Ellipsometry Data Analysis: a Tutorial
|
|
- Jewel Dorsey
- 7 years ago
- Views:
Transcription
1 llipsometry Data Analysis: a Tutorial G.. Jellison, Jr. Solid State Division Oak Ridge National Laboratory WIS University of Michigan May 8-9,
2 Motivation The Opportunity: Spectroscopic llipsometry (S is sensitive to many parameters of interest to thin-film science, such as Film thickness Interfaces Optical functions (n and k. But S data is not meaningful by itself. Therefore One must model the near-surface region to get useful information.
3 Outline Data representations Calculation of reflection from thin films Modeling of optical functions (n and k Fitting ellipsometry data xamples
4 Introduction What we measure: Stokes Vector of a light beam lc rc o o I I I I I I I V U Q I S I o (Q + U + V / To transform one Stokes vector to another: S out M S in M Mueller matrix (4X4 real
5 Introduction What we measure: light source PSG PSD p p s φ s Sample Detector Intensity of beam at the detector S T PSD M S PSG The matrix M includes: Sample reflection characteristics Intervening optics (windows and lenses
6 Introduction Isotropic Reflector: p in p out s in s out Isotropic reflector Mueller Matrix: M reflector N cos(ψ N S sin(ψ sin( C sin(ψ cos( N + S + C N C S S C
7 Introduction What we calculate: light source PSG PSD p p s φ s Sample Detector J o i o i rpp rps Ê p/ Ê p Ê s / Ê p o i o i rsp rss Ê p/ Ê s Ê s / Ê s ρ ρsp ρ i tan( ψ e i tan( ψ sp e ps rss sp tan( ψ ps e i ps. There is no difference between Mueller and Jones IF there is no depolarization!
8 Data Representations Mueller-Jones matrices: M A ( J J * A -, i i A. Assumes no depolarization! N is C e r r i in s out s in p out p s p + + tan(ψ ρ
9 Anisotropic samples: Data Representations M N α sp C ps + ξ S ps + ξ N α C S ps α sp ps α + ξ + ξ ps ps C sp C S sp + ζ + ζ C + β + β S sp + ζ S sp + ζ S + β C β ρ ρ ps sp Cps + isps tan( ψps e + N Csp + issp tan( ψ sp e + N i ps i sp N + S + C + S ps + C ps + S sp + C sp J ρ ρsp i ρ tan( ψ e i tan( ψsp e ps rss sp tan( ψ e ps i ps
10 Calculation of Reflection Coefficients Single Interface: Fresnel quations (83: φ φ r ñ cos( φ pp ñ cos( φ + ñ ñ cos( cos( φ φ r ñ cos( φ ss ñ cos( φ + ñ ñ cos( φ cos( φ Snell s Law (6: ξ ñ sin φ ñ sin φ.
11 Calculation of Reflection Coefficients Two Interfaces: Airy Formula (833: r pp, ss r, pp, ss + r +, pp, ss r, pp, ss r, pp, ss exp( ib exp( ib πd b λ f ñ f cos( φ f
12 Calculation of Reflection Coefficients Three or more interfaces: Abeles Matrices (95: Represent each layer by Abeles matrices: P, pp cos( b ñ i sin( b cos( φ cos( φ i sin( b ñ cos( b P, ss iñ cos( b cos( φ sin( b i sin( b ñ cos( φ cos( b Matrix multiply: M N pp χ, pp( P, pp χsub, pp M ss χ N, ss P, ss ( χ sub, ss
13 Calculation of Reflection Coefficients Three or more interfaces: Abeles Matrices: Substrate and ambient characteristic matrices: χ cos( ñ φ φ, pp cos( ñ χ, ss ñ ñ cos( φ cos( φ χ cos( φ ñ sub, pp sub sub χ sub ss ñsub cos( φ, sub Final Reflection coefficients: r pp M M, pp, pp r ss M M, ss, ss
14 Calculation of Reflection Coefficients Anisotropic materials: X Abeles matrices become one 4X4 Berreman matrix (97 Reason: s- and p- polarization states are no longer eigenstates of the reflection. Inhomogeneous layers: If a layer has a depth-dependent refractive index, there are two options: Build up many very thin layers Use interpolation approximations
15 Models for dielectric functions Tabulated Data Sets: Usually good for substrates Not good for thin films 3 ven for substrates: problems a surface roughness b surface reconstruction c surface oxides 4 Most tabulated data sets do not include error limits Measured optical functions of silicon depend on the face! [near 4.5 ev 9 nm, ε (<ε (]
16 Models for dielectric functions Lorentz Oscillator Model (895: + + o i A ñ λ ζ λ λ λ λ λ ε, ( ( Γ + + o i B ñ, ( ε ( Sellmeier quation: + o A n, λ λ λ ε For Insulators Cauchy (83: + B B n λ Drude (89: ( i B Γ ε For Metals
17 Models for dielectric functions Amorphous Materials (Tauc-Lorentz: A k n g o g ( ( ( ( ( ( Θ + Γ ε ξ ξ ξ ξε π ε ε d P R g + ( ( ( Five parameters: g Band gap A Proportional to the matrix element Central transition energy Γ Broadening parameter ε ( Normally
18 Forouhi and Bloomer (Forouhi and Bloomer Phys Rev. B 34, 78 (986. xtinction coefficient: k FB ( A( g B + C Refractive index: (a Hilbert transform k( ξ k( n FB ( n( + P dξ π ξ Problems: k FB (> for < g. Unphysical. k FB ( constant as. xperiment states that k( as / 3 as. Time-reversal symmetry required [k(- -k(]. Hilbert Transform Kramers Kronig [k( ].
19 Models for dielectric functions Models for Crystalline materials: Critical points, excitons, etc. in the optical spectra make this a very difficult problem! Collections of Lorentz oscillators: ε ( ε o + A e i φ + iγ Can end up with MANY terms
20 Models for dielectric functions ffective Medium theories: < ε > ε h < ε > + γε h ε εh f ε + γε h Choice of host material: Lorentz-Lorentz: ε h Maxwell-Garnett: ε h ε 3 Bruggeman ε h <ε> γ Depolarization factor ~.
21 Figure of Merit: Fitting Models to Data xperimental quantities: Calculated quantities: ρ exp (λ ρ calc (λ, z z: Vector of parameters to be fit ( to m film thicknesses, constituent fractions, parameters of optical function models, etc. Minimize χ N N m [ ρ exp ( λ ρ σ ( λ calc ( λ, z] σ(λ random and systematic error
22 Calculation Procedure: Fitting Models to Data Assume a model. a. Number of layers b. Layer type (isotropic, anisotropic, graded Determine or parameterize the optical functions of each layer 3 Select reasonable starting parameters. 4 Fit the data, using a suitable algorithm and Figure of Merit 5 Determine correlated errors in z and cross correlation coefficients If the Figure of Merit indicates a bad fit (e.g. χ >>, go back to.
23 Fitting Models to Data fitting of parameters is not the end-all of parameter estimation. To be genuinely useful, a fitting procedure should provide (i parameters, (ii error estimates on the parameters, and (iii a statistical measure of goodness-of-fit. When the third item suggests that the model is an unlikely match to the data, then items (i and (ii are probably worthless. Unfortunately, many practitioners of parameter estimation never proceed beyond item (i. They deem a fit acceptable if a graph of data and model looks good. This approach is known as chi-by-eye. Luckily, its practitioners get what they deserve. Press, Teukolsky, Vettering, and Flannery, Numerical Recipes ( nd ed., Cambridge, 99, Ch. 5, pg. 65.
24 Fitting Models to Data Levenberg-Marquardt algorithm: Curvature matrix: α kl z N χ ρ calc ( λ, z ρ calc ( λ, zk zl σ ( λ zk zl Inverse of curvature matrix: ε α - rror in parameter z ε. Cross correlation coefficients: proportional to the elements of ε.
25 Fitting Models to Data Meaning of fitted parameters and errors: Assume air/sio /Si structure Parameterize SiO using Sellmeier dispersion (λ o 93 nm: ε n A λ + λ λ o, Two fit parameters: d f, A f A f σ Α σ d d f
26 Fitting Models to Data An xample: a-si x N y :H on silicon: 3 SiN / c-si Re(ρ pp T-L χ.96 Lorentz χ 3.84 F&B χ Im(ρ pp nergy (ev
27 Fitting Models to Data An xample: a-si x N y :H on silicon: Model: air surface roughness Bruggeman MA (5% air, 5% a-sin 3 a-sin (3 models Lorentz Forouhi and Bloomer Tauc-Lorentz 4 interface Bruggeman MA (5% Si, 5% a-sin 5 silicon Fitting parameters: d, d 3, d 4, A, o, Γ, ε( and g (F&B and T-L
28 Fitting Models to Data An xample: a-si x N y :H on silicon: Lorentz F&B T-L Roughness thick (nm.±.3 4.9±.7.9±.3 Film thickness (nm 97.8± ±. 98.±.4 Interface thick (nm.6±.3 -.6±.6 -.±. A.9± ± ±.7 Ε o (ev 9.6± ± ±.47 Γ (ev.±..74±3.5.8±.8 g (ev ± ±.9 ε(.±..93±.5.38±.6 χ Roughness thick (nm.4±.3 4.7±.6.8±. Film thickness (nm 98.6± ±.9 98.±.3 A.5±.4 5.3± ±3. Ε o (ev 9.6±. 7.7±. 9.6±..3 Γ (ev.±. 4.±.8 3.7±.33 g (ev ± ±.4 χ
29 Fitting Models to Data An xample: a-si x N y :H on silicon:. exp-calc. Re(ρ pp T-L Lorentz F&B. Im(ρ pp nergy (ev
30 Optical Functions from llipsometry Optical Functions from Parameterization: refractive index (n. T-L Lorentz F&B..9.8 extinction coefficient (k nergy (ev rror limits: Use the submatrix α s from the associated fitted parameters.
31 Optical Functions from llipsometry Newton-Raphson algorithm: Solve: Re(ρ calc (λ, φ, n f, k f, - Re(ρ exp (λ Im(ρ calc (λ, φ, n f, k f, - Im(ρ exp (λ Jacobian: J ρ n ρ n re im ρ k ρ k re im n new n old + δn; where δn -J - ρ Propagate errors!
32 Optical Functions from llipsometry Optical functions of semiconductors: Dielectric function from air/substrate system: } ( tan ] [ { ( sin φ ρ ρ φ ε ε ε i Only valid if there is no overlayer (almost never true If there is a thin film, Drude showed: 4, ( f f s s o n n d K k n + λ π
33 Optical Functions from llipsometry Optical functions of semiconductors: Pseudo-dielectric functions of silicon with,.8, and. nm SiO overlayers <n> <k> 6 <α> (/cm nergy (ev
34 Optical Functions from llipsometry Optical functions of semiconductors: rror limits of the dielectric function of silicon:.5.4 δn δk rror in n and k nergy (ev
35 Optical Functions from llipsometry Optical functions of thin films: Small grain poly silicon Re(ρ -.5 Im(ρ nergy (ev
36 Optical Functions from llipsometry Optical functions of thin films: Method of analysis: A. Restrict analysis region to interference oscillations. Parameterize the optical functions of the film. air surface roughness (BMA 3 T-L model for film 4 Lorentz model for a-sio 5 c-si B. Fit data to determine thicknesses and Lorentz model parameters of a-sio. C. Calculate optical functions of thin film using Newton-Raphson.
37 Optical Functions from llipsometry Optical functions of thin films: 8 6 n k 6 α (/cm nergy (ev c-si lg p-si sg p-si a-si
38 Parting Thoughts S is a powerful technique, but modeling is critical. Modeling should use an error-based figure of merit Does the model fit the data? Calculate correlated errors and cross-correlation coefficients. When used properly, S gives very accurate thicknesses and values of the complex dielectric function.
Spectroscopic Ellipsometry:
Spectroscopic : What it is, what it will do, and what it won t do by Harland G. Tompkins Introduction Fundamentals Anatomy of an ellipsometric spectrum Analysis of an ellipsometric spectrum What you can
More informationSolar Photovoltaic (PV) Cells
Solar Photovoltaic (PV) Cells A supplement topic to: Mi ti l S Micro-optical Sensors - A MEMS for electric power generation Science of Silicon PV Cells Scientific base for solar PV electric power generation
More informationOptical Monitoring of Thin-films Using Spectroscopic Ellipsometry
Optical Monitoring of Thin-films Using Spectroscopic Ellipsometry Dale E. Morton, Denton Vacuum, LLC, Moorestown, NJ Blaine Johs and Jeff Hale, J.A. Woollam Co., Inc., Lincoln, NE. Key Words: in-situ monitoring
More informationIntroduction to Optics
Second Edition Introduction to Optics FRANK L. PEDROTTI, S.J. Marquette University Milwaukee, Wisconsin Vatican Radio, Rome LENO S. PEDROTTI Center for Occupational Research and Development Waco, Texas
More informationLaboratory #3 Guide: Optical and Electrical Properties of Transparent Conductors -- September 23, 2014
Laboratory #3 Guide: Optical and Electrical Properties of Transparent Conductors -- September 23, 2014 Introduction Following our previous lab exercises, you now have the skills and understanding to control
More informationPhase Bulb Refurbation and Optmic Thin Film
A simple system for measuring small phase retardation of an optical thin film T.N. Hansen* a, H. Fabricius a a DELTA Light & Optics, Venlighedsvej 4, 970-Hørsholm, Denmark ABSTRACT This paper describes
More informationThe study of structural and optical properties of TiO 2 :Tb thin films
Optica Applicata, Vol. XXXVII, No. 4, 2007 The study of structural and optical properties of TiO 2 :Tb thin films AGNIESZKA BORKOWSKA, JAROSLAW DOMARADZKI, DANUTA KACZMAREK, DAMIAN WOJCIESZAK Faculty of
More informationOptical Communications
Optical Communications Telecommunication Engineering School of Engineering University of Rome La Sapienza Rome, Italy 2005-2006 Lecture #2, May 2 2006 The Optical Communication System BLOCK DIAGRAM OF
More informationKeywords Dip coating, mono-si, titanium oxide, thin film.
Sol-gel Synthesis and Optical Characterisation of TiO 2 Thin Films for Photovoltaic Application N. H. Arabi, Aicha Iratni, Talaighil Razika, Bruno Capoen, Mohamed Bouazaoui Abstract TiO 2 thin films have
More informationComponents for Infrared Spectroscopy. Dispersive IR Spectroscopy
Components for Infrared Spectroscopy Mid-IR light: 00-000 cm - (5.5 m wavelength) Sources: Blackbody emitters Globar metal oxides Nernst Glower: Silicon Carbide Detectors: Not enough energy for photoelectric
More informationCHAPTER 22 POLARIMETRY
CHAPTER POLARIMETRY Russell A. Chipman Physics Department Uni ersity of Alabama in Hunts ille Hunts ille, Alabama. 1 GLOSSARY A analyzer vector a analyzer vector element a semimajor axis of ellipse BRDF
More informationOptical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry
Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry Thomas Waechtler a, Bernd Gruska b, Sven Zimmermann a, Stefan E. Schulz a, Thomas Gessner a a Chemnitz University
More informationSOLAR ELECTRICITY: PROBLEM, CONSTRAINTS AND SOLUTIONS
SOLAR ELECTRICITY: PROBLEM, CONSTRAINTS AND SOLUTIONS The United States generates over 4,110 TWh of electricity each year, costing $400 billion and emitting 2.5 billion metric tons of carbon dioxide (Yildiz,
More informationScanning Near Field Optical Microscopy: Principle, Instrumentation and Applications
Scanning Near Field Optical Microscopy: Principle, Instrumentation and Applications Saulius Marcinkevičius Optics, ICT, KTH 1 Outline Optical near field. Principle of scanning near field optical microscope
More informationOptical Properties of Zn(O,S) Thin Films Deposited by RF Sputtering, Atomic Layer Deposition, and Chemical Bath Deposition
Optical Properties of Zn(O,S) Thin Films Deposited by RF Sputtering, Atomic Layer Deposition, and Chemical Bath Deposition Preprint Jian Li National Renewable Energy Laboratory and Colorado School of Mines
More informationAl 2 O 3, Its Different Molecular Structures, Atomic Layer Deposition, and Dielectrics
Al 2 O 3, Its Different Molecular Structures, Atomic Layer Deposition, and Dielectrics Mark Imus Douglas Sisk, Ph.D., Mentor Marian High School RET Program University of Notre Dame Project Proposal Tunneling
More informationLecture 3: Optical Properties of Bulk and Nano. 5 nm
Lecture 3: Optical Properties of Bulk and Nano 5 nm First H/W#1 is due Sept. 10 Course Info The Previous Lecture Origin frequency dependence of χ in real materials Lorentz model (harmonic oscillator model)
More informationInvestigation of the Optical Properties of Liquid Deposition CuSO 4 Thin Film
015 IJSRST Volume 1 Issue 5 Print ISSN: 395-6011 Online ISSN: 395-60X Themed Section: Science and Technology Investigation of the Optical Properties of Liquid Deposition CuSO 4 Thin Film Nafie A. Almuslet
More informationFabrication and Characterization of Nanostructured Silicon Films For Photovoltaic Applications. Kai Wang
Fabrication and Characterization of Nanostructured Silicon Films For Photovoltaic Applications by Kai Wang A thesis submitted to the Faculty of Graduated and Postdoctoral Affairs in partial fulfillment
More informationP R E A M B L E. Facilitated workshop problems for class discussion (1.5 hours)
INSURANCE SCAM OPTICS - LABORATORY INVESTIGATION P R E A M B L E The original form of the problem is an Experimental Group Research Project, undertaken by students organised into small groups working as
More informationX-ray diffraction techniques for thin films
X-ray diffraction techniques for thin films Rigaku Corporation Application Laboratory Takayuki Konya 1 Today s contents (PM) Introduction X-ray diffraction method Out-of-Plane In-Plane Pole figure Reciprocal
More informationPulsed laser deposition of organic materials
Pulsed laser deposition of organic materials PhD theses Gabriella Kecskeméti Department of Optics and Quantum Electronics University of Szeged Supervisor: Dr. Béla Hopp senior research fellow Department
More informationDETECTION OF COATINGS ON PAPER USING INFRA RED SPECTROSCOPY
DETECTION OF COATINGS ON PAPER USING INFRA RED SPECTROSCOPY Eduard Gilli 1,2 and Robert Schennach 1, 2 1 Graz University of Technology, 8010 Graz, Austria 2 CD-Laboratory for Surface Chemical and Physical
More informationSilicon Wafer Solar Cells
Silicon Wafer Solar Cells Armin Aberle Solar Energy Research Institute of Singapore (SERIS) National University of Singapore (NUS) April 2009 1 1. PV Some background Photovoltaics (PV): Direct conversion
More informationOptics and Spectroscopy at Surfaces and Interfaces
Vladimir G. Bordo and Horst-Gunter Rubahn Optics and Spectroscopy at Surfaces and Interfaces WILEY- VCH WILEY-VCH Verlag GmbH & Co. KGaA Contents Preface IX 1 Introduction 1 2 Surfaces and Interfaces 5
More informationApplications of Infrared Multiple Angle Incidence Resolution Spectrometry
Electronically reprinted from August 2015 Applications of Infrared Multiple Angle Incidence Resolution Spectrometry Multiple angle incidence resolution spectrometry (MAIRS has proven useful for characterization
More informationLecture 3: Optical Properties of Bulk and Nano. 5 nm
Lecture 3: Optical Properties of Bulk and Nano 5 nm The Previous Lecture Origin frequency dependence of χ in real materials Lorentz model (harmonic oscillator model) 0 e - n( ) n' n '' n ' = 1 + Nucleus
More informationOptical Storage Technology. Optical Disc Storage
Optical Storage Technology Optical Disc Storage Introduction Since the early 1940s, magnetic recording has been the mainstay of electronic information storage worldwide. Magnetic tape has been used extensively
More informationMOS (metal-oxidesemiconductor) 李 2003/12/19
MOS (metal-oxidesemiconductor) 李 2003/12/19 Outline Structure Ideal MOS The surface depletion region Ideal MOS curves The SiO 2 -Si MOS diode (real case) Structure A basic MOS consisting of three layers.
More informationEtching Etch Definitions Isotropic Etching: same in all direction Anisotropic Etching: direction sensitive Selectivity: etch rate difference between
Etching Etch Definitions Isotropic Etching: same in all direction Anisotropic Etching: direction sensitive Selectivity: etch rate difference between 2 materials Other layers below one being etch Masking
More informationDependence of the thickness and composition of the HfO 2 /Si interface layer on annealing
Dependence of the thickness and composition of the HfO 2 /Si interface layer on annealing CINVESTAV-UNIDAD QUERETARO P.G. Mani-González and A. Herrera-Gomez gmani@qro.cinvestav.mx CINVESTAV 1 background
More informationThermal unobtainiums? The perfect thermal conductor and the perfect thermal insulator
Thermal unobtainiums? The perfect thermal conductor and the perfect thermal insulator David G. Cahill Materials Research Lab and Department of Materials Science and Engineering, U. of Illinois Gratefully
More informationThe Potential of Ellipsometric Porosimetry
The Potential of Ellipsometric Porosimetry A. Bourgeois, Y. Turcant, Ch. Walsh, V. Couraudon, Ch. Defranoux SOPRA SA, 26 rue Pierre Joigneaux, 92270 Bois Colombes, France Speaker: Alexis Bourgeois, Application
More informationChapter 6 Metal Films and Filters
Chapter 6 Metal Films and Filters 6.1 Mirrors The first films produced by vacuum deposition as we know it were aluminum films for mirrors made by John Strong in the 1930s; he coated mirrors for astronomical
More informationPhotolithography. Class: Figure 12.1. Various ways in which dust particles can interfere with photomask patterns.
Photolithography Figure 12.1. Various ways in which dust particles can interfere with photomask patterns. 19/11/2003 Ettore Vittone- Fisica dei Semiconduttori - Lectio XIII 16 Figure 12.2. Particle-size
More informationNANO SILICON DOTS EMBEDDED SIO 2 /SIO 2 MULTILAYERS FOR PV HIGH EFFICIENCY APPLICATION
NANO SILICON DOTS EMBEDDED SIO 2 /SIO 2 MULTILAYERS FOR PV HIGH EFFICIENCY APPLICATION Olivier Palais, Damien Barakel, David Maestre, Fabrice Gourbilleau and Marcel Pasquinelli 1 Outline Photovoltaic today
More informationOptical Properties of Solids. Claudia Ambrosch-Draxl Chair of Atomistic Modelling and Design of Materials University Leoben, Austria
Optical Properties of Solids Claudia Ambrosch-Draxl Chair of Atomistic Modelling and Design of Materials University Leoben, Austria Outline Basics Program Examples Outlook light scattering dielectric tensor
More informationConverted-waves imaging condition for elastic reverse-time migration Yuting Duan and Paul Sava, Center for Wave Phenomena, Colorado School of Mines
Converted-waves imaging condition for elastic reverse-time migration Yuting Duan and Paul Sava, Center for Wave Phenomena, Colorado School of Mines SUMMARY Polarity changes in converted-wave images constructed
More informationComposite Electromagnetic Wave Absorber Made of Permalloy or Sendust and Effect of Sendust Particle Size on Absorption Characteristics
PIERS ONLINE, VOL. 4, NO. 8, 2008 846 Composite Electromagnetic Wave Absorber Made of Permalloy or Sendust and Effect of Sendust Particle Size on Absorption Characteristics K. Sakai, Y. Wada, and S. Yoshikado
More informationDESIGN AND SIMULATION ANTIREFLECTION COATING FOR LASER ND:YAG (1064NM) WAVELENGTH AND HAS MULTIFREQUENCY (532,355NM) ON GLASS SUBSTRATE
Journal of Al-Nahrain University Vol.11(2), August, 2008, pp.104-111 Science DESIGN AND SIMULATION ANTIREFLECTION COATING FOR LASER ND:YAG (1064NM) WAVELENGTH AND HAS MULTIFREQUENCY (532,355NM) ON GLASS
More informationDeposition of Silicon Oxide, Silicon Nitride and Silicon Carbide Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology
General Plasma, Inc. 546 East 25th Street Tucson, Arizona 85713 tel. 520-882-5100 fax. 520-882-5165 and Silicon Carbide Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology M.
More informationReflection & Transmission of EM Waves
Reflection & Transmission of EM Waves Reading Shen and Kong Ch. 4 Outline Everyday Reflection Reflection & Transmission (Normal Incidence) Reflected & Transmitted Power Optical Materials, Perfect Conductors,
More informationISOTROPIC ETCHING OF THE SILICON NITRIDE AFTER FIELD OXIDATION.
ISOTROPIC ETCHING OF THE SILICON NITRIDE AFTER FIELD OXIDATION. A.J. BALLONI - Fundação Centro Tecnológico para Informática/ Instituto de Microeletrônica Laboratório de Litografia C.P. 6162 - Campinas/S.P.
More informationCrystal Optics of Visible Light
Crystal Optics of Visible Light This can be a very helpful aspect of minerals in understanding the petrographic history of a rock. The manner by which light is transferred through a mineral is a means
More informationDETERMINING THE POLARIZATION STATE OF THE RADIATION CROSSING THROUGH AN ANISOTROPIC POLY (VINYL ALCOHOL) FILM
DETERMINING THE POLARIZATION STATE OF THE RADIATION CROSSING THROUGH AN ANISOTROPIC POLY (VINYL ALCOHOL) FILM ECATERINA AURICA ANGHELUTA Faculty of Physics,,,Al.I. Cuza University, 11 Carol I Bd., RO-700506,
More information1 Basic Optics (1.2) Since. ε 0 = 8.854 10 12 C 2 N 1 m 2 and μ 0 = 4π 10 7 Ns 2 C 2 (1.3) Krishna Thyagarajan and Ajoy Ghatak. 1.
1 1 Basic Optics Krishna Thyagarajan and Ajoy Ghatak 1.1 Introduction This chapter on optics provides the reader with the basic understanding of light rays and light waves, image formation and aberrations,
More informationOptical Coatings 5 美 国 莱 特 太 平 洋 公 司. Optical Coatings 5.2. The Reflection of Light 5.3. Single-Layer Antireflection Coatings 5.7
5 5. The Reflection of Light 5.3 Single-Layer Antireflection Coatings 5.7 Multilayer Antireflection Coatings 5. High-Reflection Coatings 5.3 Thin-Film Production 5.7 Melles Griot Antireflection Coatings
More informationSurface plasmon nanophotonics: optics below the diffraction limit
Surface plasmon nanophotonics: optics below the diffraction limit Albert Polman Center for nanophotonics FOM-Institute AMOLF, Amsterdam Jeroen Kalkman Hans Mertens Joan Penninkhof Rene de Waele Teun van
More informationHigh Open Circuit Voltage of MQW Amorphous Silicon Photovoltaic Structures
High Open Circuit Voltage of MQW Amorphous Silicon Photovoltaic Structures ARGYRIOS C. VARONIDES Physics and EE Department University of Scranton 800 Linden Street, Scranton PA, 18510 United States Abstract:
More informationCHI-SQUARE: TESTING FOR GOODNESS OF FIT
CHI-SQUARE: TESTING FOR GOODNESS OF FIT In the previous chapter we discussed procedures for fitting a hypothesized function to a set of experimental data points. Such procedures involve minimizing a quantity
More informationOptical Hyperdoping: Transforming Semiconductor Band Structure for Solar Energy Harvesting
Optical Hyperdoping: Transforming Semiconductor Band Structure for Solar Energy Harvesting 3G Solar Technologies Multidisciplinary Workshop MRS Spring Meeting San Francisco, CA, 5 April 2010 Michael P.
More informationApertureless Near-Field Optical Microscopy
VI Apertureless Near-Field Optical Microscopy In recent years, several types of apertureless near-field optical microscopes have been developed 1,2,3,4,5,6,7. In such instruments, light scattered from
More information14.330 SOIL MECHANICS Assignment #4: Soil Permeability.
Geotechnical Engineering Research Laboratory One University Avenue Lowell, Massachusetts 01854 Edward L. Hajduk, D.Eng, PE Lecturer PA105D Tel: (978) 94 2621 Fax: (978) 94 052 e mail: Edward_Hajduk@uml.edu
More informationRecent developments in high bandwidth optical interconnects. Brian Corbett. www.tyndall.ie
Recent developments in high bandwidth optical interconnects Brian Corbett Outline Introduction to photonics for interconnections Polymeric waveguides and the Firefly project Silicon on insulator (SOI)
More informationCoating Technology: Evaporation Vs Sputtering
Satisloh Italy S.r.l. Coating Technology: Evaporation Vs Sputtering Gianni Monaco, PhD R&D project manager, Satisloh Italy 04.04.2016 V1 The aim of this document is to provide basic technical information
More informationM. A. Nitti, M. Colasuonno, E. Nappi, A. Valentini
Performance Analysis of Poly- and Nano-Crystalline Diamond based Photocathodes M. A. Nitti, M. Colasuonno, E. Nappi, A. Valentini INFN - Sezione di Bari - Via Amendola 173, 7126 Bari (Italy) 6 th International
More informationSputtered AlN Thin Films on Si and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties
Sputtered AlN Thin Films on and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties S. Mishin, D. R. Marx and B. Sylvia, Advanced Modular Sputtering,
More informationX-ray thin-film measurement techniques
Technical articles X-ray thin-film measurement techniques II. Out-of-plane diffraction measurements Toru Mitsunaga* 1. Introduction A thin-film sample is two-dimensionally formed on the surface of a substrate,
More informationRefractive Index Measurement Principle
Refractive Index Measurement Principle Refractive index measurement principle Introduction Detection of liquid concentrations by optical means was already known in antiquity. The law of refraction was
More informationh e l p s y o u C O N T R O L
contamination analysis for compound semiconductors ANALYTICAL SERVICES B u r i e d d e f e c t s, E v a n s A n a l y t i c a l g r o u p h e l p s y o u C O N T R O L C O N T A M I N A T I O N Contamination
More informationE F G. Overview of the activities. SAPIE ZA Università di Roma - Laboratorio di Fotonica Molecolare
SAPIE ZA Università di Roma Dipartimento di Energetica Laboratorio di Fotonica Molecolare Francesco Michelotti E-Mail: francesco.michelotti@uniroma1.it Tel: +39 06-49.91.65.62 Workshop Future Trends in
More information2. Deposition process
Properties of optical thin films produced by reactive low voltage ion plating (RLVIP) Antje Hallbauer Thin Film Technology Institute of Ion Physics & Applied Physics University of Innsbruck Investigations
More informationKeywords: Planar waveguides, sol-gel technology, transmission electron microscopy
Structural and optical characterisation of planar waveguides obtained via Sol-Gel F. Rey-García, C. Gómez-Reino, M.T. Flores-Arias, G.F. De La Fuente, W. Assenmacher, W. Mader ABSTRACT Planar waveguides
More informationSilicon, the test mass substrate of tomorrow? Jerome Degallaix The Next Detectors for Gravitational Wave Astronomy Beijing - 2015
Silicon, the test mass substrate of tomorrow? Jerome Degallaix The Next Detectors for Gravitational Wave Astronomy Beijing - 2015 Program of the talk... What we have now What we know about silicon What
More informationSpecifying Plasma Deposited Hard Coated Optical Thin Film Filters. Alluxa Engineering Staff
Specifying Plasma Deposited Hard Coated Optical Thin Film Filters. Alluxa Engineering Staff December 2012 Specifying Advanced Plasma Deposited Hard Coated Optical Bandpass and Dichroic Filters. Introduction
More informationEffect of UV-wavelength on Hardening Process of PECVD Glasses
Effect of UV-wavelength on Hardening Process of Porogen-containing and Porogen-free Ultra-low-k PECVD Glasses A.M. Urbanowicz*, K. Vanstreels, P. Verdonck, E. Van Besien, Ch. Trompoukis, D. Shamiryan,
More information2 Absorbing Solar Energy
2 Absorbing Solar Energy 2.1 Air Mass and the Solar Spectrum Now that we have introduced the solar cell, it is time to introduce the source of the energy the sun. The sun has many properties that could
More informationAmplification of the Radiation from Two Collocated Cellular System Antennas by the Ground Wave of an AM Broadcast Station
Amplification of the Radiation from Two Collocated Cellular System Antennas by the Ground Wave of an AM Broadcast Station Dr. Bill P. Curry EMSciTek Consulting Co., W101 McCarron Road Glen Ellyn, IL 60137,
More informationPolarization of Light
Polarization of Light References Halliday/Resnick/Walker Fundamentals of Physics, Chapter 33, 7 th ed. Wiley 005 PASCO EX997A and EX999 guide sheets (written by Ann Hanks) weight Exercises and weights
More informationGLOBAL COLLEGE OF ENGINEERING &TECHNOLOGY: YSR DIST. Unit VII Fiber Optics Engineering Physics
Introduction Fiber optics deals with the light propagation through thin glass fibers. Fiber optics plays an important role in the field of communication to transmit voice, television and digital data signals
More informationELG4126: Photovoltaic Materials. Based Partially on Renewable and Efficient Electric Power System, Gilbert M. Masters, Wiely
ELG4126: Photovoltaic Materials Based Partially on Renewable and Efficient Electric Power System, Gilbert M. Masters, Wiely Introduction A material or device that is capable of converting the energy contained
More informationSPECTROSCOPIC ELLIPSOMETRY FOR THE IN-SITU INVESTIGATION OF ATOMIC LAYER DEPOSITIONS
Faculty of Electrical and Computer Engineering Institute of Semiconductors and Microsystems Student Research Project SPECTROSCOPIC ELLIPSOMETRY FOR THE IN-SITU INVESTIGATION OF ATOMIC LAYER DEPOSITIONS
More informationModern Classical Optics
Modern Classical Optics GEOFFREY BROOKER Department of Physics University of Oxford OXPORD UNIVERSITY PRESS Contents 1 Electromagnetism and basic optics 1 1.1 Introduction 1 1.2 The Maxwell equations 1
More informationThe CVD diamond booklet
available at: www.diamond-materials.com/download Content 1. General properties of diamond... 2 2. Optical Properties... 4 Optical transparency...4 Absorption coefficient at 10.6 µm...5 Refractive index:
More information5. Reflection, refraction and polarization
5. Reflection, refraction and polarization Figure 5.1 illustrates what happens when electromagnetic radiation encounters a smooth interface between dielectric media. We see two phenomena: reflection and
More informationLongwave IR focal-plane binary optics
Longwave IR focal-plane binary optics Z. Sikorski, H. Polakowski Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Str., -98 Warsaw, e-mail: zsikorsk@wat.waw.pl Abstract In
More informationLimiting factors in fiber optic transmissions
Limiting factors in fiber optic transmissions Sergiusz Patela, Dr Sc Room I/48, Th. 13:00-16:20, Fri. 9:20-10:50 sergiusz.patela@pwr.wroc.pl eportal.pwr.wroc.pl Copying and processing permitted for noncommercial
More informationPrototyping to Production
White Paper Prototyping to Production Konrad Goffin David Montgomery Cicely Rathmell INTRODUCTION CVI Laser Optics quick turnaround prototype services smooth the transition from prototype to production.
More informationAlgebraic Concepts Algebraic Concepts Writing
Curriculum Guide: Algebra 2/Trig (AR) 2 nd Quarter 8/7/2013 2 nd Quarter, Grade 9-12 GRADE 9-12 Unit of Study: Matrices Resources: Textbook: Algebra 2 (Holt, Rinehart & Winston), Ch. 4 Length of Study:
More informationMonte Carlo (MC) Model of Light Transport in Turbid Media
Monte Carlo (MC) Model of Light Transport in Turbid Media M. Talib Department of Physics, University of AL Qadisiya Email: Al Helaly @ Yahoo. Com Abstract: Monte Carlo method was implemented to simulation
More informationComputational study of wave propagation through a dielectric thin film medium using WKB approximation
AMERICAN JOURNAL OF SCIENTIFIC AND INDUSTRIAL RESEARCH 0, Science Huβ, htt://www.scihub.org/ajsir ISSN: 53-649X doi:0.55/ajsir.0..4.547.55 Comutational study of wave roagation through a dielectric thin
More informationComputer simulation of coating processes with monochromatic monitoring
Computer simulation of coating processes with monochromatic monitoring A. Zöller, M. Boos, H. Hagedorn, B. Romanov Leybold Optics GmbH, Siemensstrasse 88, 655 Alzenau, Germany ABSTRACT For the production
More informationOutline. Self-assembled monolayer (SAM) formation and growth. Metal nanoparticles (NP) anchoring on SAM
From functional nanostructured surfaces to innovative optical biosensors Giacomo Dacarro Dipartimento di Fisica A.Volta Dipartimento di Chimica Generale Università degli Studi di Pavia Dalla scienza dei
More informationOptical Metrology. Third Edition. Kjell J. Gasvik Spectra Vision AS, Trondheim, Norway JOHN WILEY & SONS, LTD
2008 AGI-Information Management Consultants May be used for personal purporses only or by libraries associated to dandelon.com network. Optical Metrology Third Edition Kjell J. Gasvik Spectra Vision AS,
More informationCREOL, College of Optics & Photonics, University of Central Florida
OSE6650 - Optical Properties of Nanostructured Materials Optical Properties of Nanostructured Materials Fall 2013 Class 3 slide 1 Challenge: excite and detect the near field Thus far: Nanostructured materials
More informationIntroduction to VLSI Fabrication Technologies. Emanuele Baravelli
Introduction to VLSI Fabrication Technologies Emanuele Baravelli 27/09/2005 Organization Materials Used in VLSI Fabrication VLSI Fabrication Technologies Overview of Fabrication Methods Device simulation
More informationFabrication and Characterization of N- and P-Type a-si:h Thin Film Transistors
Fabrication and Characterization of N- and P-Type a-si:h Thin Film Transistors Engineering Practical Jeffrey Frederick Gold Fitzwilliam College University of Cambridge Lent 1997 FABRCATON AND CHARACTERZATON
More informationPhysics 221 Classical Physics II Lab Gustavus Adolphus College Spring 2007
Physics 221 Classical Physics II Lab Gustavus Adolphus College Spring 2007 Instructors: Thomas Huber James Miller Office: Olin Hall 209 Olin Hall 204 Telephone: 933-7036 933-6130 email: huber@gustavus.edu
More informationProduction of Solar Energy Using Nanosemiconductors
Production of Solar Energy Using Nanosemiconductors 1 Kiruthika S, 2 Dinesh Kumar M, 3 Surendar.A 1, 2 II year, KSR College of Engineering, Tiruchengode, Tamilnadu, India 3 Assistant Professor, KSR College
More informationNear-field scanning optical microscopy (SNOM)
Adviser: dr. Maja Remškar Institut Jožef Stefan January 2010 1 2 3 4 5 6 Fluorescence Raman and surface enhanced Raman 7 Conventional optical microscopy-limited resolution Two broad classes of techniques
More informationTypes of Epitaxy. Homoepitaxy. Heteroepitaxy
Epitaxy Epitaxial Growth Epitaxy means the growth of a single crystal film on top of a crystalline substrate. For most thin film applications (hard and soft coatings, optical coatings, protective coatings)
More informationComputer Simulations of Edge Effects in a Small-Area Mesa N-P Junction Diode
Computer Simulations of Edge Effects in a Small-Area Mesa N-P Junction Diode Preprint Conference Paper NREL/CP-520-45002 February 2009 J. Appel and B. Sopori National Renewable Energy Laboratory N.M. Ravindra
More informationCopyright 2000 IEEE. Reprinted from IEEE MTT-S International Microwave Symposium 2000
Copyright 2000 IEEE Reprinted from IEEE MTT-S International Microwave Symposium 2000 This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE
More informationWafer Manufacturing. Reading Assignments: Plummer, Chap 3.1~3.4
Wafer Manufacturing Reading Assignments: Plummer, Chap 3.1~3.4 1 Periodic Table Roman letters give valence of the Elements 2 Why Silicon? First transistor, Shockley, Bardeen, Brattain1947 Made by Germanium
More informationExperiment #1, Analyze Data using Excel, Calculator and Graphs.
Physics 182 - Fall 2014 - Experiment #1 1 Experiment #1, Analyze Data using Excel, Calculator and Graphs. 1 Purpose (5 Points, Including Title. Points apply to your lab report.) Before we start measuring
More informationSynthetic Sensing: Proximity / Distance Sensors
Synthetic Sensing: Proximity / Distance Sensors MediaRobotics Lab, February 2010 Proximity detection is dependent on the object of interest. One size does not fit all For non-contact distance measurement,
More informationThermal diffusivity and conductivity - an introduction to theory and practice
Thermal diffusivity and conductivity - an introduction to theory and practice Utrecht, 02 October 2014 Dr. Hans-W. Marx Linseis Messgeräte GmbH Vielitzer Str. 43 D-95100 Selb / GERMANY www.linseis.com
More informationMaterials for Organic Electronic. Jeremy Burroughes FRS FREng
Materials for Organic Electronic Applications Jeremy Burroughes FRS FREng Introduction Organic Thin Film Transistors Organic Solar Cells and Photodiodes All Printed OLED Summary 4k2k 56 Displays Panasonic
More informationIII. Wet and Dry Etching
III. Wet and Dry Etching Method Environment and Equipment Advantage Disadvantage Directionality Wet Chemical Solutions Atmosphere, Bath 1) Low cost, easy to implement 2) High etching rate 3) Good selectivity
More informationDiodes and Transistors
Diodes What do we use diodes for? Diodes and Transistors protect circuits by limiting the voltage (clipping and clamping) turn AC into DC (voltage rectifier) voltage multipliers (e.g. double input voltage)
More information