Flexible Machine Concepts for Roll-to-Roll Web Coaters Combining Magnetron Sputtering and Electron Beam PVD AIMCAL, Charleston, SC, USA, Oktober 29th, 2004 J. Strümpfel, H. Neumann E. Reinhold, C. Steuer 1 - NDVak Dresden - 15.10.2004 VON ARDENNE, Dresden, Germany e-mail: struempfel.johannes@vonardenne.biz
Roll-to-Roll Web Coaters Combining Magnetron Sputtering and EB -PVD Outline Application of optical film materials Reactive magnetron sputter process Examples of optical layer stacks Considerations of productivity Sputter roll coaters 2 - NDVak Dresden - 15.10.2004 EB-PVD roll coaters with option for sputtering Conclusion
3 - NDVak Dresden - 15.10.2004 Roll-to-Roll Web Coaters Combining Magnetron Sputtering and EB-PVD Application of optical film materials
Applications of Sputtered Web Coatings Architectural coating for windows Selective solar control films for cars or windows 4 - NDVak Dresden - 15.10.2004 Flexible printed circuits (FPC) and semi transparent metal films
Applications of Sputtered Web Coatings TCO Electrodes ITO for touch panel AR touch panel Low Ohm films AR Multilayers AR tinted ARAS 5 - NDVak Dresden - 15.10.2004 EMI Filters PDP Filters, Low-E
Optical Film Materials and Refractive Index @ 550 nm 6 - NDVak Dresden - 15.10.2004 Oxid ZnO Refractive index Reactive Sputtering Al 2 O 3 1.65 ITO 1.98 SnO 2 2.31 2.0 ZnO: Al 2.0 ZrO 2 2.1 Refractive index Reactive EB-PVD 1.47 1.95 1.47 2.0 Si 3 N 4 Ta 2 2.1 TiO 2 2.45 2,18 2.0
Plasma Pre-treatment Linear Ion Source 7 - NDVak Dresden - 15.10.2004
8 - NDVak Dresden - 15.10.2004 Roll-to-Roll Web Coaters Combining Magnetron Sputtering and EB-PVD Reactive Magnetron Sputter Process
Dual Magnetron Sputtering 9 - NDVak Dresden - 15.10.2004
10 - NDVak Dresden - 15.10.2004 Dual Magnetron Setup SDM 1700 for Sputter Roll Coaters
Balance Control by PEM 05 Multi Channel Arrangement 11 - NDVak Dresden - 15.10.2004
12 - NDVak Dresden - 15.10.2004 FOSA 1250 Layer Thickness Distribution for ARAS +-1.5% good coating width: 1170 mm
13 - NDVak Dresden - 15.10.2004 Roll-to-Roll Web Coaters Combining Magnetron Sputtering and EB -PVD Optical Layer Stacks
Applications for Large Area Web Coatings Multi-Layers Low-E ARAS TCO Other 14 - NDVak Dresden - 15.10.2004 Single silver Double silver Triple stack for PDP 2 layer 4 layer 6 layer Touch panel Low ohm Barrier layer Edge filters Enhanced mirrors FPC Metal layers
Optical Multi-Layers for FOSA 1250 D10 Multi-Layer Coating drum 1 Coating drum 2 Speed m/min 1 2 3 4 5 6 7 8 9 10 D7 D10 1 4 Layer AR SiO x 5nm 10nm 27nm 28.5nm 28.5nm 28.5nm 28.5nm 30nm 30nm 30nm 0.70 1.4 2 6Layer AR SiO x 5nm 11nm 30nm 26nm 26nm 10nm 18.5nm 18.5 40nm 40nm 0.62 1.25 3 ARAS SiO x 5nm 12nm 19nm ITO 27nm ITO 27nm ITO 27nm - 30nm 30nm 30nm 1.1 1.7 4 AR tinted SiO x 5nm - - - TiN x 8nm 24nm 24nm 24nm 24nm 24nm 1.25 2.1 5 Touch panel SiO x 5nm 6nm 6nm 6nm 6nm 6nm ITO 4.5nm ITO 4.5nm ITO 4.5nm ITO 4.5nm 3.3 8.7 6 AR Touch panel SiO x 5nm 14nm - 17nm 17nm 17nm 17nm 17nm ITO 9nm ITO 9nm 1.2 3.0 7 Low-E (1) SiO x 5nm 12.5nm 12.5nm ZAO 6nm Ag/NiCr 11nm ZAO 9nm - SnO 2 11nm SnO 2 11nm SnO 2 11nm 1.45 3.2 8 Low-E (2) SiO x 5nm SnO 2 17.5nm SnO 2 17.5nm ZAO 6nm Ag/NiCr 11nm ZAO 10nm - SnO 2 11nm SnO 2 11nm SnO 2 11nm 1.3 2.6 15 - NDVak Dresden - 15.10.2004 9 10 11 Double Low-E Solar Control 08-35 Flexible circuits SiO x 5nm SiO x 5nm Cr 5nm 8.5nm 0-17nm Cu 24nm 8.5nm 0-17nm Cu 24nm ZAO 6nm 0-17nm Cu 24nm Ag/NiCr 11nm CrN 17.5nm Cu 24nm ZAO 27nm CrN 17.5nm Cu 24nm ZAO 27nm - Cu 24nm ZAO 27nm - Cu 24nm Ag/NiCr 11nm SnO 2 5-13nm Cu 24nm SnO 2 31nm SnO 2 5-13nm Cu 24nm 0.56 (1.0) 6.5 1.45 (2.0) (9.6)
2 Layer Flexible Printed Circuit (FPC) Application: Electronics 7 Cathodes, optimum 10 Cathodes, Film Speed 6 m/min 9 m/min 16 - NDVak Dresden - 15.10.2004 200 5 nm
6 Layer AR Application: Display 7 Cathodes, minimum 10 Cathodes, optimum Film Speed 0,62 m/min 1,25 m/min 17 - NDVak Dresden - 15.10.2004 80 37 10 52 30 11 5 nm Y = 0.11 Y = 0.11 6 Layer AR 4 Layer AR
3 Layer AR Touch Panel Application: Display 5 Cathodes, minimum 7 Cathodes 10 Cathodes, optimum Film Speed 1,2 m/min 2,3 m/min 3,5 m/min 18 - NDVak Dresden - 15.10.2004 18 85 14 5 nm
19 - NDVak Dresden - 15.10.2004 Roll-to-Roll Web Coaters Combining Magnetron Sputtering and EB -PVD Sputter Roll Coaters
Magnetron Cathode Types Available for Sputter Web Coaters WSM SDM DCM single planar dual planar dual cylindrical 20 - NDVak Dresden - 15.10.2004 Metals,, ITO TiO 2 from SnO 2, In 2 O 3 ceramic target
Sputter Roll Coater FOSA 1300 Double Drum Configuration 21 - NDVak Dresden - 15.10.2004
Sputter Roll Coater FOSA 1300 Single Drum Configuration 22 - NDVak Dresden - 15.10.2004
23 - NDVak Dresden - 15.10.2004 Sputter Roll Coater FOSA 1300 Front Side View with Open Door
24 - NDVak Dresden - 15.10.2004 Sputter Roll Coater FOSA 1300 Open Doors with 10 Dual Magnetrons
25 - NDVak Dresden - 15.10.2004 Roll-to-Roll Web Coaters Combining Magnetron Sputtering and EB-PVD EB-PVD Roll Coaters with Option for Sputtering
High power EB gun EH 100 V equipped with Vario-Cathode 26 - NDVak Dresden - 15.10.2004
Schematic design: FOBA 600 Coater Concept and its Key Components 27 - NDVak Dresden - 15.10.2004 - EB-PVD from a large movable double crucible system - High power EB gun - Magnetic bending system for catching of scattered electrons - cooling drum - Pre- treatment by MF Plasma - Post-treatment by MF Plasma - Gas separation compartments - Sputter units can be used for deposition too (mixed coating technology)
High Speed Web Coater FOBA 600 28 - NDVak Dresden - 15.10.2004
First coating results Optimization of single processes: Aluminum Titanium Silicon dioxide Titanium dioxide Application example: High index layer (TiO 2 ) on holographic foils 29 - NDVak Dresden - 15.10.2004 TiO 2 process: Rate: 2000 nm x m/min Layers nearly non absorbent and abrasion resistant
Application of EB-PVD TiO x on PET Dynamic Deposition Rate 2000 nm x m/min 30 - NDVak Dresden - 15.10.2004 @ 500 nm: n = 2,2 k = 4 e-05
Coating of Flexible Printed Circuits Technique Sputtering EB-PVD Substrate < 50 µm Polyimide < 50 µm Polyimide Pre-treatment Heating / Plasma Heating / Plasma Coatings Sputtering Sputtering and EB-PVD Sputtered Adhesion Cr or NiCr 20 nm dto. Films Metall Cu 200 nm Cu 60 nm 31 - NDVak Dresden - 15.10.2004 DDR Cr / NiCr 80 nm m/min (1x) dto. Cu 250 nm m/min (3x) 7000 nm m/min Productivity required about 4 m/min > 4 m/min @ thicker Cu
Roll-to-Roll Sputter Web Coater Using 5 Magnetrons 32 - NDVak Dresden - 15.10.2004
33 - NDVak Dresden - 15.10.2004 Roll-to-Roll Web Coater combining 2 Magnetrons and EB-PVD Equipment
Conclusion 1 34 - NDVak Dresden - 15.10.2004 Large area optical multilayer coating is applied for architectural, automotive, and display industry Roll-to-Roll coater design using two coating drums ensures both built-in flexibility and enhanced productivity for different layer stacks Display application with respect to TCO, AR, ARAS, Touch panel or PDP filters are perfomed with multichamber design for up to 10 dual magnetrons Optical multi-layers are deposited on PET and TAC by reactive dual magnetron sputtering in MF mode providing excellent color homogeneity in both single or multiple pass operation
Conclusion 2 35 - NDVak Dresden - 15.10.2004 Such optical films will pass all relevant adhesion, climate or mechanical tests due to well approved plasma pretreatment in combination with excellent gas separation. Economically priced sputter web coaters are equipped with a single coating drum only. Hence, disadvantages with respect to flexibility and productivity have to be considered. However, for selected applications the combination of both techniques i.e. magnetron sputtering and EB-PVD opens up real advantages in productivity.
High Speed Web Coater FOBA 600 36 - NDVak Dresden - 15.10.2004