Directed Self- Assembly of Block Copolymers; an Alternative Tool for Sub- 20 nm Lithography Parvaneh Mokarian
|
|
|
- Brooke Nicholson
- 8 years ago
- Views:
Transcription
1 Directed Self- Assembly of Block Copolymers; an Alternative Tool for Sub- 20 nm Lithography Parvaneh Mokarian Department of Chemistry, University College Cork (UCC) and Tyndall National Institute, Cork, Ireland & Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin Intel ERIC Conference, Croke Park, Dublin, 3-4 th Oct 2012
2 Overview What is a polymer? N: the degree of polymerisation (The number of monomers in a polymer ) Styrene monomer Polystyrene
3 Block Copolymers Covalent bond A n B n AB : Flory- Huggins interaction parameters The higher the The higher the chance of phase separation as cast polymer film after annealing A n B n
4 Thermodynamics of phase separation Two parameters control the phase behaviour of diblock copolymers: The volume fraction of A block : f A Combined interaction parameter: AB.N G mix /kt = (ln (f A ))/N A + (ln (f B ))/N B + AB f A f B AB 1 T Entropic terms Enthalpic term For phase separation: AB N 10.5
5 Thermodynamics of phase separation Block Copolymer s Phase Diagram
6 Applications Silica nanocone arrays with gold functionalized tip using BCPs as a nanolithography template Lindarti Purwaningsi, Beilstein J Nanotechnol. 2011; 2:
7 Applications 25 nm Magnetic Nanodot Arrays using BCP as nanolithography template A. Baruth et al, ACS Appl. Mater. Interfaces, 2011, 3 (9), pp Block copolymer thin film membrane for selective species transport for energy application Osoji lab,
8 Applications Controlled drug delivery Lo, K. et al, Acs Nano 2009, 3 (9),
9 In our lab Using BCPs as template to make sub 10 nm nanowires for transistors!! Creating nano patterns for other applications!
10 Hexagonal Phase PS-b-PEO Poly (Styrene-b- ethylene oxide) M w :42K-11.5K PS: amorphous, T g = 103 o C, ƒ PS = 0.8 PEO: crystalline, T g = -61 o C PS PEO N 40 (at 50 o C)
11 Creating line and dot pattern in PS-b-PEO Flipping of Morphology 10 min 20 min 40 min 60 min 75 min 90 min 105 min 120 min Mokarian-Tabari, P.; Morris, M. A. et al, Acs Nano 2011, 5 (6),
12 The Thermodynamics of the Swelling Swelling in polymers: mass uptake + chain stretching dc dt M ( t) d dx c0 dc D( ) dt Dt Fick s second low Case I diffusion Glassy polymer Case II diffusion ᵠ ᵠc Osmotic pressure Chains immobilised The front plasticised glassy d dt Elongational viscosity
13 Nano dots/pillars made by PS-b-PEO PEO block has been partially removed PS-b-PEO PS-b-PEO after wet etch in HI Protective cap 50 nm Si nano pillars EM cross section after pattern transfer Enhancing the etch contrast by iron oxide inclusion Patent: M.A. Morris, T. Ghoshal, D. Borah & P. Mokarian-Tabari T. Ghoshal, M.A. Morris et al, Adv. Mater. 2012, 24 (18),
14 Micro/Nano Patterns in Nature Combination of texture and material properties Superhydrophobic/superhydrophilic Anti reflective surfaces Self cleaning Water harvesting surfaces Park K., Barbastathis G., Acs Nano 2012, 6 (5),
15 Nano features Functionalised nano pillars Nano patterns + chemical functionalization Superhydrophobic property Wenzel state Cassie- Baxter state
16 Nanowire Challenges Smaller feature size,. N, chance of phase separation (investing in new polymer system with higher such as PS-PDMS, PS-PLA and PS- PEO) Etch contrast Defect free pattern (<0.01 cm -2 ) Directed self assembly (DSA) Confinement (trench substrate) Chemistry (surface functionalisation, selective side wall chemistry)
17 Directed Self Assembly Graphoepitaxy: Confinement effect PS-b-PEO Penalty associated with chain stretching
18 Directed Self Assembly Sparse Chemical pre-patterns 10 nm Nano-post for DSA Square arrays P. Nealey C.A. ROSS C.J. Hawker
19 Why Lamellar systems? Dot pattern Line pattern Etching issues!! Neutralised layer (brush chemistry) Parallel alignment (Due to the affinity of one of the blocks to the substrate/air interface)
20 ITRS Lithography
21 Microwave annealing Frequency: 2.4 GHz Power output 300 ±10% watts Using microwave for BCP self assembly: Zhang, X.J., et al.,. Acs Nano, , & Zhang, X.J., et al, Macromolecules 2011, 44,
22 Microwave annealing (Lamellar PS-b-PEO) T = 58 o C, 300 watts, solvents: toluene + water Si substrate water after 15 s!! after 30 s toluene Half pitch: 17 nm after 60 s after 120 s
23 Microwave annealing (Lamellar PS-b-PLA) Poly (styrene-b-lactic acid) Mn: (21k-19.5k), PDI:1.06 =0.22 PLA water soluble Good etch contrast Phase separated PS-b-PLA after solvent annealing in microwave for a few seconds! Excellent coverage (almost 100%) Unpublished data
24 Etch Contrast (Lamellar PS-b-PLA) Reactive Ion Etch Before etch Unpublished data After 15 s etch
25 Pattern Transfer (PS-b-PLA) 16 nm Si nanowires Pattern transfer in ICP/RIE, SF 6 /CHF 3 SEM cross section Unpublished data
26 He ion microscope SEM (poor contrast) PS-b-PMMA prior to etching A. Bell, CRANN He ion (excellent contrast)
27 Summary Thermodynamics of phase separation in BCPs (f A, AB N ) Dot and line pattern in cylinder forming PS-b-PEO Functionalised nano pillars with superhydrophobic properties Microwave annealing (process time is reduced to minutes) Perpendicular alignment in Lamellar PS-b-PEO without any brush or surface functionalisation PS-b-PLA system (sub 20 nm nanowires)
28 Acknowledgement Prof. M.A. Morris Cian Cummins, Timothy Collins, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Dr. Benjamin O Driscoll, Vladimir Djara, Dr. Tandra Ghoshal, Dr. Dipu Borah, Dr. Alan Bell, Atul Chaudhari, Prof J. Holmes Intel Advanced Laboratory (IAL) and staff: Matt Shaw, Peter Gleeson, Christopher Murray and Jennifer McKenna AML (Advanced Microscopy Laboratory), CRANN, Trinity College Dublin CRANN/ CSET / SFI (Science Foundation Ireland) for funding Staff of the mechanical and electrical workshop, training fab and clean room and microscopy in Tyndall p.mokarian@ucc.ie
Optimizing Materials and Processes for Directed SelfAssembly Applications
Optimizing Materials and Processes for Directed SelfAssembly Applications Phil Hustad, Jeff Weinhold, Rahul Sharma, Valeriy Ginzburg, Erin Vogel, Dan Murray, Vivian Chuang, Shih-Wei Chang, Peter Trefonas
HIGH χ BLOCK COPOLYMERS FOR SUB 20 nm PITCH PATTERNING: SYNTHESIS, SOLVENT ANNEALING, DIRECTED SELF ASSEMBLY, AND SELECTIVE BLOCK REMOVAL
HIGH χ BLOCK COPOLYMERS FOR SUB 20 nm PITCH PATTERNING: SYNTHESIS, SOLVENT ANNEALING, DIRECTED SELF ASSEMBLY, AND SELECTIVE BLOCK REMOVAL A Dissertation Presented to The Academic Faculty by Nathan Dudney
Electronic Supplementary Information for: Macroscopic samples of polystyrene with ordered three-dimensional nanochannels
Electronic Supplementary Information for: Macroscopic samples of polystyrene with ordered three-dimensional nanochannels Huiming Mao and Marc A. Hillmyer* Department of Chemistry University of Minnesota
Introduction to VLSI Fabrication Technologies. Emanuele Baravelli
Introduction to VLSI Fabrication Technologies Emanuele Baravelli 27/09/2005 Organization Materials Used in VLSI Fabrication VLSI Fabrication Technologies Overview of Fabrication Methods Device simulation
Supporting Online Material for
www.sciencemag.org/cgi/content/full/1162193/dc1 Supporting Online Material for Polymer Pen Lithography Fengwei Huo, Zijian Zheng, Gengfeng Zheng, Louise R. Giam, Hua Zhang, Chad A. Mirkin* *To whom correspondence
CAPITOLO III MATERIALI ASSEMBLATI E AUTOASSEMBLATI. Photonics and Biophotonics Organics Synthesis - PhoBOS
CAPITOLO III MATERIALI ASSEMBLATI E AUTOASSEMBLATI 1 Outline and motivation SA mono and multilayers on silica and silicon native oxide The chemistry of the process the effect of moisture the effect of
Damage-free, All-dry Via Etch Resist and Residue Removal Processes
Damage-free, All-dry Via Etch Resist and Residue Removal Processes Nirmal Chaudhary Siemens Components East Fishkill, 1580 Route 52, Bldg. 630-1, Hopewell Junction, NY 12533 Tel: (914)892-9053, Fax: (914)892-9068
Chapter 5: Diffusion. 5.1 Steady-State Diffusion
: Diffusion Diffusion: the movement of particles in a solid from an area of high concentration to an area of low concentration, resulting in the uniform distribution of the substance Diffusion is process
Study on Wet Etching of AAO Template
Study on Wet Etching of AAO Template Guofeng Hu, Haiming Zhang, Wenwen Di & Tingting Zhao School of Science, Tianjin Polytechnic University, Tianjin 300160, China E-mail: hugf2009@163.com Abstract The
Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography
Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography Wen-Di Li*, Wei Wu** and R. Stanley Williams Hewlett-Packard Labs *Current address: University
h e l p s y o u C O N T R O L
contamination analysis for compound semiconductors ANALYTICAL SERVICES B u r i e d d e f e c t s, E v a n s A n a l y t i c a l g r o u p h e l p s y o u C O N T R O L C O N T A M I N A T I O N Contamination
III. Wet and Dry Etching
III. Wet and Dry Etching Method Environment and Equipment Advantage Disadvantage Directionality Wet Chemical Solutions Atmosphere, Bath 1) Low cost, easy to implement 2) High etching rate 3) Good selectivity
Supporting information
Supporting information Ultrafast room-temperature NH 3 sensing with positively-gated reduced graphene oxide field-effect transistors Ganhua Lu 1, Kehan Yu 1, Leonidas E. Ocola 2, and Junhong Chen 1 * 1
Improved Contact Formation for Large Area Solar Cells Using the Alternative Seed Layer (ASL) Process
Improved Contact Formation for Large Area Solar Cells Using the Alternative Seed Layer (ASL) Process Lynne Michaelson, Krystal Munoz, Jonathan C. Wang, Y.A. Xi*, Tom Tyson, Anthony Gallegos Technic Inc.,
Mean Field Flory Huggins Lattice Theory
Mean Field Flory Huggins Lattice Theory Mean field: the interactions between molecules are assumed to be due to the interaction of a given molecule and an average field due to all the other molecules in
Unit 12 Practice Test
Name: Class: Date: ID: A Unit 12 Practice Test Multiple Choice Identify the choice that best completes the statement or answers the question. 1) A solid has a very high melting point, great hardness, and
Photolithography. Class: Figure 12.1. Various ways in which dust particles can interfere with photomask patterns.
Photolithography Figure 12.1. Various ways in which dust particles can interfere with photomask patterns. 19/11/2003 Ettore Vittone- Fisica dei Semiconduttori - Lectio XIII 16 Figure 12.2. Particle-size
Injection moulding and modelling on a micro scale
Injection moulding and modelling on a micro scale Technology Update Injection moulding and welding of plastics 11 November 2014 Research Projects (National / European) Micro/Nano/Multimaterial Manufacturing
Winbond W2E512/W27E257 EEPROM
Construction Analysis Winbond W2E512/W27E257 EEPROM Report Number: SCA 9703-533 Global Semiconductor Industry the Serving Since 1964 15022 N. 75th Street Scottsdale, AZ 85260-2476 Phone: 602-998-9780 Fax:
Low-cost Printed Electronic Nose Gas Sensors for Distributed Environmental Monitoring
Low-cost Printed Electronic Nose Gas Sensors for Distributed Environmental Monitoring Vivek Subramanian Department of Electrical Engineering and Computer Sciences University of California, Berkeley RD83089901
Nanometer-scale imaging and metrology, nano-fabrication with the Orion Helium Ion Microscope
andras@nist.gov Nanometer-scale imaging and metrology, nano-fabrication with the Orion Helium Ion Microscope Bin Ming, András E. Vladár and Michael T. Postek National Institute of Standards and Technology
JOURNAL INTEGRATED CIRCUITS AND SYSTEMS, VOL 1, NO. 3, JULY 2006. 39
JOURNAL INTEGRATED CIRCUITS AND SYSTEMS, VOL 1, NO. 3, JULY 2006. 39 Self-Assembled Polystyrene Micro-Spheres Applied for Photonic Crystals and Templates Fabrication Daniel S. Raimundo 1, Francisco J.
Nanoscience Course Descriptions
Nanoscience Course Descriptions NANO*1000 Introduction to Nanoscience This course introduces students to the emerging field of nanoscience. Its representation in popular culture and journalism will be
Effect of Surface-Hydroxylated CdS Nanoparticles on the Morphological Transformation of Polystyrene-block-Poly(ethylene oxide) Thin Films a
1680 Communication Summary: Polystyrene-block-poly(ethylene oxide) (SEO) block copolymer thin films, in which CdS clusters have been sequestered into the PEO domains of the SEO block copolymers, are found
Contamination. Cleanroom. Cleanroom for micro and nano fabrication. Particle Contamination and Yield in Semiconductors.
Fe Particles Metallic contaminants Organic contaminants Surface roughness Au Particles SiO 2 or other thin films Contamination Na Cu Photoresist Interconnect Metal N, P Damages: Oxide breakdown, metal
Over the last 50 years, commercial silicon photovoltaics
Light Trapping in Silicon Nanowire Solar Cells Erik Garnett and Peidong Yang* Department of Chemistry, University of California, Berkeley, California 94720 pubs.acs.org/nanolett ABSTRACT Thin-film structures
What is optical lithography? The optical system Production process Future and limits of optical lithography References. Optical lithography
Optical lithography Robin Nagel TUM 12. Januar 2009 Robin Nagel (TUM) Optical lithography 12. Januar 2009 1 / 22 1 What is optical lithography? 1 The optical system 1 Production process 1 Future and limits
Optical Hyperdoping: Transforming Semiconductor Band Structure for Solar Energy Harvesting
Optical Hyperdoping: Transforming Semiconductor Band Structure for Solar Energy Harvesting 3G Solar Technologies Multidisciplinary Workshop MRS Spring Meeting San Francisco, CA, 5 April 2010 Michael P.
Opaline Photonic Crystals: How Does Self-Assembly Work?
Opaline Photonic Crystals: How Does Self-Assembly Work? David J. Norris Chemical Engineering & Materials Science, University of Minnesota 1μm silica spheres See: D. J. Norris, E. G. Arlinghaus, L. Meng,
Adsorption at Surfaces
Adsorption at Surfaces Adsorption is the accumulation of particles (adsorbate) at a surface (adsorbent or substrate). The reverse process is called desorption. fractional surface coverage: θ = Number of
Dry Etching and Reactive Ion Etching (RIE)
Dry Etching and Reactive Ion Etching (RIE) MEMS 5611 Feb 19 th 2013 Shengkui Gao Contents refer slides from UC Berkeley, Georgia Tech., KU, etc. (see reference) 1 Contents Etching and its terminologies
Mask Cleaning Processes and Challenges
Mask Cleaning Processes and Challenges Brian J. Grenon Grenon Consulting, Inc. 92 Dunlop Way Colchester, VT 05446 Phone: 802-862-4551 Fax: 802-658-8952 e-mail bgrenon@together.net Mask Supply Workshop
Conductivity of silicon can be changed several orders of magnitude by introducing impurity atoms in silicon crystal lattice.
CMOS Processing Technology Silicon: a semiconductor with resistance between that of conductor and an insulator. Conductivity of silicon can be changed several orders of magnitude by introducing impurity
Development of New Inkjet Head Applying MEMS Technology and Thin Film Actuator
Development of New Inkjet Head Applying MEMS Technology and Thin Film Actuator Kenji MAWATARI, Koich SAMESHIMA, Mitsuyoshi MIYAI, Shinya MATSUDA Abstract We developed a new inkjet head by applying MEMS
CS257 Introduction to Nanocomputing
CS257 Introduction to Nanocomputing Overview of Crossbar-Based Computing John E Savage Overview Intro to NW growth methods Chemical vapor deposition and fluidic assembly Nano imprinting Nano stamping Four
Influence of Solder Reaction Across Solder Joints
Influence of Solder Reaction Across Solder Joints Kejun Zeng FC BGA Packaging Development Semiconductor Packaging Development Texas Instruments, Inc. 6 th TRC Oct. 27-28, 2003 Austin, TX 1 Outline Introduction
Focused Ion beam nanopatterning: potential application in photovoltaics
Focused Ion beam nanopatterning: potential application in photovoltaics Research Infrastructure: Location: FIB-Focused Ion Beam ENEA Portici (Italy) Date March, 26 2013 Speakers: Vera La Ferrara, ENEA
Silicon-On-Glass MEMS. Design. Handbook
Silicon-On-Glass MEMS Design Handbook A Process Module for a Multi-User Service Program A Michigan Nanofabrication Facility process at the University of Michigan March 2007 TABLE OF CONTENTS Chapter 1...
JePPIX Course Processing Wet and dry etching processes. Huub Ambrosius
JePPIX Course Processing Wet and dry etching processes Huub Ambrosius Material removal: etching processes Etching is done either in dry or wet methods: Wet etching uses liquid etchants with wafers immersed
How cryo will solve your problems
How cryo will solve your problems Nadejda B. Matsko FELMI, TU Graz, and ZFE Graz What for do we need cryo microscopy? Cryo fixation Conventional fixation (rapid rapid dehydration) High resolution microscopy
MISCIBILITY AND INTERACTIONS IN CHITOSAN AND POLYACRYLAMIDE MIXTURES
MISCIBILITY AND INTERACTIONS IN CHITOSAN AND POLYACRYLAMIDE MIXTURES Katarzyna Lewandowska Faculty of Chemistry Nicolaus Copernicus University, ul. Gagarina 7, 87-100 Toruń, Poland e-mail: reol@chem.umk.pl
Lecture 11. Etching Techniques Reading: Chapter 11. ECE 6450 - Dr. Alan Doolittle
Lecture 11 Etching Techniques Reading: Chapter 11 Etching Techniques Characterized by: 1.) Etch rate (A/minute) 2.) Selectivity: S=etch rate material 1 / etch rate material 2 is said to have a selectivity
Chemical Structure of the polymer showing end groups: CH 3 CH 2 CH H
Polymer Reference Materials-Polystyrene Introduction Reference materials are used for calibration and performance evaluation of instruments used as part of overall quality assurance programs of polymer.
Ion Beam Sputtering: Practical Applications to Electron Microscopy
Ion Beam Sputtering: Practical Applications to Electron Microscopy Applications Laboratory Report Introduction Electron microscope specimens, both scanning (SEM) and transmission (TEM), often require a
BIOL 305L Laboratory Two
Please print Full name clearly: Introduction BIOL 305L Laboratory Two Osmosis, because it is different in plants! Osmosis is the movement of solvent molecules through a selectively permeable membrane into
Formation of Oriented Fibers Using Injection of PEO Solutions inside Electric Fields Defined by Two Parallel Suspended Electrodes
06 (43)-AF:Modelo-AF 8/20/11 6:41 AM Page 122 Formation of Oriented Fibers Using Injection of PEO Solutions inside Electric Fields Defined by Two Parallel Suspended R. Furlan 1, J. A. M. Rosado 2, A. N.
Sputtered AlN Thin Films on Si and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties
Sputtered AlN Thin Films on and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties S. Mishin, D. R. Marx and B. Sylvia, Advanced Modular Sputtering,
IBS - Ion Beam Services
IBS - Ion Beam Services Profile Technologies Devices & sensor fabricat ion Participation to R&D programs Researched partnership Présentation activité composant 1 Profile : Products and services Product
Back to Basics Fundamentals of Polymer Analysis
Back to Basics Fundamentals of Polymer Analysis Using Infrared & Raman Spectroscopy Molecular Spectroscopy in the Polymer Manufacturing Process Process NIR NIR Production Receiving Shipping QC R&D Routine
Implementation Of High-k/Metal Gates In High-Volume Manufacturing
White Paper Implementation Of High-k/Metal Gates In High-Volume Manufacturing INTRODUCTION There have been significant breakthroughs in IC technology in the past decade. The upper interconnect layers of
Light management for photovoltaics. Ando Kuypers, TNO Program manager Solar
Light management for photovoltaics Ando Kuypers, TNO Program manager Solar Global energy consumption: 500 ExaJoule/Year Solar irradiation on earth sphere: 5.000.000 ExaJoule/year 2 Capturing 0,01% covers
Modification of Graphene Films by Laser-Generated High Energy Particles
Modification of Graphene Films by Laser-Generated High Energy Particles Elena Stolyarova (Polyakova), Ph.D. ATF Program Advisory and ATF Users Meeting April 2-3, 2009, Berkner Hall, Room B, BNL Department
Luminescence study of structural changes induced by laser cutting in diamond films
Luminescence study of structural changes induced by laser cutting in diamond films A. Cremades and J. Piqueras Departamento de Fisica de Materiales, Facultad de Fisicas, Universidad Complutense, 28040
SORTING PLASTICS FOR RECYCLING INTRODUCTION
SORTING PLASTICS FOR RECYCLING INTRODUCTION Description Students use the difference in densities of polymers and flame tests as a basis for the development of a scheme to separate plastics. Goals for This
ELEC 3908, Physical Electronics, Lecture 15. BJT Structure and Fabrication
ELEC 3908, Physical Electronics, Lecture 15 Lecture Outline Now move on to bipolar junction transistor (BJT) Strategy for next few lectures similar to diode: structure and processing, basic operation,
New materials on horizon for advanced logic technology in mobile era
New materials on horizon for advanced logic technology in mobile era source gate Kelin J. Kuhn, TED 2012 drain Franz Kreupl, IFX 2003 Hsinchu March 6, 2013 - Prof. Dr. Franz Kreupl 1 Outline Introduction
Viscoelasticity of Polymer Fluids.
Viscoelasticity of Polymer Fluids. Main Properties of Polymer Fluids. Entangled polymer fluids are polymer melts and concentrated or semidilute (above the concentration c) solutions. In these systems polymer
Patterning with block copolymer thin films
Materials Science and Engineering R 48 (2005) 191 226 Patterning with block copolymer thin films Rachel A. Segalman* Department of Chemical Engineering, University of California at Berkeley, Division of
Elements of Addition Polymerization. Branching and Tacticity. The Effect of Crystallinity on Properties
Topics to be Covered Elements of Addition Polymerization Branching and Tacticity The Effect of Crystallinity on Properties Chapters 1 & 2 in CD (Polymer Science and Engineering) What Are Polyolefins? The
The chemical interactions of the template molecule are primarily dependent on the choice of polymer
Study of the Surface Morphology of Methyl 4-nitrobenzoate Template Thin-film Molecularly Imprinted Polymers Gary Kaganas Dartmouth College and Center for Nanomaterials Research at Dartmouth, Hanover NH
Polymers: Introduction
Chapter Outline: Polymer Structures Hydrocarbon and Polymer Molecules Chemistry of Polymer Molecules Molecular Weight and Shape Molecular Structure and Configurations Copolymers Polymer Crystals Optional
The content is based on the National Science Teachers Association (NSTA) standards and is aligned with state standards.
Literacy Advantage Physical Science Physical Science Literacy Advantage offers a tightly focused curriculum designed to address fundamental concepts such as the nature and structure of matter, the characteristics
Comprehensive Investigation of Sequential Plasma Activated Si/Si Bonded Interface for Nano-integration
Comprehensive Investigation of Sequential Plasma Activated Si/Si Bonded Interface for Nano-integration M G Kibria, F Zhang, T H Lee, M J Kim and M M R Howlader Dept. Electrical and Computer Engineering,
VLSI Fabrication Process
VLSI Fabrication Process Om prakash 5 th sem ASCT, Bhopal omprakashsony@gmail.com Manisha Kumari 5 th sem ASCT, Bhopal Manisha2686@gmail.com Abstract VLSI stands for "Very Large Scale Integration". This
Graduate Student Presentations
Graduate Student Presentations Dang, Huong Chip packaging March 27 Call, Nathan Thin film transistors/ liquid crystal displays April 4 Feldman, Ari Optical computing April 11 Guerassio, Ian Self-assembly
Nanofabrication using anodic alumina templates. IFIMUP and IN Institute of Nanoscience and Nanotechnology
Nanofabrication using anodic alumina templates João Pedro Araújo IFIMUP and IN Institute of Nanoscience and Nanotechnology Outline Template based nanofabrication Nanoporous alumina templates Template filling
Click to edit Master title style. The Prospects for Cost-Competitive Photovoltaics: From Nanoscale Science to Macroscale Manufacturing
1 The Prospects for Cost-Competitive Photovoltaics: From Nanoscale Science to Macroscale Manufacturing Jeffrey S. Nelson, Manager Nanostructure Physics Department Center for Integrated Nanotechnologies
Module 7 Wet and Dry Etching. Class Notes
Module 7 Wet and Dry Etching Class Notes 1. Introduction Etching techniques are commonly used in the fabrication processes of semiconductor devices to remove selected layers for the purposes of pattern
Basic Properties and Application of Auto Enamels
Basic Properties and Application of Auto Enamels Composition of Ceramic Automotive Glass Enamels Ceramic automotive glass colours are glass enamels that fire on to the glass during the bending process
Electromouillage réversible sur nanofils de silicium superhydrophobes
Electromouillage réversible sur nanofils de silicium superhydrophobes EWOD: Electro Wetting On Dielectrics Rabah Boukherroub 1,2 N. Verplanck, 2 G.Piret 1,2 Y. Coffinier, 1,2 E. Galopin, 2 V. Thomy, 2
Secondary Ion Mass Spectrometry
Secondary Ion Mass Spectrometry A PRACTICAL HANDBOOK FOR DEPTH PROFILING AND BULK IMPURITY ANALYSIS R. G. Wilson Hughes Research Laboratories Malibu, California F. A. Stevie AT&T Bell Laboratories Allentown,
Aplicaciones de la nanolitografía de oxidación por AFM
ForceTool Aplicaciones de la nanolitografía de oxidación por AFM (AFM oxidation nanolithography or Local oxidation nanolithography) Templates for the growth of molecular arquitectures Transistors Sensors
Semiconductor doping. Si solar Cell
Semiconductor doping Si solar Cell Two Levels of Masks - photoresist, alignment Etch and oxidation to isolate thermal oxide, deposited oxide, wet etching, dry etching, isolation schemes Doping - diffusion/ion
Effect of Sterilization Techniques on Polymers
Effect of Sterilization Techniques on Polymers Contents of Presentation Introduction to Polymers Properties and Stability of Polymers Affect of Ionising Radiation and Ethylene Oxide on Polymers The need
Winbond W971GG6JB-25 1 Gbit DDR2 SDRAM 65 nm CMOS DRAM Process
Winbond W971GG6JB-25 1 Gbit DDR2 SDRAM 65 nm CMOS DRAM Process Process Review For comments, questions, or more information about this report, or for any additional technical needs concerning semiconductor
Lecture 30: Cleanroom design and contamination control
Lecture 30: Cleanroom design and contamination control Contents 1 Introduction 1 2 Contaminant types 2 2.1 Particles.............................. 2 2.2 Metal ions............................. 4 2.3 Chemicals.............................
1. Photon Beam Damage and Charging at Solid Surfaces John H. Thomas III
1. Photon Beam Damage and Charging at Solid Surfaces John H. Thomas III 1. Introduction............................. 2. Electrostatic Charging of Samples in Photoemission Experiments............................
3D NAND Technology Implications to Enterprise Storage Applications
3D NAND Technology Implications to Enterprise Storage Applications Jung H. Yoon Memory Technology IBM Systems Supply Chain Outline Memory Technology Scaling - Driving Forces Density trends & outlook Bit
Fluids Confined in Carbon Nanotubes
Fluids Confined in Carbon Nanotubes Constantine M. Megaridis Micro/Nanoscale Fluid Transport Laboratory Mechanical and Industrial Engineering University of Illinois at Chicago 1 Background and Societal
BIOACTIVE COATINGS ON 316L STAINLESS STEEL IMPLANTS
Trends Biomater. Artif. Organs. Vol. 17(2) pp 43-47 (2004) http//www.sbaoi.org BIOACTIVE COATINGS ON 316L STAINLESS STEEL IMPLANTS N. Ramesh Babu*,+, Sushant Manwatkar*, K. Prasada Rao* and T. S. Sampath
Hands-On Labs SM-1 Lab Manual
EXPERIMENT 4: Separation of a Mixture of Solids Read the entire experiment and organize time, materials, and work space before beginning. Remember to review the safety sections and wear goggles when appropriate.
SELF-ASSEMBLED POLYSTYRENE-BLOCK-POLY (ETHYLENE OXIDE) (PS-b- PEO) MICELLE MORPHOLOGIES IN SOLUTION. A Dissertation. Presented to
SELF-ASSEMBLED POLYSTYRENE-BLOCK-POLY (ETHYLENE OXIDE) (PS-b- PEO) MICELLE MORPHOLOGIES IN SOLUTION A Dissertation Presented to The Graduate Faculty of The University of Akron In Partial Fulfillment of
Micro-Nano Materials Characterization and Inspection
Basic 10 Micro-Nano Materials Characterization and Inspection - Evaluation of Electrical l Properties- Prof. Yang Ju Dept. of Mechanical Science and Engineering Nagoya University, Japan Outline 1. The
OPTIMIZING OF THERMAL EVAPORATION PROCESS COMPARED TO MAGNETRON SPUTTERING FOR FABRICATION OF TITANIA QUANTUM DOTS
OPTIMIZING OF THERMAL EVAPORATION PROCESS COMPARED TO MAGNETRON SPUTTERING FOR FABRICATION OF TITANIA QUANTUM DOTS Vojtěch SVATOŠ 1, Jana DRBOHLAVOVÁ 1, Marian MÁRIK 1, Jan PEKÁREK 1, Jana CHOMOCKÁ 1,
Nanoscale Resolution Options for Optical Localization Techniques. C. Boit TU Berlin Chair of Semiconductor Devices
berlin Nanoscale Resolution Options for Optical Localization Techniques C. Boit TU Berlin Chair of Semiconductor Devices EUFANET Workshop on Optical Localization Techniques Toulouse, Jan 26, 2009 Jan 26,
Study on Characteristics of Polymer Surfactant and Application of Polymer Surfactant Flooding Technology in Oilfield
International Journal of Chemistry and Applications. ISSN 0974-3111 Volume 6, Number 1 (2014), pp. 1-6 International Research Publication House http://www.irphouse.com Study on Characteristics of Polymer
Rapid Prototyping and Development of Microfluidic and BioMEMS Devices
Rapid Prototyping and Development of Microfluidic and BioMEMS Devices J. Sasserath and D. Fries Intelligent Micro Patterning System Solutions, LLC St. Petersburg, Florida (T) 727-522-0334 (F) 727-522-3896
Permeability Study on the Coating Film Consisting of CA-398-10 NF/EP and CA- 320S NF/EP
Permeability Study on the Coating Film Consisting of CA-398-10 NF/EP and CA- 320S NF/EP Please note: This article is the original unedited version of the article that was featured in Drug Development &
Le nanotecnologie: dal Laboratorio al Mercato. Fabrizio Pirri Politecnico di Torino Istituto Italiano di Tecnologia
Le nanotecnologie: dal Laboratorio al Mercato Fabrizio Pirri Politecnico di Torino Istituto Italiano di Tecnologia Materials & Processes for micro nanotechnologies Laboratory http://www.polito.it/micronanotech
Keystone Review Practice Test Module A Cells and Cell Processes. 1. Which characteristic is shared by all prokaryotes and eukaryotes?
Keystone Review Practice Test Module A Cells and Cell Processes 1. Which characteristic is shared by all prokaryotes and eukaryotes? a. Ability to store hereditary information b. Use of organelles to control
EXPERIMENTAL STUDY OF STRUCTURAL ZONE MODEL FOR COMPOSITE THIN FILMS IN MAGNETIC RECORDING MEDIA APPLICATION
EXPERIMENTAL STUDY OF STRUCTURAL ZONE MODEL FOR COMPOSITE THIN FILMS IN MAGNETIC RECORDING MEDIA APPLICATION Hua Yuan and David E. Laughlin Department of Materials Science and Engineering, Carnegie Mellon
Defects Introduction. Bonding + Structure + Defects. Properties
Defects Introduction Bonding + Structure + Defects Properties The processing determines the defects Composition Bonding type Structure of Crystalline Processing factors Defects Microstructure Types of
Rosaria Rinaldi. Dipartimento di Matematica e Fisica «E. De Giorgi» Università del Salento. Scuola Superiore ISUFI Università del Salento
Rosaria Rinaldi Dipartimento di Matematica e Fisica «E. De Giorgi» Università del Salento Scuola Superiore ISUFI Università del Salento National Nanotechnology Laboratory Istituto di NanoScienze CNR Università
GCSE Chemistry Quiz Chemical Reactions
GCSE Chemistry Quiz Chemical Reactions A chemical reaction is a process where the molecular structure changes. Chemical reactions are all around us. We can see many reactions such as fireworks and explosions.
Computational Nanoscience of Soft Matter
ChE/MSE 557 Computational Nanoscience of Soft Matter Fall 2006 Instructor: Professor Sharon C. Glotzer Class meets: Tues 3:00-6:00 Location: Room 3336 BD, Duderstadt Center Room 3336 AC, Duderstadt Center
Effect of Humidity on the Ordering of PEO-Based Copolymer Thin Films
Macromolecules 2007, 40, 7019-7025 7019 Effect of Humidity on the Ordering of PEO-Based Copolymer Thin Films Joona Bang, Bumjoon J. Kim,, Gila E. Stein,, Thomas P. Russell, # Xuefa Li, O Jin Wang, O Edward
Organic semiconductors
Plastic (Organic) Solar Cells: Accomplishments, Challenges, and Strategies Sumit Chaudhary Assistant Professor Department of Electrical and Computer Engineering Materials Science and Engineering Iowa State
Scotch-Weld TM. Acrylic Adhesives. DP8405NS Green. Product Data Sheet. Date: March 2014 Supersedes: August 2013
Scotch-Weld TM Product Data Sheet Acrylic Adhesives Date: Supersedes: August 2013 Product Description 3M TM Scotch-Weld Acrylic Adhesives are high performance, twopart acrylic adhesives that offer good
SETSCO SERVICES PTE LTD TEST REPORT MICROSCOPIC ANALYSIS ON THE CONCRETE CORES FROM RETAINING WALL AT CHANGI AIRPORT TERMINAL 3 REVERTON ENGINEERING(S) PTE LTD 1. INTRODUCTION 2. MICROSCOPIC ANALYSIS 3.
Chapter 1 Introduction to The Semiconductor Industry 2005 VLSI TECH. 1
Chapter 1 Introduction to The Semiconductor Industry 1 The Semiconductor Industry INFRASTRUCTURE Industry Standards (SIA, SEMI, NIST, etc.) Production Tools Utilities Materials & Chemicals Metrology Tools