TK6103 MEMS key expertise, key projects, key customers, highlights Jyrki Kiihamäki VTT Technical Research Centre of Finland

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1 TK6103 MEMS key expertise, key projects, key customers, highlights Jyrki Kiihamäki VTT Technical Research Centre of Finland

2 2 Sales speech (to be used while standing in elevator) We turn MEMS design ideas into working wafer level prototypes using our superior competence in development of process steps and seamlessly integrating them into functional fabrication process flows Our customers are mainly companies somehow involved in MEMS device supply chain (materials, equipment, and sensor manufacturers) Our strenghts are long experience in key areas of this multi-disciplinary field, good relationships with the other local and international players, and mastering of the toolset available in Micronova clean room We differentiate ourselves from others by having Widest set of processing competences High proportion of female scientists

3 3 Expertise IC-compatible MEMS process development and process integration DRIE (deep silicon etching) and SOI-MEMS Sacrificial layer etching (wet, HF-vapor etching, O 2 -plasma) Thin film MEMS (surface micromachining, polysilicon MEMS, ALD films, integration of piezo-films) Amorphous metals Wafer bonding Devices Si resonators FPI, thermopiles, IR-sources Magnetometers, accelometers Pressure sensors and many more

4 4 Projects Customers Vaisto (Vaisala production) Si-resonators (VTI cooperation) CSOI research (in several projects) E3car, ESIP Alebond IQ-Fuel (MEMS parts) Cosy-3D MEMS Relia VTI Technologies Oy Okmetic Oyj Vaisala Picosun, IR, Oxford Instruments,

5 5 Highlights DRIE development Etch result Width at a top 210 nm Depth 16.6 um aspect ratio 80:1 Reticle opening 1.2 um Visible light FPI ALD-nanolaminates CSOI accelometers Resonators

6 6 Publications 2010 Electrically tunable surface micromachined Fabry-Perot interferometer for visible light Blomberg, Martti; Kattelus, Hannu; Miranto, Akseli Sensors and Actuators A: Physical. Elsevier. Vol. 162 (2010), ALD thin films in MEMS Fabry-Perot interferometers Rissanen, Anna; Blomberg, Martti; Puurunen, Riikka; Kattelus, Hannu 10th International Conference on Atomic Layer Deposition, ALD Seoul, South-Korea, June Conference DVD. The Materials Research Society of Korea. Seoul (2010) Experimental study of the effects of size variations on piezoelectrically transduced MEMS resonators Jaakkola, Antti; Lamy, J.; Dekker, James; Pensala, Tuomas 2010 IEEE International Frequency Control Symposium (FCS). Newport Beach, CA, USA, 1-4 June IEEE. Piscataway, NJ, USA (2010), MEMS and piezo actuator based Fabry-Perot interferometer technologies and applications at VTT Antila, Jarkko; Miranto, Akseli; Mäkynen, Jussi; Laamanen, Mari; Rissanen, Anna; Blomberg, Martti; Saari, Heikki; Malinen, Jouko Next-Generation Spectroscopic Technologies III. Orlando, FL, USA, 5-6 April 2010 Proceedings of SPIE - The International Society for Optical Engineering, Article number 76800U. Vol (2010) Electrically tunable surface micromachined Fabry-Perot interferometer for visible light Blomberg, Martti; Kattelus, Hannu; Miranto, A. Sensors and Actuators A: Physical. Vol. 162 (2010) No: 2, Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra Laamanen, Mari; Blomberg, Martti; Puurunen, Riikka; Miranto, Akseli; Kattelus, Hannu Sensors and Actuators A: Physical. Vol. 162 (2010) No: 2, Low-Temperature Processes for MEMS Device Fabrication Kiihamäki, Jyrki; Kattelus, Hannu; Blomberg, Martti; Puurunen, Riikka; Laamanen, Mari; Pekko, Panu; Saarilahti, Jaakko; Ritala, Heini; Rissanen, Anna NATO Science for Peace and Security Series B: Physics and Biophysics : Advanced Materials and Technologies for Micro/Nano-Devices, Sensors and Actuators. Part 3. Springer. The Netherlands (2010), A process for SOI resonators with surface micromachined covers and reduced electrostatic gaps Dekker, James, R.; Alastalo, Ari; Kattelus, Hannu Journal of Micromechanics and Microengineering. IOP Science. Vol. 20 (2010) No: 4, Atomic layer deposition in MEMS technology (chapter 26) Puurunen, Riikka; Kattelus, Hannu; Suntola, Tuomo Handbook of Silicon Based MEMS Materials and Technologies. Elsevier. Boston, USA; Oxford, UK (2010), Studies on aluminium corrosion during and after HF vapour treatment Ritala, Heini; Kiihamäki, Jyrki; Heikkilä, Mikko Microelectronic Engineering. Vol. 87 (2010) No: 3,

7 7 Faces from Welppu, in no particular order Riikka Panu Meeri Mari Kirsi Jyrki Jaakko Heini Gao Ari Anna James Martti is currently the CTO of VTT Memfab Ltd.

8 8 HF vapor etching of SiO 2 Applications: Release etching: No drying, non sticking, fragile small structures Dry mask oxide etching Does not etch Al Resonators, Fabry Perot interferometers Process gases: Anhydrous HF Ethanol Nitrogen Temperature 45 C Pressure bar 3 pcs 150 or 200 mm wafers, carrier for pieces Etch rate of thermal oxide 0.1 bar 10 nm/min and 0.2 bar 100 nm/min H 2 O ( and EtOH) ionizes HF and thereby initiates etching reaction: 2HF + H 2 O HF 2- + H 3 O + SiO 2 + 2HF H 3 O + SiF 4 + 4H 2 O - Water initiates & catalyses process - Ethanol scavenges water vapor from the wafer surface & catalyses etching reaction

9 9 Monolithically integrated visible light spectrometer Scientific and technological outcome Target of the project: fabricating and characterizing monolithically integrated ( =500 nm) FPIs on photodiodes as well as separate MEMS FPIs for visible light, and realizing a miniature spectrometer demonstration for Hannover Messe Main results: First in the world technology: fabrication of monolithically integrated FPIs on photodiodes for = 500 nm Extending the wavelength range of ALD FPI technology - fabrication of the separate FPI chips for = 420 nm/500 nm and testing of structures for = 600 nm/670 nm/750nm Realization of miniature pen spectrometer demonstration (measurement range 430 nm 570 nm) for Hannover Messe First in the world MEMS FPI aperture size: largest diameter 2mm (market competitor 1,95 mm) Exploitation potentiality: fluorescence imaging in diagnostics, industrial (bio)process monitoring, colorimetry for waste water analysis, environmental monitoring Monolithical FPI measurement results Contact person: Anna Rissanen

10 10 MEMS team summary (impartially balanced scorecard) People Highly skilled, multidisciplinary team, 60% of researchers have doctors degree (chemistry, physics, electronics) 20% of researchers are from abroad Big equipment responsibilities (stepper, plasma etchers, vapor etcher, spin etcher, ALD, PECVD) Projects Mainly jointly funded projects (~ 65%) Profitable contract research (~ 25%) Basic funding (< 10%) Average utilization rate ~85% Scientific publications (according to JURE: ten publications in 2010)

11 11 WANTED! dead or alive A research scientist with slanted sense of humour Special characteristics: Expertise in clean room work and process development Knowledge on analysis methods and tools, process & device modelling and simulation tools Education: Higher university degree in Electronics, Physics or Chemistry (Doctoral degree is a bonus) Background: Industry or international experience is highly appreciated, too This is just an advance warning. Official announcement will be published Feb/Mar 2011, meanwhile you can fill open application

12 12 VTT creates business from technology