Magurele, 077125, Romania 2 Faculty of Physics,

More information

Molybdenum Etchants Study Surajit Sutar University of Notre Dame

Molybdenum Etchants Study Surajit Sutar University of Notre Dame The purpose of this Molybdenum etching study is to find a Molybdenum metallization process without involving a Lift-Off. Molybdenum, a refractory metal, when evaporated by an E-beam, causes a significant

More information

Instruction and Maintenance Manual

Instruction and Maintenance Manual Instruction and Maintenance Manual GRYF OXY P 0/100/2 PM Contact GRYF HB, spol. s r.o. Cechova 314 Havlickuv Brod 580 01 tel.: +420 569 426 627 fax: +420 569 426 627 Czech Republic www.gryf.eu Technical

More information

THIN FILM COMPONENTS FOR Li-ion MICROBATTERIES

THIN FILM COMPONENTS FOR Li-ion MICROBATTERIES THIN FILM COMPONENTS FOR Li-ion MICROBATTERIES J. Přidal a, J. Prachařová a, J. Bludská b, I. Jakubec b a Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 180 00 Prague 8,

More information

Physical Vapor Deposition (PVD): SPUTTER DEPOSITION

Physical Vapor Deposition (PVD): SPUTTER DEPOSITION We saw CVD PECVD Physical Vapor Deposition (PVD): SPUTTER DEPOSITION Gas phase reactants: P g 1 mtorr to 1 atm. Good step coverage, T > > RT Plasma enhanced surface diffusion without need for elevated

More information

Reactive Sputtering Using a Dual-Anode Magnetron System

Reactive Sputtering Using a Dual-Anode Magnetron System Reactive Sputtering Using a Dual-Anode Magnetron System A. Belkind and Z. Zhao, Stevens Institute of Technology, Hoboken, NJ; and D. Carter, G. McDonough, G. Roche, and R. Scholl, Advanced Energy Industries,

More information

Electron Beam and Sputter Deposition Choosing Process Parameters

Electron Beam and Sputter Deposition Choosing Process Parameters Electron Beam and Sputter Deposition Choosing Process Parameters General Introduction The choice of process parameters for any process is determined not only by the physics and/or chemistry of the process,

More information

TURBOtech srl. SED-635 Digital Excitation System. Industrial Electronics Sector FEATURES

TURBOtech srl. SED-635 Digital Excitation System. Industrial Electronics Sector FEATURES SED-635 Digital Excitation System SED-635 is a complete excitation system capable of adapting to control synchronous generators of any size. The integration of the TOUCH SCREEN operator interface and a

More information

Plasma Electronic is Partner of. Tailor-Made Surfaces by Plasma Technology

Plasma Electronic is Partner of. Tailor-Made Surfaces by Plasma Technology Precision Fair 2013 Stand 171 Plasma Electronic is Partner of Tailor-Made Surfaces by Plasma Technology Dr. J. Geng, Plasma Electronic GmbH Modern Surface Technology in 1900 Overview A short introduction

More information

Chemistry Instrumental Analysis Lecture 28. Chem 4631

Chemistry Instrumental Analysis Lecture 28. Chem 4631 Chemistry 4631 Instrumental Analysis Lecture 28 Gas Chromatography Detectors Gas Chromatography Monitors the column effluent and produces an electrical signal that is proportional to the amount of analyte

More information

Ion Beam Sputtering: Practical Applications to Electron Microscopy

Ion Beam Sputtering: Practical Applications to Electron Microscopy Ion Beam Sputtering: Practical Applications to Electron Microscopy Applications Laboratory Report Introduction Electron microscope specimens, both scanning (SEM) and transmission (TEM), often require a

More information

Development of High-Speed High-Precision Cooling Plate

Development of High-Speed High-Precision Cooling Plate Hironori Akiba Satoshi Fukuhara Ken-ichi Bandou Hidetoshi Fukuda As the thinning of semiconductor device progresses more remarkably than before, uniformity within silicon wafer comes to be strongly required

More information

Intrinsic graphene field effect transistor on amorphous carbon films

Intrinsic graphene field effect transistor on amorphous carbon films 1 Intrinsic graphene field effect transistor on amorphous carbon films S.S. Tinchev* Institute of Electronics, Bulgarian Academy of Sciences, Sofia 1784, Bulgaria Abstract: Fabrication of graphene field

More information

Deposition of Silicon Oxide, Silicon Nitride and Silicon Carbide Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology

Deposition of Silicon Oxide, Silicon Nitride and Silicon Carbide Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology General Plasma, Inc. 546 East 25th Street Tucson, Arizona 85713 tel. 520-882-5100 fax. 520-882-5165 and Silicon Carbide Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology M.

More information

World s Best Oil in Water Analyzers

World s Best Oil in Water Analyzers World s Best Oil in Water Analyzers Advanced Water Measurement and Analysis Advanced Sensors Ltd is the leading global supplier of Oil in Water analyzers to the Oil and Gas Industries. We provide innovative

More information

2. Deposition process

2. Deposition process Properties of optical thin films produced by reactive low voltage ion plating (RLVIP) Antje Hallbauer Thin Film Technology Institute of Ion Physics & Applied Physics University of Innsbruck Investigations

More information

Computer Controlled Generating Stations Control and Regulation Simulator, with SCADA SCE

Computer Controlled Generating Stations Control and Regulation Simulator, with SCADA SCE Technical Teaching Equipment Computer Controlled Generating Stations Control and Regulation Simulator, with SCADA SCE EDIBON SCADA System Teaching Technique used 4 5 2 Data Acquisition Board Cables and

More information

Artisan Technology Group is your source for quality new and certified-used/pre-owned equipment

Artisan Technology Group is your source for quality new and certified-used/pre-owned equipment Artisan Technology Group is your source for quality new and certified-used/pre-owned equipment FAST SHIPPING AND DELIVERY TENS OF THOUSANDS OF IN-STOCK ITEMS EQUIPMENT DEMOS HUNDREDS OF MANUFACTURERS SUPPORTED

More information

Local Heating Attacks on Flash Memory Devices. Dr Sergei Skorobogatov

Local Heating Attacks on Flash Memory Devices. Dr Sergei Skorobogatov Local Heating Attacks on Flash Memory Devices Dr Sergei Skorobogatov http://www.cl.cam.ac.uk/~sps32 email: sps32@cam.ac.uk Introduction Semi-invasive attacks were introduced in 2002 ( Optical fault induction

More information

WHITEPAPER ENHANCED REACTIVELY SPUTTERED AL 2 O 3 DEPOSITION BY ADDITION OF ACTIVATED REACTIVE OXYGEN

WHITEPAPER ENHANCED REACTIVELY SPUTTERED AL 2 O 3 DEPOSITION BY ADDITION OF ACTIVATED REACTIVE OXYGEN WHITEPAPER By D. Carter and G. McDonough of Advanced Energy Industries, Inc. ENHANCED REACTIVELY The impact of preactivation of oxygen in the reactive sputter deposition of Al 2 O 3 is investigated. Oxygen,

More information

Differential and bidirectional differential pressure sensors, taking AMS 5812 as an example

Differential and bidirectional differential pressure sensors, taking AMS 5812 as an example In pressure sensor technology there is a difference between various physical methods of measurement, depending on the application. These include the measurement of absolute pressure, relative pressure,

More information

INFITEC - A NEW STEREOSCOPIC VISUALISATION TOOL BY WAVELENGTH MULTIPLEX IMAGING

INFITEC - A NEW STEREOSCOPIC VISUALISATION TOOL BY WAVELENGTH MULTIPLEX IMAGING INFITEC - A NEW STEREOSCOPIC VISUALISATION TOOL BY WAVELENGTH MULTIPLEX IMAGING Helmut Jorke, Markus Fritz INFITEC GmbH, Lise-Meitner-Straße 9, 89081 Ulm info@infitec.net Phone +49 731 550299 56 Fax _

More information

Spectral Measurement Solutions for Industry and Research

Spectral Measurement Solutions for Industry and Research Spectral Measurement Solutions for Industry and Research Hamamatsu Photonics offers a comprehensive range of products for spectroscopic applications, covering the, Visible and Infrared regions for Industrial,

More information

Computer simulation of coating processes with monochromatic monitoring

Computer simulation of coating processes with monochromatic monitoring Computer simulation of coating processes with monochromatic monitoring A. Zöller, M. Boos, H. Hagedorn, B. Romanov Leybold Optics GmbH, Siemensstrasse 88, 655 Alzenau, Germany ABSTRACT For the production

More information

Modular Glovebox Systems Gas Purifier Units Antechambers Accessories

Modular Glovebox Systems Gas Purifier Units Antechambers Accessories Modular Glovebox Systems Gas Purifier Units Antechambers Accessories INERTGAS TECHNOLOGY Modular glovebox with screwed in flanged side panels Easy to extend or modify while keeping a flat work place Define

More information

INUBIA B 6 & B12 DURABLE COLOUR PVD COATINGS

INUBIA B 6 & B12 DURABLE COLOUR PVD COATINGS INUBIA B 6 & B12 DURABLE COLOUR PVD COATINGS INUBIA B6 & B12 VERSATILE COLOUR COATINGS FOR DESIGN PARTS Oerlikon Balzers INUBIA B6 and B12 coating systems provide unmatched versatility of reproducible

More information

Sputtered AlN Thin Films on Si and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties

Sputtered AlN Thin Films on Si and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties Sputtered AlN Thin Films on and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties S. Mishin, D. R. Marx and B. Sylvia, Advanced Modular Sputtering,

More information

Computer Controlled Vortex Tube Refrigerator Unit, with SCADA TPVC

Computer Controlled Vortex Tube Refrigerator Unit, with SCADA TPVC Technical Teaching Equipment Computer Controlled Vortex Tube Refrigerator Unit, with SCADA TPVC Teaching Technique used EDIBON SCADA System 2 Control Interface Box 5 Cables and Accessories 6 Manuals 3

More information

Anna Serdyuchenko, Victor Gorshelev, Mark Weber John P. Burrows University of Bremen, Institute for Environmental Physics

Anna Serdyuchenko, Victor Gorshelev, Mark Weber John P. Burrows University of Bremen, Institute for Environmental Physics Anna Serdyuchenko, Victor Gorshelev, Mark Weber John P. Burrows University of Bremen, Institute for Environmental Physics 3-5 June 2013 ACSO meeting WMO Geneva, Switzerland 1 Graphics: DLR-IMF 3-5 June

More information

Tadahiro Yasuda. Introduction. Overview of Criterion D200. Feature Article

Tadahiro Yasuda. Introduction. Overview of Criterion D200. Feature Article F e a t u r e A r t i c l e Feature Article Development of a High Accuracy, Fast Response Mass Flow Module Utilizing Pressure Measurement with a Laminar Flow Element (Resistive Element) Criterion D200

More information

Technical Information POWER PLANT CONTROLLER

Technical Information POWER PLANT CONTROLLER Technical Information POWER PLANT CONTROLLER Content The Power Plant Controller offers intelligent and flexible solutions for the control of all PV power plants in the megawatt range. It is suitable for

More information

High performance. Architectural glazings utilise thin. low-emissivity coating. Coating technology

High performance. Architectural glazings utilise thin. low-emissivity coating. Coating technology Coating technology High performance low-emissivity coating Growing concern with energy efficiency has sparked the development of double low-emissivity coatings in architectural glass. BOC Coating has designed

More information

Special Edition. Review. White Light LEDs. Importance of Accepted Measurement Standards. LpR

Special Edition. Review. White Light LEDs. Importance of Accepted Measurement Standards.  LpR www.led-professional.com ISSN 1993-890X Review The technology of tomorrow for general lighting applications. Nov/Dec 2008 Issue 10 LpR White Light LEDs Importance of Accepted Measurement Standards Special

More information

NANO SILICON DOTS EMBEDDED SIO 2 /SIO 2 MULTILAYERS FOR PV HIGH EFFICIENCY APPLICATION

NANO SILICON DOTS EMBEDDED SIO 2 /SIO 2 MULTILAYERS FOR PV HIGH EFFICIENCY APPLICATION NANO SILICON DOTS EMBEDDED SIO 2 /SIO 2 MULTILAYERS FOR PV HIGH EFFICIENCY APPLICATION Olivier Palais, Damien Barakel, David Maestre, Fabrice Gourbilleau and Marcel Pasquinelli 1 Outline Photovoltaic today

More information

T5 Watt-Miser Linear Fluorescent lamps

T5 Watt-Miser Linear Fluorescent lamps GE Lighting T5 Watt-Miser Linear Fluorescent lamps DATA SHEET T5 Watt-Miser High Efficiency 13W, 20W, 26W, 33W T5 Watt-Miser High Output 21W, 36W, 46W, 51W, 76W Product information T5 Watt-Miser lamps

More information

# 2. Selecting and Using Thermistors for Temperature Control

# 2. Selecting and Using Thermistors for Temperature Control # 2 Selecting and Using Thermistors for Temperature Control Selecting and Using Thermistors for Temperature Control Thermally sensitive resistors (thermistors) are used widely in laser diode and detector

More information

PSI AP Chemistry Unit 1 MC Homework. Laws of Multiple and Definite Proportions and Conservation of Mass

PSI AP Chemistry Unit 1 MC Homework. Laws of Multiple and Definite Proportions and Conservation of Mass PSI AP Chemistry Unit 1 MC Homework Name Laws of Multiple and Definite Proportions and Conservation of Mass 1. Dalton's atomic theory explained the observation that the percentage by mass of the elements

More information

By Randy Heckman, Gregory Roche, James R. Usher of Advanced Energy Industries, Inc.

By Randy Heckman, Gregory Roche, James R. Usher of Advanced Energy Industries, Inc. WHITEPAPER By Randy Heckman, Gregory Roche, James R. Usher of Advanced Energy Industries, Inc. THE EVOLUTION OF RF POWER DELIVERY IN Radio frequency (RF) technology has been around since the beginnings

More information

Large Area Sputter Deposition for Metal Oxide TFT Applications using Rotary Cathode Technology

Large Area Sputter Deposition for Metal Oxide TFT Applications using Rotary Cathode Technology Large Area Sputter Deposition for Metal Oxide TFT Applications using Rotary Cathode Technology Marcus Bender R&D PVD Display Applied Materials FPD International China, Beijing September 11 th, 2013 Trends

More information

Carl Zeiss SMT GmbH. Thermal Fluid-Structure Analysis of an optical Device including Radiation and Conduction

Carl Zeiss SMT GmbH. Thermal Fluid-Structure Analysis of an optical Device including Radiation and Conduction Carl Zeiss SMT GmbH Star European Conference March 22-23, 2011 Noordwijk Thermal Fluid-Structure Analysis of an optical Device including Radiation and Conduction Timo Laufer Senior Engineer Carl Zeiss

More information

What is Laser Ablation? Mass removal by coupling laser energy to a target material

What is Laser Ablation? Mass removal by coupling laser energy to a target material Laser Ablation Fundamentals & Applications Samuel S. Mao Department of Mechanical Engineering University of California at Berkeley Advanced Energy Technology Department March 1, 25 Laser Ablation What

More information

Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry

Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry Thomas Waechtler a, Bernd Gruska b, Sven Zimmermann a, Stefan E. Schulz a, Thomas Gessner a a Chemnitz University

More information

COMBIMASS. Technical Data COMBIMASS eco-bio +

COMBIMASS. Technical Data COMBIMASS eco-bio + COMBIMASS Technical Data THE SYSTEM COMBIMASS The field transmitters of the COMBIMASS eco series are suitable for gas flow measurement and cover a wide range of different applications. The instruments

More information

GFT6011 3GHz Transient Digitizer

GFT6011 3GHz Transient Digitizer FEATURES 1 channel 10-bit vertical resolution 10 GS/s sampling rate DC to 3 GHz Analog Bandwidth 2 dbm full scale range External Trigger with 20ps TDC 1 M Samples data memory Controlled via Ethernet or

More information

MATRIX borehole logging system

MATRIX borehole logging system MATRIX borehole logging system Combining their long experience in the slimhole logging industry Mount Sopris and ALT have teamed up to develop M A T R I X, providing a single solution to the multiplication

More information

Deposition of Thin Metal Films " (on Polymer Substrates)!

Deposition of Thin Metal Films  (on Polymer Substrates)! Deposition of Thin Metal Films " (on Polymer Substrates)! Shefford P. Baker! Cornell University! Department of Materials Science and Engineering! Ithaca, New York, 14853! MS&E 5420 Flexible Electronics,

More information

In semiconductor applications, the required mass flows

In semiconductor applications, the required mass flows Model-Based Multi-GasMulti-Range Mass Flow Controllers With Single Gas Calibration and Tuning JOOST LÖTTERS A model has been developed that accurately predicts the behavior of the flow sensor combined

More information

Flexible glass substrates for continuous manufacturing

Flexible glass substrates for continuous manufacturing Science & Technology Flexible glass substrates for continuous manufacturing Corning - S. Garner, G. Merz, J. Tosch, J. Matusick, X. Li, D. Marshall CAMM - C. Chase, J. Steiner, D. Yepez, J. Switzer, P.

More information

Vacuum Basics. 1. Units. 2. Ideal Gas Law: PV = NkT

Vacuum Basics. 1. Units. 2. Ideal Gas Law: PV = NkT Vacuum Basics 1. Units 1 atmosphere = 760 torr = 1.013x105 Pa 1 bar = 105 Pa = 750 torr 1 torr = 1 mm Hg 1 mtorr = 1 micron Hg 1Pa = 7.5 mtorr = 1 newton/m2 1 torr = 133.3 Pa 2. Ideal Gas Law: PV = NkT

More information

Operating Manual Fast Thermal Conductivity Detector FTC110-OEM

Operating Manual Fast Thermal Conductivity Detector FTC110-OEM Operating Manual Fast Thermal Conductivity Detector FTC110-OEM Version 12_09 Messkonzept GmbH Operating Manual 2 1. Features Precise and long term stable thermal conductivity measurement High sensitivity

More information

DUST EMISSION MONITORING SYSTEM

DUST EMISSION MONITORING SYSTEM Applications Measurement of dust concentration in dry or moist, steamsaturated and corrosive stack gases Monitoring of municipal and hazardous waste and sewage sludge incinerators Monitoring of power plants

More information

Astronomy 421. Lecture 8: Stellar Spectra

Astronomy 421. Lecture 8: Stellar Spectra Astronomy 421 Lecture 8: Stellar Spectra 1 Key concepts: Stellar Spectra The Maxwell-Boltzmann Distribution The Boltzmann Equation The Saha Equation 2 UVBRI system Filter name Effective wavelength (nm)

More information

Solar Cells Texturing Process Monitoring

Solar Cells Texturing Process Monitoring Solar Cells Texturing Process Monitoring HF/HNO3/H2SiF6, KOH/IPA and NaOH/IPA Introduction Texturing is an important step in the manufacturing of a Silicon solar cell, both mono and polycrystalline. This

More information

WEBER ULTRASONICS Page 1

WEBER ULTRASONICS Page 1 WEBER ULTRASONICS Page 1 WEBER ULTRASONICS WEBER ULTRASONICS Page 2 ULTRASONIC TECHNOLOGY BASICS» Sound is a pressure wave which propagates in elastic media such as gases, fluids and rigid bodies. p Sound

More information

1/11 CO2 DOSAGE SYSTEMS. CO2 dosage system consists of following parts;

1/11 CO2 DOSAGE SYSTEMS. CO2 dosage system consists of following parts; 1/11 CO2 DOSAGE SYSTEMS CO2 dosage system consists of following parts; 1 - O2 trim system with micro processing burner (automatic combustion monitoring), 2 - Other components of O2 trim system, 3 - CO2

More information