Etudes in situ et ex situ de multicouches C/FePt



Similar documents
Magnetic Data Storage and Nanoparticles Ernie Chang

New magnetism of 3d monolayers grown with oxygen surfactant: Experiment vs. ab initio calculations

Study of the anomalous magnetic behavior of nanostructures by X-ray magnetic circular dichroism

Dependence of the thickness and composition of the HfO 2 /Si interface layer on annealing

Physical Properties and Functionalization of Low-Dimensional Materials

Sputtered AlN Thin Films on Si and Electrodes for MEMS Resonators: Relationship Between Surface Quality Microstructure and Film Properties

NANO SILICON DOTS EMBEDDED SIO 2 /SIO 2 MULTILAYERS FOR PV HIGH EFFICIENCY APPLICATION

ESRF Upgrade Phase II: le nuove opportunitá per le linee da magnete curvante

X-Rays and Magnetism From Fundamentals to Nanoscale Dynamics

NANOSTRUCTURED ZnO AND ZAO TRANSPARENT THIN FILMS BY SPUTTERING SURFACE CHARACTERIZATION

Applications of New, High Intensity X-Ray Optics - Normal and thin film diffraction using a parabolic, multilayer mirror

Vacuum Evaporation Recap

Direct Observation of Magnetic Gradient in Co/Pd Pressure-Graded Media

X-Ray Study of Soft and Hard Magnetic Thin Films

Chemical Sputtering. von Kohlenstoff durch Wasserstoff. W. Jacob

Polarization Dependence in X-ray Spectroscopy and Scattering. S P Collins et al Diamond Light Source UK

Glancing XRD and XRF for the Study of Texture Development in SmCo Based Films Sputtered Onto Silicon Substrates

Coating Technology: Evaporation Vs Sputtering

Surface plasmon nanophotonics: optics below the diffraction limit

Exchange bias. J. Nogués, Ivan K. Schuller *

Thermal unobtainiums? The perfect thermal conductor and the perfect thermal insulator

Simple and scalable fabrication approaches of Nanophotonic structures for PV

Wir schaffen Wissen heute für morgen

2. Deposition process

Physics 441/2: Transmission Electron Microscope

Dry Etching and Reactive Ion Etching (RIE)

Undulators and wigglers for the new generation of synchrotron sources

Phase Characterization of TiO 2 Powder by XRD and TEM

ORIENTATION CHARACTERISTICS OF THE MICROSTRUCTURE OF MATERIALS

Surface characterization of oxygen deficient SrTiO 3

RAPIDLY SOLIDIFIED COPPER ALLOYS RIBBONS

Nanoelectronics 09. Atsufumi Hirohata Department of Electronics. Quick Review over the Last Lecture

EXPERIMENTAL STUDY OF STRUCTURAL ZONE MODEL FOR COMPOSITE THIN FILMS IN MAGNETIC RECORDING MEDIA APPLICATION

DIEGO TONINI MORPHOLOGY OF NIOBIUM FILMS SPUTTERED AT DIFFERENT TARGET SUBSTRATE ANGLE

COMPARISON OF FOUR DATA ANALYSIS SOFTWARE FOR COMBINED X-RAY REFLECTIVITY AND GRAZING INCIDENCE X-RAY FLUORESCENCE MEASUREMENTS

Origin of low-friction behavior in graphite investigated by. surface x-ray diffraction

Amorphous Transparent Conducting Oxides (TCOs) Deposited at T 100 C

Chapter 5: Diffusion. 5.1 Steady-State Diffusion

Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry

The study of structural and optical properties of TiO 2 :Tb thin films

Chapter 4 Indium Tin Oxide Films Deposited by d.c. Sputtering

Ion Beam Sputtering: Practical Applications to Electron Microscopy

Production of ferrite nanopowders in radiofrequency thermal plasma

Graphene a material for the future

JOURNAL INTEGRATED CIRCUITS AND SYSTEMS, VOL 1, NO. 3, JULY

X-ray diffraction techniques for thin films

Andromeda and END-MS, New generation of Surface Analysis Instrument

XCVII Congresso Nazionale

Explain the ionic bonds, covalent bonds and metallic bonds and give one example for each type of bonds.

Nanoparticle Deposition on Packaging Materials by the Liquid Flame Spray

Surface-state engineering for interconnects on H-passivated Si(100)

bulk 5. Surface Analysis Why surface Analysis? Introduction Methods: XPS, AES, RBS

Direct Energy Influx Measurements. in Low Pressure Plasma Processes

MAGNETIC PHASE AND DOMAIN EVOLUTION OF

Conductivity of silicon can be changed several orders of magnitude by introducing impurity atoms in silicon crystal lattice.

Simultaneous data fitting in ARXPS

Scanning Near Field Optical Microscopy: Principle, Instrumentation and Applications

Fundamental Aspects of Exchange Bias Effect in AF/F Bilayers and Multilayers

Study of Surface Reaction and Gas Phase Chemistries in High Density C 4 F 8 /O 2 /Ar and C 4 F 8 /O 2 /Ar/CH 2 F 2 Plasma for Contact Hole Etching

Chemical Synthesis. Overview. Chemical Synthesis of Nanocrystals. Self-Assembly of Nanocrystals. Example: Cu 146 Se 73 (PPh 3 ) 30

Developments in Data Storage: Materials Perspective

The Focused Ion Beam Scanning Electron Microscope: A tool for sample preparation, two and three dimensional imaging. Jacob R.

Diffusion effect of intermetallic layers on adhesion and mechanical properties of electrical contacts

High performance hard magnetic NdFeB thick films for integration into

Electron Microscopy 3. SEM. Image formation, detection, resolution, signal to noise ratio, interaction volume, contrasts

Controlling Gold Nanoparticles with Atomic Precision: Synthesis and Structure Determination

The study of deep-level emission center in ZnO films grown on c-al 2 O 3 substrates

Keywords: Planar waveguides, sol-gel technology, transmission electron microscopy

Technology Developments Towars Silicon Photonics Integration

Microstockage d énergie Les dernières avancées. S. Martin (CEA-LITEN / LCMS Grenoble)

DURABILITY OF MORTAR LININGS IN DUCTILE IRON PIPES Durability of mortar linings

CVD SILICON CARBIDE. CVD SILICON CARBIDE s attributes include:

CryoEDM A Cryogenic Neutron-EDM Experiment. Collaboration: Sussex University, RAL, ILL, Kure University, Oxford University Hans Kraus

Upcoming APS Summer Schools

Nanometer-scale imaging and metrology, nano-fabrication with the Orion Helium Ion Microscope

X-ray thin-film measurement techniques

Module 7 Wet and Dry Etching. Class Notes

Electron Microscopy SEM and TEM

Investigation of interlayer exchange coupling in ferro-/antiferro-/ferromagnetic trilayers

Wafer Manufacturing. Reading Assignments: Plummer, Chap 3.1~3.4

Neuere Entwicklungen zur Herstellung optischer Schichten durch reaktive. Wolfgang Hentsch, Dr. Reinhard Fendler. FHR Anlagenbau GmbH

CSCI 4974 / 6974 Hardware Reverse Engineering. Lecture 8: Microscopy and Imaging

How To Understand Light And Color

Iron-Carbon Phase Diagram (a review) see Callister Chapter 9

Porous silicon based optical multilayers

X-ray Diffraction and EBSD

Multi-walled Carbon Nanotube Reinforced Aluminum Nanocomposites by Cold Kinetic Spraying

Chem 1A Exam 2 Review Problems

Transcription:

Etudes in situ et ex situ de multicouches C/FePt : influence de la température sur la structure et les propriétés s magnétiques D. Babonneau, G. Abadias, F. Pailloux Laboratoire de Physique des Matériaux (PHYMAT) UMR 6630 CNRS Université de Poitiers N. Jaouen, E. Fonda Synchrotron SOLEIL, Gif-sur-Yvette F. Petroff Unité Mixte de Physique CNRS/THALES, Palaiseau J.-S. Micha UMR SPrAM 5819 CNRS, CEA DRMFC, Grenoble

Ultrahigh density magnetic recording and superparamagnetism Applications expected in magnetic data storage Ordered L1 0 FePt phase (tetragonal structure) Fe Pt Pt http://www.intel.com/technology/silicon/mooreslaw/ K u = 7 10 7 erg.cm -3 Higher areal densities of magnetic recording media require smaller grains Nanometric grains have a higher probability of flipping Superparamegnetic limit: K k V T u B > 40 Grains with high magnetic anisotropy are required to preserve thermal stability

Effects of thermal annealing in cosputtered Fe Fe 50 Pt 50 50 films As-deposited (RT) 350 C 450 C 550 C 650 C Grain size 10-20 nm Disordered fcc structure (a = 3.83 Å) Grain size increases to 100-200 nm Phase transformation to the ordered fct structure (c/a = 0.96) D. Babonneau et al., Rev. Adv. Mater. Sci. 15 (2007) 198 207 Encapsulation of FePt nanoparticles in carbon: protection against oxidation, reduction of magnetic coupling, limitation of grain growth during deposition and annealing

Growth of C/FePt granular multilayers by ion-beam sputtering Target holder Sputtering gun Ar + 1200 ev Alternate deposition from pure C and FePt targets Si 4 nm Carbon (T = 20 C) Si 1 nm Fe 50 Pt 50 N Si 4 nm Carbon Substrate holder Structural properties: TEM, GISAXS, XDR, XAS Magnetic properties: SQUID, XMCD

Structure of the C/FePt granular multilayers High-resolution TEM (cross-section section view) Layered structure with dark grains separated by a-c Lateral grain size D 3 nm and height H 2 nm Sharp size distribution 1,8 As-deposited at RT Intensity (Arb. Units.) 1,2 0,6 C K-edge As deposited Annealed XANES 0,0 280 300 320 340 Photon Energy (ev) Annealed 1 h at 600 C Increase of the grain size (lateral and vertical) Carbon matrix becomes more graphitic: protection of the FePt nanoparticles against oxidation

Structure of the C/FePt granular multilayers High-resolution TEM (cross-section section view) Grazing incidence X-ray X diffraction (GIXRD) Disordered fcc structure a = 3.79 Å, c/a = 1, S = 0 As-deposited at RT Partially ordered fct structure a = 3.89 Å, c/a = 0.92, S = 0.55 Annealed 1 h at 600 C

Energy filtered transmission electron microscopy After annealing at 800 C CTEM Si map C map Bimodal size distribution tends to develop Self-organization is destroyed Formation of precipitates in the Si substrate oriented at 54 with respect to the Si/C interface Fe map Chemical interaction of the Fe atoms with the Si substrate

In-situ GISAXS and GIXRD of the C/FePt granular multilayers Annealing from RT to 820 C C (ESRF BM32 beamline @ 11.3 kev) GISAXS map contains information on the size and organization (lateral and vertical) of the carbonencapsulated FePt nanoparticles Disordered fcc phase with a = 3.79 Å In situ GISAXS In situ GIXRD D. Babonneau et al., J. Phys.: Condens. Matter 20 (2008) 035218

In-situ GISAXS analysis of the C/FePt granular multilayers I( q) = k1 P( q, D1 ) S( q, D1, ηhs ) + k2 P( q, D2 ) Correlated nanoparticles Uncorrelated Increase of the nanoparticle size Increase of the bilayer thickness! Increase of the interparticle distance Self-organization is destroyed

Magnetic properties of the C/FePt granular multilayers As-deposited at RT Annealed 1h at 600 C 30 K A1 30 K L1 0 H c = 120 Oe M r /M s = 0.71 µ at = 1.24 µ B H c = 1600 Oe M r /M s = 0.57 µ at = 1.65 µ B Strong interactions between as-deposited FePt nanoparticles M s is 20% smaller than the bulk value for the disordered A1 phase FePt nanoparticles annealed at 600 C are weakly coupled M s increases due to FePt precipitation and chemical ordering H 0 = 2.2 koe T B = 250 K For superparamagnetic systems: H 1 c T ( T ) = H 0 T B K = 7.6 10 6 erg.cm -3 K 25kBT = V B Disordered A 1 FePt phase: K = 3.6 10 5 erg.cm -3 Ordered L1 0 FePt phase: K = 7 10 7 erg.cm -3

Magnetic properties of the C/FePt granular multilayers XMCD at RT (Daresbury( 5U.1 beamline) Intensity (arb. units.) Intensity (arb. units.) 6 4 2 0-2 6 4 2 0-2 a) b) Fe L 2,3 Fe L 2,3 700 720 740 Photon Energy (ev) XAS XMCD As-deposited at RT XAS XMCD Annealed at 600 C No multiplet: FePt particles are protected against oxidation XMCD at RT (ESRF ID12 beamline) Intensity (Arb. Units.) Intensity (Arb. Units.) 1,5 1,0 0,5 0,0-0,5 1,5 1,0 0,5 0,0 a) Pt L 2,3 b) XAS As-deposited at RT XAS XMDC x2-0,5 11500 11550 11600 13250 13300 13350 Photon Energy (ev) XMCD x2 Annealed at 600 C Spin and orbital magnetic moments are increased with annealing at both the Fe and Pt sites N. Jaouen et al., Phys. Rev. B 76 (2007) 104421

Conclusion Carbon encapsulation can be used to restrain the growth of the FePt nanoclusters both during the deposition process and during annealing Partial chemical ordering of the FePt nanoclusters can be achieved after annealing 600 C Annealing at 800 C leads to destruction of the self-organization and to chemical interaction of iron atoms with the silicon substrate As-deposited at RT C/FePt multilayer As-deposited at RT BN/FePt multilayer Annealed at 600 C Annealed at 600 C

Magnetic properties of the C/FePt granular multilayers As-deposited at RT Annealed 1h at 600 C

Coll. J.M. Tonnerre, N. Jaouen, D. Carbone 2- Magnetic properties by x -ray resonant scattering - FePt/C a granular multilayer: depth informations from XRMS Intensity 10 0 E= 707.5eV I(Pol+, H+) I(Pol+, H-) 10-1 10-2 10-3 1x10-4 1x10-5 10-6 Ratio [a.u.] 0.8 E= 707.5eV (I + -I - )/(I + +I - ) 0.4 0.0 10-7 10-8 10 20 30 40 50 60 70 80 ϑ [ ] 0 10 20 30 40 50 60 70 80 ϑ (a) uniform magnetisation (b) magnetic core (non-magnetic shell) (c) magnetic shell (non-magnetic core) Asymmetry Ratio 0.9 0.6 0.3 0.0-0.3-0.6-0.9 0 10 20 30 40 50 60 70 80 ϑ[ ] Model (a) Model (b) Model (c)