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1 & Developpements des technologies sous vide pour le traitement au défilé de produits plats P. Choquet, CRP Gabirel Lippmann, Luxembourg D. Chaleix, ArcelorMittal Research Center, France
2 : HFP Bandstahl GmbH, Germany Aluminum strip coater, fully continuous air-to-air operation strip parameters : width 635mm, thickness , speed line m/min
3 PVD technologies for metal strip has been introduced in industry from the 1980 years : , Germany, HFP Bandstahl GmbH, aluminium strip coater , Japan, Nisshin Steel, zinc strip coater , Japan, Kobe Steel, Al, Ti, Cu, Cr strip coater , China, JHSSC, Cu and Ti strip coater , Germany, ALANOD, light reflectors coater on Al strip , USA, OVONICS, solar cell coater on Stainless Steel strip , Belgium, ARCEO, ArcelorMittal, steel products for industry.. What was the base of the failure in industry during the 1980 years and success 10 years later?
4 Main reasons of the difficulties to introduce the technologies in metal industry in 1980: hard competition with other established technologies : hot-dipping, electroplating, cladding maintenance of the vacuum equipments, low metal coating efficiency no sufficient engineering competence regarding innovative tasks Few reasons of success to manufacture products on metal strip now: Innovative products High process control system to maintain a high product quality Flexibility of the line given by the installation of different vacuum technologies
5 ALANOD - Germany High performance optical coating on anodized Al substrate 1994, AlBA1, annual capacity 4 million squaremeter Number of coating , AlBA 2, annual capacity 5 million squaremeter Number of coating , AlBA3, annual capacity 5 million squaremeter Number of coating 5 H. Küster VacMess Germany
6 ( Ovonics Energy Conversion Device (ECD Continuous roll-to-roll manufacturing of thin film amorphous silicon alloy multi-junction solar cells on Stainless Steel strip 2000, Auburn Hill 1, capacity 28 MW 0,4 million m 2 /year 2006, Auburn Hill 2, capacity 30 MW 2008, Auburn Hill 3, project 60MW Dr. M. Izu VacMess 2005
7 PVD Technology for metal strip "Physical Vapour Deposition (PVD) processes constitute a family of vacuum techniques for coatings and surface treatments. The different steps are the creation of a metallic or non metallic vapour (by sputtering or evaporation), transportation under vacuum of atoms (with or without plasma assisted) and condensation on a substrate. 540 mbar 55 mbar 1 mbar mbar 1000 mbar 200 mbar 5 mbar 10-2 mbar Ion bombardment by Sputter Etching device to clean the metallic surface is essential to get a good coating adhesion. Air to air coater is the manufacturing design of process line for deposition on metal strip coating. Thick coatings or Thin coatings and micrometric coating of metal or alloy by Jet Vapour Deposition. Patent CRM Belgium Deposition of nanolayer to functionalize metal strip can be achieved by Sputtering Deposition
8 Rotative cylindrical Magnetron AC and DC sputtering Advantage of Circular magnetron target -High power density -(20W/mm of racetrack ( circumference - High deposition rate (75nm by m/min for TiO 2 ) - High target material utilization (70~ ( 85% Reduction in arcing and defect generation in reactive sputterring Planar or Circular Magnetron Target
9 ARCEO Roll-to-roll PVD line for steel ArcelorMittal picture ECCA Bruxelles nov 2004
10 ARCEO Roll-to-roll PVD line for steel Identity : Location : a new production line of Arcelor Operationnal Unit Center Europe,Cold Plant of Liège Ramet, Liège ( 2005 Production : Industrial Line (from October A wide dimensionnal range : Width : 700 to 1500 mm Multi «Products/Markets» ability Multi «substrates» : flat carbon and stainless steels Av Dry surface preparation Organic coating deposition Vacuum C:Poirier- ITFPC 07- Nancy
11 PVD Products / Markets Arceo Products Esthetic Surfaces ( aspects (Decorative Reflectors ( Surfaces (Lignt Management without TiO2 with TiO2 Easy cleaning/ anti staining ( surfaces (Active Adhesion Provider (Step to organic coatings reengineering, ( curve process learning High corrosion performance coating ( presentation (D. Chaleix C:Poirier- ITFPC 07- Nancy
2. Deposition process
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