Gencoa 3 rd Generation circular magnetron cathodes for R&D. Gencoa, Liverpool, UK. SVCTechcon 2016 Innovators Showcase

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Clyde Wade
7 years ago
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1 SVCTechcon 2016 Innovators Showcase Gencoa 3 rd Generation circular magnetron cathodes for R&D Jonathan Price, Bimal Kurian, Dermot Monaghan, Victor Bellido, Frank Papa Gencoa, Liverpool, UK.

2 Gencoa have been involved in circular magnetrons manufacture for the last twenty years & the 3 rd type of cathode design is now available

3 Gencoa Circular Magnetron Magnetic Options Overview BP φ Standard 2 pole (SW/PP) VT variable High Yield HY HU High Uniformity MRS - Multi-ring static FFE Magnetic Materials Magnetic packs available for circular range 2, 3 4, 6, 8, 10, 12, 14 & 16

4 Gencoa previous range of small circular magnetrons with options Such as head tilt and shutters

5 Gencoa 3G Cathode Aims Gencoa Circular Magnetron 3G Aims of re-design Update the design with the latest technology continuous product improvement Make more compact ±45⁰ Tilt with easy and accurate location to 1 degree precision Standard target size 2 OD-5 OD Easy Target Change Gas Injection Option as standard DC, RF and HIPIMS compatible as standard Introduce High Yield magnetics for 4 & 5 sizes

6 Gencoa 3G Circular Magnetron Results Gencoa 3G Cathode results of re-design 2, 3, 4 & 5 cathodes size have been designed & tested to the new style Very compact in size - requires 1 extra space on the target diameter New type of non-bellows ±45⁰ tilt via head rotation & to 1 degree precision Standard target clamping the mono-block and bonded targets are 2 OD-5 OD Easy target change & allows for different target thickness and types Gas Injection Option as standard - connection through the mounting tube All power modes rear connection box, N type, HN or 7/16 connector choices High Yield magnetics for 4 & 5 sizes have been realized

7 Compact Size Small OD relative to target. For example 2 (50mm) magnetron OD is 3 (76.2mm) Gencoa Circular 3G Magnetron Compact Size Tilt height most compact in industry which is the dimension C in the image below. Tilt pivot point is 1 from cathode rear allowing higher tilt angles relative to the substrate. * Measurement in mm

8 Target details No tools required for target change. antisticking materials used for fixing Can use a conduction gasket between target and cooled diaphragm High water flow and diaphragm cooling for high power capacity Directly cooled targets available factory configured Target Target clamp Anode Assembly

9 3G Circular product range method of tilting Measurement of angle adjustment The cathodes allow ±45 Angle can be viewed and adjusted from the front of the cathode The 2 position KF clamp is released to slack - but still attached position, the head is rotated to the desired angle, then the clamp is re-fixed to the first notch tight position. To measure the angle, there is a milled slot on the clamp that is aligned with the protractor angle. As the angular measurement protractor is big, the angle can be fixed accurately to 1. A gradation will be every degree, although not shown on the image. The protractor is removable. Tilt can be excluded straight shaft

10 Gencoa 3G Circular product range 3G Gas Injection and Power Connection Gas injection standard on all cathodes Gas injection fully internal thus no design change required between internal/external versions. Reduced complexity of injection design avoiding gas plate on top anode. All metal gas line until injection point which allows a cleaner process. Gas Injection pipe Gas point Power (DC, RF, &HIPIMS) HN, N or 7/16 Manual RF matching box option direct onto the power connector

11 Circular product range No tilt option (SW-3Ga) The cathodes can be supplied with a simple straight shaft when tilt adjustment is not required. All other aspects of the cathode are the same.

12 Gencoa 3G Circular Cathode Gencoa 3G Circular The overall dimension of the new circular product is small. Magnetron head can be tilted 45 ⁰ with ease. No welded bellows and compact tilt height makes magnetrons close together in a cluster. The angle can be fixed accurately to 1. High Yield magnetics for 4 offering >40 % target use and recommended for precious metal sputtering Gas injection standard for all magnetrons DC, RF & HIPIMS compatible as standard

13 Gencoa is actively combining technologies and developing ways to enhance thin film devices Thank you for your attention Thank You Please visit us at Booth 506 or

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Planar Magnetron Sputtering Sources Planar Magnetron puttering ources INTRODUCTION TABLE OF CONTENT PAGE Introduction........................ 2 MAK 1.3...........................3 MAK 2............................4 MAK 3............................5