Micro-Power Generation



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Transcription:

Micro-Power Generation Elizabeth K. Reilly February 21, 2007 TAC-meeting 1

Energy Scavenging for Wireless Sensors Enabling Wireless Sensor Networks: Ambient energy source Piezoelectric transducer technology Novel microelectromechanical system (MEMS) 2

Design Flow Mechanical Design Strain converts to output voltage ~ electromechanical coupling Material Properties MECHANICAL VIBRATIONS Structural response to ambient vibrations ~ strain POWER Integrated on Silicon, adheres to standard CMOS processing parameters ~ on chip Manufacturability 3

Ambient Vibration Sources Vibrational Source Peak Acc. (m/s 2 ) Freq. (Hz) Base of a 3 axis machine tool 10 70 Kitchen blender casing 6.4 121 Clothes dryer 3.5 121 Door frame just as door closes 3 125 Small microwave oven 2.25 121 HVAC vents in office building 0.2-1.5 60 Wooden deck with foot traffic 1.3 385 Breadmaker 1.03 121 External windows next to street 0.7 100 Laptop computer with CD running 0.6 75 Washing machine 0.5 109 2 nd story of wood frame building 0.2 100 Refrigerator 0.1 240 S. Roundy, Computer Communications, 26 (2003) 1131-1144 4

Generic Vibration-to-Electricity Conversion Model m& z + ( b + b ) z& + e m kz = my & m k z(t) z = spring defection y = input displacement m = mass b e = electrical damping coefficient b m = mechanical damping coefficient k = spring coefficient b e b m b = 2mζω n y(t) P = m 2 ζ A e 4ω( ζ e + ζ m) 2 ; ω = ω n Willams and Yates, Transducers 95/Eurosensors IX, (1995) 368-372 5

Vibrational Energy Scavenging Mesoscale Proof of Concept Piezoelectric Material -PbZr x Ti 1-x O 3 High piezoelectric coefficient Large range of solid solubility Well characterized properties in the bulk as well as thin film form Heterogeneous Bimorph Two layers (piezoelectric, elastic) Proof mass Constitutive equations readily solved adaptable to empirical modifications adaptable to analytical modifications 40 mm x 3.5 mm, 2 g mass 6

Thin Film Fabrication Pulsed Laser Deposition PLD growth conditions KrF Excimer Laser λ= 248nm Laser Beam Homogenizer Array Plume Substrate Heater Block Target 650ºC - 100 mtorr O 2 Homogenized energy (±5%) 2.5 J/cm 2 @ 3 Hz ( 6-7 Å/s) Pb 1.15 (Zr 0.47 Ti 0.53 )O 3 ferroelectric SrRuO 3 oxide electrode SrTiO 3 /Si substrate Rotating Target UV Mirror Field Lens 1 Field Lens 2 Vacuum Chamber 7

Material Properties Crystal Structure and Piezoresponse Epitaxial PbZr 0.47 Ti 0.53 O 3 (PZT) thin films Out-of-plane (c-axis) epitaxy Surface Roughness 65 nm, rms 11 nm a Intensity 15000 10000 5000 Normalized Intensity 100 80 60 40 20 0 (001) PZT 90 180 270 360 Φ (deg.) (002) PZT (001) Si b 5 µm Surface Morphology 0 20 30 40 50 60 70 2θ (degrees) Piezoelectric response to -/+ 5 V 8

Material Properties Piezoelectric Coefficient and Polarization 160 120 80 40 0 PZT/Pt/STO/Si Piezoelectric Coefficient d 33 = 155 pm/v d 33 = 37 pm/v -40-80 -120 PZT/SRO/STO/Si 30 20-160 -10-5 0 5 10 Remnant Polarization P r = 15 µc/cm 2 P s = 25 µc/cm 2 Polarization (µc/cm 2 ) 10 0-10 -20-30 -15-10 -5 0 5 10 15 Voltage (V) 9

Preliminary Power Modeling Assumptions P = 1 2 CV 2 ω Estimated Power Density Single Beam - 1-5 nw Volume (1cm 3 ) - 100-200 µw - No coupling between cantilever beams - Single mode bending - Input acceleration = 2.25 m/s 2 - Length = 800 µm -Elastic/ piezoelectric layer thickness = 1 µm Power Output (nw) Power (nw) 6 5 4 3 2 1 Smits and Choi., IEEE Trans. Ultrason. Ferroelec. Freq. Control, 38 3 (1991) 256 0 0 500 1000 1500 2000 Frequency (Hz) Frequency (Hz) 10

Microfabrication Cantilever Array Structures 1. SrTiO 3 (STO) coated (20 nm) single crystal Silicon [Motorola, Inc.] 2. Deposition of SrRuO 3 (SRO) bottom electrode, and PZT with pulsed laser deposition. 3. Definition of devices using photolithography 4. Etch heterostructure with Ar ion milling to expose Si substrate 5. Deposition of metallic elastic layer via e-beam evaporation/thermal evaporation 6. Release cantilever structure from Si substrate with XeF 2 gaseous etchant 11

Preliminary Findings Pulsed laser deposition can be used to grow epitaxial PZT films on Si substrate Thin film piezoelectric coefficient approaches bulk values, shows good switching capabilities Power modeling indicates a power density approaching 200 µw/cm 3 Cantilever arrays fabricated and released using standard-cmos compatible processes Residual stresses in film reduced Cantilever beams are highly damped Intial power output 1-2 µw/cm 3 12

Conclusions Energy scavenging is essential for ubiquitous integration of wireless sensor networks in residential and industrial settings Ambient mechanical vibrations represent a viable energy source Previous research has shown piezoelectric materials to be an efficient energy transducer Microscale piezoelectric energy scavenging devices successfully designed and fabrication Power modeling indicates achievable power density to be 100 µw/cm 3 Current results are 1 µw/cm 3 Improvements are underway in both design and material selection 13

Micro-Power take always! Enabling Wireless Sensor Networks: Ambient energy source Piezoelectric transducer technology Novel microelectromechanical system (MEMS) 14