Physical Vapor Deposition (Chrome-Gold evaporation)

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Physical Vapor Deposition (Chrome-Gold evaporation) System Owner: 1. Vivek Surana 134076021@iitb.ac.in, 9987224775 System Operator: 1. Amit Ranshevare p11237@iitb.ac.in, 9820470622 Allowed Materials:Chromium, gold metal and other materials are also allowed for testing please contact system owner. Training Procedure: http://www.cen.iitb.ac.in/cen/usage-policies/equipmenttraining_policy.php

System Status Change Policy As soon as any unexpected behavior is seen, AU should inform onsite facility, safety staff and SO through fastest means available (phone, or direct contact). He/she should then put up system down/ under maintenance signage on the tool. When any report of unexpected behavior of system is reported, SO should immediately (<15min of report) intimate users by: By email Black out the system on online slotbooking module SO should put system UP/ONLINE, only if the system maintenance is completed and no SAFETY risk is expected. A brief report with data demonstrating (i-iii) to be generated: I. Successful identification of root cause II. Completion of fix (to remove any safety risk) III. Successful test run IV. If there is any change in the SOP, update SOP and inform all AUs. V. If system is down due to a mistake committed by AU, reauthorization of the AU by the SO will be required. Any violation of this policy will be punished by Disciplinary action committee

Standard Operating Procedure Checklist before turning ON the system: Make sure chiller connected to the system is ON, if not then turn it ON (according to the instruction manual of Chiller) and OPEN the inlet and outlet valves for Cr-Au-evaporator from the manifold Check for Liquid Nitrogen (LN 2 ) availability, if it is not available in the containers then procure it from LN 2 plant storage tank (if LN 2 is not available in the lab, DO NOT plan any process) Make sure of the availability of required material such as chromium powder and gold wire needed for your process and also check the life of quartz crystal of thickness monitor Check for any planned electrical shut-down within 2-3hrs from the start of your process Wear Hairnet, Facemask and Gloves before operating the system Instructions for Operating the System: 1. Switch ON the main switch on the right side of the system 2. Switch ON the rotary pump by pressing the green push button of rotary pump on the main front panel 3. Wait for 2-3 minutes to evacuate the line connecting rotary pump till the combination valve 4. Switch ON the pirani gauge with the GH1 (gauge head 1) button activated 5. Open the combination valve to backing position. Wait till the pressure falls below 0.05 mbar in order to switch on the diffusion pump 6. Switch ON the diffusion pump by rotating the diffusion pump switch to DP position on the front panel. The diffusion pump oil will take about 30-40 minutes to reach the operating temperature (mean while clean the chamber and load your sample) 7. Vent the chamber by opening the air admittance valve 8. Open the chamber when the pressure inside is equal to the atmospheric pressure. A subtle sound from the interlock confirms that the chamber is ready to be opened. Lift up the chamber and slide it on the side 9. Check the condition of the filament, if found damaged (cracks in the filament) needs to be replaced, ask system owner and/or the operator in the working hours. Do not plan any processes till then and MAKE AN ENTRY FOR THE SAME IN LOGBOOK. Go to SHUT DOWN procedure for the system (Point No. 23 onwards) 10. Load the filaments or boats with the respective metal (Chrome powder in the right hand boat and gold in the left hand boat) and fix the substrates on the work holder

11. Make sure that the partition between chrome and gold boat is not touching either of the boats 12. Place the thermocouple in the loop on the substrate holder and also check the condition of substrate heater wires (if substrate temperature is required) 13. Close the chamber door by slowly lifting the chamber jar, sliding it towards the chamber base and pulling down, aligning it to the base of the chamber. Close the air admittance valve 14. Apply some pressure on the shaft on which the chamber jar is hinged and bring the combination valve to Roughing position (anti-clockwise rotation to top) 15. Select Gauge Head 2 (GH2) of pirani gauge and check for vacuum till it shows 0.05 mbar pressure. Bring the combination valve back to Backing position. 16. If by this time DP is warmed up (30 minutes) then go to point 17, else wait for the warming up of DP (30 minutes from switching on the diffusion pump) 17. Liquid Nitrogen (LN 2 ) needs to be poured in to the LN 2 trap before the High Vacuum valve is opened. This ensures that DP oil vapors will condense without entering in to the chamber. 18. After pouring liquid nitrogen, check for chamber vacuum in Gauge Head 2 (If it is less than 0.05 mbar, then bring the combination valve back to roughing position. Once the vacuum goes to 0.05 mbar or less then put the combination valve back to backing position) 19. Open the High vacuum valve by rotating it smoothly to the left (Ensure that you are not applying pressure to the valve or moving it beyond the arrow mark on the system) 20. When gauge head 2 reads a pressure of 1 x 10-3 mbar, switch OFF pirani gauge and switch ON the penning gauge. Do not keep the penning gauge on for longer time. Intermediate checking would be preferable. Wait till the penning gauge indicates vacuum less than 4 x 10-6 mbar 21. If substrate temperature is required, switch On the main switch of heater from the front panel to SH. Adjust the desired temperature from the temperature controller ( Do not change other settings of the controller) 22. Steps for performing thermal evaporation is as follows:- A. For Chrome deposition- switch on the mains for LT(1) from the front panel B. Verify that the current adjustment knob is on minimum position C. Switch ON the LT(1) circuit breaker D. Switch ON the quartz crystal monitor from the front panel and select filament 1 from the list E. Very slowly increase the current by rotating LT1 knob in clockwise direction (Slowly means increase the current up to 10mA in 15sec and halt for 15sec at that value)

F. As the current is increased, with the clockwise turning of the LT knob, the material in the boat starts heating up (Don t increase the knob beyond the 60V for Cr deposition and 40V (or 67mA current on LCD) for Gold deposition. If the boat is not heating up by this voltage then don t do the deposition and shut down the tool and also inform the SO / EMT team) G. Check the pressure in the chamber on the penning gauge. If the pressure is increasing too much (i.e. less than 6 x 10-6 mbar) reduce the current by turning the LT knob anticlockwise and keep at a lower value (not zero) till the degassing is complete H. After degassing is complete and when the pressure reaches the minimum value increase the emission current I. When the material in the boat starts melting, open the shutter and also activate the thickness monitor through the START push button on the thickness monitor controller J. When the required thickness is reached close the shutter, bring the LT knob to minimum position to make the current zero, switch off the LT circuit breaker K. When the evaporation is complete switch OFF the LT(1) K. The same set of steps to be repeated for Gold deposition, except that LT2 is to be activated and filament 2 should be chosen from the thickness monitor controller 23. Once the deposition is over, Switch OFF the Penning gauge. Wait for 15 minutes and then, close the HIVAC valve 24. Vent the chamber by opening the air admittance valve 25. When the chamber pressure reaches the atmospheric value, open the chamber and take out the substrates. 26. Reload the work holder and filaments when necessary and proceed as before for the next cycle of evaporation. Procedure for shutting down the system: If there is no other sample for deposition after step 25 above, close the chamber, close the air admittance valve and follow the procedure for shutting down the system 27. Switch OFF the diffusion pump 28. Pump the chamber down to (10-2 ) mbar by bringing the combination valve to roughing position 29. Bring the combination valve back to Backing position and continue to run the rotary pump for a period of at least 40 minutes, keeping the combination valve on the backing position, and keeping water supply to DP till the diffusion pump oil cools 30. Bring the combination valve to Close position 31. Switch OFF the rotary pump and close the water supply to DP 32. Switch off mains by using both the mains isolator on the unit and at the power supply point 33. Switch OFF the pump and the chiller (if no other systems associated with the chiller are ON)

Precautions: 1. Always clean the load chamber, glass slides and glass window with IPA before and after every deposition 2. Before starting the deposition always makes sure that the LT knobs are at the minimum positions 3. Before opening the high vacuum valve always ensure that the chamber pressure is < 0.05 mbar and the combination valve is at the backing position 4. Pour LN 2 in its trap before opening the high vacuum valve 5. Before switching off the DP, ensure that the high vacuum valve is in closed position 6. After switching OFF the DP wait at least for 30 min. And then switch off the rotary pump and cooling water supply 7. Do not keep any of the gauges running for long duration. This is more critical for penning gauge 8. Venting the chamber should be done slowly by slightly opening the air admittance valve 9. Always keeps the system in vacuum condition when not in use Emergency shut-down of the system/electricity failure: 1. Close the HIVAC valve immediately 2. Move the combination valve to CLOSE position 3. Turn OFF the DP switch 4. Turn OFF the RP switch 5. Turn OFF main switch of the system Violation Policy: 1. If due to failure of following any of the steps in SOP there is a damage caused in the system s normal operation. a. The user s authorization for the system is suspended for at least 1 week and the user is liable to get the system to its working condition as soon as possible (theoretically in no time) b. The user has to go through the qualification test and a written test again after 2 weeks