Introduction to CMOS VLSI Design. Lecture 6: Wires. David Harris

Similar documents
Advanced VLSI Design CMOS Processing Technology

Module 7 : I/O PADs Lecture 33 : I/O PADs

Here we introduced (1) basic circuit for logic and (2)recent nano-devices, and presented (3) some practical issues on nano-devices.

Lecture 030 DSM CMOS Technology (3/24/10) Page 030-1

On-Chip Interconnect: The Past, Present, and Future

StarRC Custom: Next-Generation Modeling and Extraction Solution for Custom IC Designs

Alpha CPU and Clock Design Evolution

Fabrication and Manufacturing (Basics) Batch processes

The MOSFET Transistor

Efficient Interconnect Design with Novel Repeater Insertion for Low Power Applications

Introduction to VLSI Fabrication Technologies. Emanuele Baravelli

MADR TR. Quad Driver for GaAs FET or PIN Diode Switches and Attenuators. Functional Schematic. Features. Description. Pin Configuration 2

" PCB Layout for Switching Regulators "

EE 42/100 Lecture 24: Latches and Flip Flops. Rev B 4/21/2010 (2:04 PM) Prof. Ali M. Niknejad

IL2225 Physical Design

Chapter 10 Advanced CMOS Circuits

STMicroelectronics. Deep Sub-Micron Processes 130nm, 65 nm, 40nm, 28nm CMOS, 28nm FDSOI. SOI Processes 130nm, 65nm. SiGe 130nm

Title Page Paper title: Optimal Shielding/Spacing Metrics for Low Power Design

Layout of Multiple Cells

Sequential 4-bit Adder Design Report

e.g. τ = 12 ps in 180nm, 40 ps in 0.6 µm Delay has two components where, f = Effort Delay (stage effort)= gh p =Parasitic Delay

Digital to Analog Converter. Raghu Tumati

MADR TR. Quad Driver for GaAs FET or PIN Diode Switches and Attenuators Rev. 4. Functional Schematic. Features.

Lecture 5: Gate Logic Logic Optimization

LUXEON LEDs. Circuit Design and Layout Practices to Minimize Electrical Stress. Introduction. Scope LED PORTFOLIO

Introduction to CMOS VLSI Design

Layout and Cross-section of an inverter. Lecture 5. Layout Design. Electric Handles Objects. Layout & Fabrication. A V i

MADR TR. Single Driver for GaAs FET or PIN Diode Switches and Attenuators Rev. V1. Functional Schematic. Features.

Optimization and Comparison of 4-Stage Inverter, 2-i/p NAND Gate, 2-i/p NOR Gate Driving Standard Load By Using Logical Effort

Pass Gate Logic An alternative to implementing complex logic is to realize it using a logic network of pass transistors (switches).

Semiconductor Memories

Bi-directional FlipFET TM MOSFETs for Cell Phone Battery Protection Circuits

Evaluating AC Current Sensor Options for Power Delivery Systems

CHAPTER 11: Flip Flops

Intel Q3GM ES 32 nm CPU (from Core i5 660)

Winbond W2E512/W27E257 EEPROM

Static-Noise-Margin Analysis of Conventional 6T SRAM Cell at 45nm Technology

Push-Pull FET Driver with Integrated Oscillator and Clock Output

ICS514 LOCO PLL CLOCK GENERATOR. Description. Features. Block Diagram DATASHEET

TS555. Low-power single CMOS timer. Description. Features. The TS555 is a single CMOS timer with very low consumption:

10 BIT s Current Mode Pipelined ADC

Analog & Digital Electronics Course No: PH-218

Status of the design of the TDC for the GTK TDCpix ASIC

INSTITUTE OF AERONAUTICAL ENGINEERING Dundigal, Hyderabad

Class 11: Transmission Gates, Latches

Lecture 5: Logical Effort

A 2-Slot Time-Division Multiplexing (TDM) Interconnect Network for Gigascale Integration (GSI)

CMOS Logic Integrated Circuits

ECE124 Digital Circuits and Systems Page 1

NTE2053 Integrated Circuit 8 Bit MPU Compatible A/D Converter

Module 4 : Propagation Delays in MOS Lecture 22 : Logical Effort Calculation of few Basic Logic Circuits

Bi-directional level shifter for I²C-bus and other systems.

PCB Design Conference - East Keynote Address EMC ASPECTS OF FUTURE HIGH SPEED DIGITAL DESIGNS

Class 18: Memories-DRAMs

EM Noise Mitigation in Circuit Boards and Cavities

Printed-Circuit-Board Layout for Improved Electromagnetic Compatibility

Core Power Delivery Network Analysis of Core and Coreless Substrates in a Multilayer Organic Buildup Package

Lecture 10: Latch and Flip-Flop Design. Outline

Winbond W971GG6JB-25 1 Gbit DDR2 SDRAM 65 nm CMOS DRAM Process

Notes about Small Signal Model. for EE 40 Intro to Microelectronic Circuits

Op-Amp Simulation EE/CS 5720/6720. Read Chapter 5 in Johns & Martin before you begin this assignment.

Integrated Circuits & Systems

Supercapacitors. Advantages Power density Recycle ability Environmentally friendly Safe Light weight

TRUE SINGLE PHASE CLOCKING BASED FLIP-FLOP DESIGN

Signal integrity in deep-sub-micron integrated circuits

A Lesson on Digital Clocks, One Shots and Counters

Signal Integrity: Tips and Tricks

A Lesson on Digital Clocks, One Shots and Counters

ANN Based Modeling of High Speed IC Interconnects. Q.J. Zhang, Carleton University

Introduction to CMOS VLSI Design (E158) Lecture 8: Clocking of VLSI Systems

How To Design A Chip Layout

Implementation Of High-k/Metal Gates In High-Volume Manufacturing

A Practical Guide to Free Energy Devices

ATE-A1 Testing Without Relays - Using Inductors to Compensate for Parasitic Capacitance

AP331A XX G - 7. Lead Free G : Green. Packaging (Note 2)

(Amplifying) Photo Detectors: Avalanche Photodiodes Silicon Photomultiplier

MOS Transistors as Switches

True Single Phase Clocking Flip-Flop Design using Multi Threshold CMOS Technique

Topics of Chapter 5 Sequential Machines. Memory elements. Memory element terminology. Clock terminology

C39E.pdf Jul.20,2010

Supply voltage Supervisor TL77xx Series. Author: Eilhard Haseloff

NEW adder cells are useful for designing larger circuits despite increase in transistor count by four per cell.

THE INVERTER DYNAMICS

Reconfigurable ECO Cells for Timing Closure and IR Drop Minimization. TingTing Hwang Tsing Hua University, Hsin-Chu

New High Current MOSFET Module Offers 177 µω R DS(on)

Objective. Testing Principle. Types of Testing. Characterization Test. Verification Testing. VLSI Design Verification and Testing.

Application Note AN:005. FPA Printed Circuit Board Layout Guidelines. Introduction Contents. The Importance of Board Layout

Application Note AN-940

Sheet Resistance = R (L/W) = R N L

INF4420. Outline. Layout and CMOS processing technology. CMOS Fabrication overview. Design rules. Layout of passive and active componets.

Title : Analog Circuit for Sound Localization Applications

CMOS Power Consumption and C pd Calculation

4 SENSORS. Example. A force of 1 N is exerted on a PZT5A disc of diameter 10 mm and thickness 1 mm. The resulting mechanical stress is:

DESIGN CHALLENGES OF TECHNOLOGY SCALING

Voltage, Current, Resistance, Capacitance and Inductance

Precision Analog Designs Demand Good PCB Layouts. John Wu

Silicon-On-Glass MEMS. Design. Handbook

Field-Effect (FET) transistors

An Efficient Reduction Algorithm for Computation of Interconnect Delay Variability for Statistical Timing Analysis in Clock Tree Planning

IEC ESD Immunity and Transient Current Capability for the SP72X Series Protection Arrays

Transcription:

Introduction to CMOS VLSI Design Lecture 6: Wires David Harris Harvey Mudd College Spring 2004

Introduction Chips are mostly made of wires called interconnect In stick diagram, wires set size Transistors are little things under the wires Many layers of wires Wires are as important as transistors Speed Power Noise Alternating layers run orthogonally Slide 3

Wire Geometry Pitch = w + s Aspect ratio: AR = t/w Old processes had AR << 1 Modern processes have AR 2 Pack in many skinny wires w s l t h Slide 4

Layer Stack AMI 0.6 µm process has 3 metal layers Modern processes use 6-10+ metal layers Example: Intel 180 nm process M1: thin, narrow (< 3λ) High density cells M2-M4: thicker For longer wires M5-M6: thickest For V DD, GND, clk Layer T (nm) W (nm) S (nm) AR 6 1720 860 860 2.0 1000 5 1600 800 800 2.0 1000 4 1080 540 540 2.0 700 3 700 320 320 2.2 700 2 700 320 320 2.2 700 1 480 250 250 1.9 800 Substrate Slide 5

Wire Resistance ρ = resistivity (Ω*m) R = w l t Slide 6

Choice of Metals Until 180 nm generation, most wires were aluminum Modern processes often use copper Cu atoms diffuse into silicon and damage FETs Must be surrounded by a diffusion barrier Metal Silver (Ag) Copper (Cu) Gold (Au) Aluminum (Al) Tungsten (W) Molybdenum (Mo) Bulk resistivity (mw*cm) 1.6 1.7 2.2 2.8 5.3 5.3 Slide 9

Sheet Resistance Typical sheet resistances in 180 nm process Layer Sheet Resistance (W/ ) Diffusion (silicided) 3-10 Diffusion (no silicide) 50-200 Polysilicon (silicided) 3-10 Polysilicon (no silicide) 50-400 Metal1 0.08 Metal2 0.05 Metal3 0.05 Metal4 0.03 Metal5 0.02 Metal6 0.02 Slide 10

Contacts Resistance Contacts and vias also have 2-20 Ω Use many contacts for lower R Many small contacts for current crowding around periphery Slide 11

Wire Capacitance Wire has capacitance per unit length To neighbors To layers above and below C total = C top + C bot + 2C adj s w layer n+1 h 2 C top t layer n h 1 C bot C adj layer n-1 Slide 12

Capacitance Trends Parallel plate equation: C = εa/d Wires are not parallel plates, but obey trends Increasing area (W, t) increases capacitance Increasing distance (s, h) decreases capacitance Dielectric constant ε = kε 0 ε 0 = 8.85 x 10-14 F/cm k = 3.9 for SiO 2 Processes are starting to use low-k dielectrics k 3 (or less) as dielectrics use air pockets Slide 13

M2 Capacitance Data Typical wires have ~ 0.2 ff/µm Compare to 2 ff/µm for gate capacitance 400 350 C total (af/µm) 300 250 200 150 100 M1, M3 planes s = 320 s = 480 s = 640 s= Isolated s = 320 s = 480 s = 640 s= 8 8 50 0 0 500 1000 1500 2000 w (nm) Slide 14

Diffusion & Polysilicon Diffusion capacitance is very high (about 2 ff/µm) Comparable to gate capacitance Diffusion also has high resistance Avoid using diffusion runners for wires! Polysilicon has lower C but high R Use for transistor gates Occasionally for very short wires between gates Slide 15

Lumped Element Models Wires are a distributed system Approximate with lumped element models N segments R R/N R/N R/N R/N C C/N C/N C/N C/N R R R/2 R/2 C C/2 C/2 C L-model π-model T-model 3-segment π-model is accurate to 3% in simulation L-model needs 100 segments for same accuracy! Use single segment π-model for Elmore delay Slide 16

Example Metal2 wire in 180 nm process 5 mm long 0.32 µm wide Construct a 3-segment π-model R = 0.05 Ω/ => R = 781 Ω C permicron = 0.2 ff/µm => C = 1 pf 260 Ω 167 ff 167 ff 260 Ω 167 ff 167 ff 260 Ω 167 ff 167 ff Slide 18

Wire RC Delay Estimate the delay of a 10x inverter driving a 2x inverter at the end of the 5mm wire from the previous example. R = 2.5 kω*µm for gates Unit inverter: 0.36 µm nmos, 0.72 µm pmos 781 Ω 690 Ω 500 ff 500 ff 4 ff t pd = 1.1 ns Driver Wire Load Slide 20

Crosstalk A capacitor does not like to change its voltage instantaneously. A wire has high capacitance to its neighbor. When the neighbor switches from 1-> 0 or 0->1, the wire tends to switch too. Called capacitive coupling or crosstalk. Crosstalk effects Noise on nonswitching wires Increased delay on switching wires Slide 21

Crosstalk Delay Assume layers above and below on average are quiet Second terminal of capacitor can be ignored Model as C gnd = C top + C bot Effective C adj depends on behavior of neighbors Miller effect A B C adj C gnd C gnd B DV C eff(a) MCF Constant V DD C gnd + C adj 1 Switching with A 0 C gnd 0 Switching opposite A 2V DD C gnd + 2 C adj 2 Slide 23

Crosstalk Noise Crosstalk causes noise on nonswitching wires If victim is floating: model as capacitive voltage divider V C adj victim = Cgnd v + Cadj V aggressor Aggressor V aggressor Victim C adj C gnd-v V victim Slide 24

Driven Victims Usually victim is driven by a gate that fights noise Noise depends on relative resistances Victim driver is in linear region, agg. in saturation If sizes are same, R aggressor = 2-4 x R victim Cadj 1 Vvictim = V C + C 1+ k gnd v adj aggressor V aggressor R aggressor C gnd-a Aggressor C adj k τ aggressor = = τ ( + ) ( + ) R C C aggressor gnd a adj R C C victim victim gnd v adj R victim C gnd-v Victim V victim Slide 25

Coupling Waveforms Simulated coupling for C adj = C victim 1.8 Aggressor 1.5 1.2 0.9 Victim (undriven): 50% 0.6 0.3 Victim (half size driver): 16% Victim (equal size driver): 8% Victim (double size driver): 4% 0 0 200 400 600 800 1000 1200 1400 1800 2000 t (ps) Slide 26

Noise Implications So what if we have noise? If the noise is less than the noise margin, nothing happens Static CMOS logic will eventually settle to correct output even if disturbed by large noise spikes But glitches cause extra delay Also cause extra power from false transitions Dynamic logic never recovers from glitches Memories and other sensitive circuits also can produce the wrong answer Slide 27

Wire Engineering Goal: achieve delay, area, power goals with acceptable noise Degrees of freedom: Width Spacing Layer Delay (ns): RC/2 Shielding 2.0 1.8 1.6 1.4 1.2 1.0 0.8 0.6 0.4 0.2 0 0 500 1000 1500 2000 Pitch (nm) Coupling:2C adj / (2C adj +C gnd ) 0.8 0.7 0.6 0.5 0.4 0.3 0.2 0.1 0 0 500 1000 1500 2000 Pitch (nm) WireSpacing (nm) 320 480 640 vdd a 0 a 1 gnd a 2 a 3 vdd vdd a 0 gnd a 1 vdd a 2 gnd a 0 b 0 a 1 b 1 a 2 b 2 Slide 31

Repeaters R and C are proportional to l RC delay is proportional to l 2 Unacceptably great for long wires Break long wires into N shorter segments Drive each one with an inverter or buffer Wire Length: l Driver Receiver l/n N Segments Segment l/n l/n Driver Repeater Repeater Repeater Receiver Slide 33

Repeater Design How many repeaters should we use? How large should each one be? Equivalent Circuit Wire length l Wire Capacitance C w *l, Resistance R w *l Inverter width W (nmos = W, pmos = 2W) Gate Capacitance C *W, Resistance R/W R w ln R/W C w l/2n C w l/2n C'W Slide 35