A Study on the Mismatch of Time and Frequency Domain for Vibration Criteria of Sensitive Equipment

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1 1 1(2002 8) Journal of the Korean Society of Semiconductor Equipment Technology, Vol. 1, No. 1. August 2002.!" ** ** A Study on the Mismatch of Time and Frequency Domain for Vibration Criteria of Sensitive Equipment Hong Ki Lee*, Sung Wan Son*, Kang Boo Kim*, and Jea Ho Baek* ABSTRACT Modern technology depends on the reliability of extremely high precision equipments. In the production of semiconductor wafer, optical and electron microscopes, ion-beam, laser device must maintain their alignments within a sub-micrometer. This equipment requires a vibration free environment to provide its proper function. Therefore, this high technology equipments require very strict environmental vibration criteria because it is used as basic data for the design of building structure and structural dynamics of equipment. In this paper, the new approach is proposed to investigate the mismatch problem of time and frequency domain for vibration criteria of sensitive equipment. The proposed approach is based on a vibration measurement data and a relative transfer function which can be obtained by experiment or analysis. Key words : high precision equipments(), vibration criteria( ), mismatch problem( ), relative transfer function() 1.,!" #$% &'( ")*+,-./ :; <=>?.! =@ A9B-C7 D EF GHI BJ!K LM NO P O P? " O P?. Q, *R(giga class) ST UV(DRAM) WX YZ 0.1 µm [\ ] 1^_ *`( [ P a! b:?.!cf *` d Y =@* W C ef gj% -FO P?. *R hij Lk ` ew( lm, n=;o(clean room) *pi 0.1gal[half peak], qy 0.1~0.2 µm[half peak]! [\01 ;rf / W *RMS Technology CO., LTD. X* :;O P?. st, u!vw 89 x! y(wafer) z { (pattern) }~ x!y *` ^_ 1/5~1/20 [\ =@ i *O P?.!cF =@ 1 ƒ F % I?[1-2]. #ˆ =i [\! * =Š/ 01 K 4 "! A9B-C!?. hij ` ef WX\!!cF =@ A9 B-C <= Œ, Ž P! "!,- 8. ( [ P /) X!?[3-4]. =@ A9B-C <= Y! /)! 9š, H h/01 =@ / s01 ) ~ (vibration test)!+ œ /) 9 <=O P?. ck œ!9( lm žš -F, œ 56,-, Ÿ6 C - 2 c*,- *O P Œ, œ 9/) c* # *O P?[5]. Q!cF,- ª^( [ P «1 1

2 2 2. Fig. 1. Vibration criteria of MODEL 500 (MICRALIGN M500 sensitivity to floor vibration, Perkin-Elmer semiconductor equipment group).! 4 ;O Pš, œ /) 9 YZ ± ²! b:f X!?[6-7]. #³F!9 A9B-C <= +i œ! 01 µ# A9B-C Fig. 1! [ o(frequency domain)! #O P?. ck * WC ef ~ o (time domain) =F [ o01 q ¹ # A9B-C7 º Œ,» ª! 8! ¼HC(mis-matching),- *O P?. œ!9 <=I A9B-C ªª [ 8! ½D DX = t =( [ ¾0!cF,-* œ- A9B -C #³F C*, UO ~ o [ o 8! ½ q¹~ œ = À Á!,!cF = * #³F Â [ P* ÃÄ( b:* P?. ; [ o <=F A9B-C* œ- =@* ~ o Å lm #³F 6!! P* BÆO! Ç( [ P «1 ªÈ A9B-C -ÉO! œ- =@ 8 /9 = =@ ( [ P* Ê*Ë?. 2.1 (Mis-Matching Problem) Fig. 1 K K A9B-C hij =@., -r]8) Perkin-ElmerÌ [ÍF œ 9 µ#!!?[8]. 89I hij -r`= ž ÎÏ(mask) ]1}½ x!y(wafer) =Ð~ 0.1 µm ÃZ * Î!Ñ#+)(Micralign)!+ Model 550!?. ` ÏÒÓ 8ª1 I ÔÕ }Ô ÒuÖ(steel boxbeam-frame) Y WCO * (single axis shaker) X, Y, Z Ø Ù6/0 1 * ÔÕ ÒuÖ Ú x!y(wafer plain) K K ÎÏ ½ (mask image motion) ½Ø qy Ú! 0.1 µm* ÒuÖ ÛÜÝ "!?. * (shaker) Þ!9 ÞI =' (sinusoidal-waveform) ªª [ Ø 61 ²*~ß [ Pià C ;Ë Œ, ªª œ [ ØF ~ o 7 [ s #³F [ ½ 8! s =( [ P = i *O P á?. ck ' = ~ o [ ÃÄ G µ #! 7 º " ½ ¼HC,- *O P?. â, ' =I A 9B-C Tã [ Ã!?LF s01 Œ,,- Þ Fig. 1 A9B-C Qä1 åæ/01 <=( [ ¾?,- *O P?. œ 9 µ# Fig. 1 A9B-C ~ o K K ½Ø A9 Ú(0.1 µm) åæ/01 -F ( [ P A9B-C* Üç+!?. A 9B-C åæ/01 DEI Ò1èé(u!v r 8C ê )7 ë(*`ø½ x!y) ½Ø A9 Ú -F( [ P ~ o h01 A9B-C* -~#ì( b:* P?. Fig. 1 A9B-C ' = 01 µ# [ÃÄ! /9( lm,! H [ íî [ Ã! ±[à = i ï#?. 'ð1 A9B-C,- * WCÅ YC =CK C ~ ~ o ð'f œ G,- ñ "! = ( [ P dhf!?. ck!cf 2ò œ9/) ± # *O P Œ, =! 1 1, 2002

3 !"#$%& ' () * +,-./& % 6& <I œ 01 µ# A9B- C 9O P œ=!?. 2.2 #³F ^óã Ø ô/01,-* Þ YC Ú ~ * -FO P A9B-C õ Z ÉI?!?. Y öf Perkin- ElmerÌ 0.1 µm ÃZ * Î!Ñ#+)(Micralign) Model 550 Ò1èé(u!v r8c ê )7 ë(*`ø½ x!y) ½Ø A9 Ú! ~ o 0.1 µm õ ( [ ¾? "!! A9B-C* I?.! / ~Ï 01 TøÓ Fig. 27?. A 9B-C ~ o01 o åæ K 4 " #ù Œ, o Ø ~ o p-q 8! ½Ø A9B-C õ d À )( [ P! -~!?.! cf 01 O ( [ P "! o ØF p-q 8! ½Ø Ú.úû[!9!?. â, ªª [ ØF Y½= û01 ô/01 p-q 8! ½ØqY ~! ØF = µ!?.! YZ o ØF p-q ½Ø Ú ØF.úû[ ;ZìF?. Fig. 2 üý o p, üý o q 8! /. úû[(transfer function) üý * þ Ø F p, q Ú(vibration response) =û0 1 œ /01 ;( [ P0 ;Z.ú û[!9 / ½Ø qy ;( [ P?. Fig. 2 26þ ÿ&x 89 K 4 Fig. 3! K [ P?. Fig. 3. Geometry of relative displacement. šh üý *! á0» 8! =/ ½ØqY pq M(1)!I?. s x =x 2 x 1!O ys=y 2 y 1!,! x, y =/ ½ØqY Ã!?. 2 2 pq = ( x s + y s ) 12 p7 q* HF p ;r X ;O PO üý1 f(t)=f 0 cosωt* Å lm p 7 q = ½ YC ž01 ;r / s + %I?.!Œ õ =/() ½ØqY x s, y s 7 * [ ω Ø ½ØqY x y (ω), y ν (ω)(relative displacement of vibration) O F. j ½ØqY(total relative displacement) x t (ω), y t (ω) + Ü M!O x t ( ω) = x s + x y (1) (2) y t ( ω) = y s + y υ 01 ) x, y ½ØqY p7 q 6 x ν (ω)=x p (ω) x q (ω), y ν (ω)= y p (ω) y q (ω)7! #?.! Y M Ø M(3)! I?. x t ( ω) = x s + { x p ( ω) x q ( ω) } (3) Fig. 2. Schematic diagram of the relative displacement of vibration. y t ( ω) = y s + { y p ( ω) y q ( ω) } x p (ω), x q (ω), y p (ω), y q (ω) o F(t) ØF p7 q x y Ã!O {x p (ω) x q (ω)}, {y p (ω) y q (ω)} Ù[ 01š ) p7 q 8! x, y ØF ½Ø Journal of KSSE Vol. 1, No. 1, 2002

4 4 qy!?. M(3) ½ y o ØF p-q [ o õ ½ØqY* H lm ½Ø Ú Ü M01 K?. y t o ω ( ) = y p o ( ) y q o ( ) ω ω UO o ØF p-q ½Ø Ú ØF.ú û[ Ü M01 =I?. y t o ( ω) = [ H t o ( ω) ]y o o ( ω) (4) (5) H t o ω y t o ( ) ( ω) = ( ) y o o ω M (4) M (5) Ø =U Ü7?. H t o ( ω) = = ( ) y q o ( ) y p o ω ω y o o ( ω) H p o ( ω) H q o ( ω) y t o ( ω) = [ H p o ( ω) H q o ( ω) ]y o o ( ω) M (6) Î M ~Ï mq ½Ø Ú ØF.úû[ lm * WC Å YC ØF Auto Spectrum =û01 ½Ø qy Ú ØF <=( [ P O! =@i K 4 p q 8! ½Ø A9qY(permissible relative displacement of vibration)7 ºû01 WC dà ñ ( [ P?. â, /01 b:f! Fig. 1 =@ üý ØF A9B-C* Üç+ s K 4 ½Ø Ú üý ØF.úû[ [H p-o (ω) H q-o (ω)]* b:?.! 2!½ =, ÃÄ ~Ï!9 o, p, q Z =@ Ã Ø ~ =û01 œ /01 ;( [ P?. 2.3 /9 =@ PDP ñ u!v! þ =@ =!? ~F A9B-C gal[0-p, 5~50 Hz]!š, -~I! Ž,-* ¼Æ F ½!?.! Ç Y œ /01 µ# < 1 11 Hz gal!! #ìš,! u!v Ò1èé ½Ø A9qY 2 µm(0-p) š "01 Ê*>?. Fig þ = 8!O Fig ) 2.56þ =@ = PDP = < Ò!?. ' ½ 01 ) (6) Fig dimension sensitive equipment. Fig. 5. Vibration measurement data of sensitive equipment (about amplitude 6 µm 0-p). Fig. 6. Relative displacement time history measurement data of the glass table and projector part [Time Peak 6 µm (0-peak)]. Ò ^! ä% K KO P?. š, =½ *ž) lm Ò c ^01 K Kì 1 1, 2002

5 !"#$%& ' () * +,-./& % 6& I?. Fig þ = 01 )!(glass table)7 u!v Ò1/é ½Ø ÚC* Ø 6 µm(0-p)1 ½Ø A9qYB-C 2 µm 3=i õ O P " K 4O P =!!?. Yi öëš, ~ o K K ½ ØA9 Ú 2 µm7 [ o A9 B-C(allowable floor vibration) 8! ¼HC,- ( [ ¾ Œ, ; =@ ü ý ØF A9B-C* Üç+ s K 4 ½Ø Ú üý ØF.ú û[ [H p-o (ω) H q-o (ω)] ;!9 ' ð 2.56þ =* WCI üý! ½ Ø A9B-C 2 µm C Ê*O! š( [ P v Ø =i <=( [ P?. üý! Foot Ø * 89 Y Ø ' åæ ½Ø Ú üý ØF.úû[ [H p-o (ω) H q-o (ω)] ;,- q e ½01 9! á" Œ, = ZÄ #Í ;Ë?. UO s ØF Ž $! Y ½~ [H p-q (ω)] = / TøÓ [=! 1 9Ë?. Fig. 7 Projection Part(beam projector)7 Target Part(glass table) 8!.úû[ =C!?. Fig. 8 ;rf / ZÄTø K Ý "!?. ½Ø Ú üý ØF.ú û[ ; YZ [H p-o (ω)]7 [H q-o (ω)] ;O! Y½ = O ô/01 [H p-o (ω) Fig. 8. Schematic diagram of precision measuring system and sub-structure. Fig. 9. Foot and glass table transfer function graph of sensitive equipment [H q-o (ω)]. Fig. 7. Glass table and beam project part Transfer Function (FRF) Graph. H q-o (ω)] XkF?. Fig. 9 foot7 glass table 8! ZÄ/01 ;F.úû[ [H q-o (ω)]!o Fig. 10 foot projector part 8!.úû[ [H q-o (ω)]?.» ª.úû[!9 XkF "! Fig. 11!(glass table) u!v Ò1èé ½Ø Ú.úû[ [H p-o (ω) H q-o (ω)]!?. Fig. 11 ;Z ½Ø.úû[ ØF / s F?. ü ý 01 )!! u!v Ò1èé ½Ø A9qY 2 µm(0-p) õ Journal of KSSE Vol. 1, No. 1, 2002

6 6 Fig. 10. Foot and projector part Transfer Function Graph of sensitive equipment [H p-o (ω)]. Fig. 12. Floor vibration frequency and time data of sensitive equipment. Fig. 11. Foot and tacket-projector part Transfer Function Graph of sensitive equipment [H p-o (ω) H q-o (ω)]. ØF ' =F Fig. 12 üý(foot)! ½Ø.úû[ Fig. 11 %O Y½= O ªª [ &û0 1 ~ ØF ½Ø Ú ' Fig. 13! K [ P?. =! ½ØqY* Ø 6 µm(0-p) [\ Fig. 13 Ø ½ØqY* 4 µm(0-p) [\01 2% K KO P?.!cF < c * :)! Pš, H6/01 [ ÃÄ! 89û01 Fig. 12 K K ~ i(transient) s O F "! I!d1 ÃÄI?. ØC ½Ø ØF Ž $! YZ ~ K K i s(crest factor) O [ ØF [= X[ 89 ØF ;* b:( "01 Fig. 13. Relative vibration time history data on the glass table and beam projector part (max. 4 µm, 0-p). ñ I?. f, _! H=F =½ ½!cF,-* ( Å "01 )=I?. 3. =@ ' WC( lm,,- dà 1 1, 2002

7 !"#$%& ' () * +,-./& % 6& ñ ( [ P œf WCYC =CK C ~ o œ œ H % ð'!½ dà ) "!?.!" *(I A9B-C <=( [ ¾? " "!? Ø!, Ungar[9] - - ÉI BBN-criterion!+ =@ A9B-C.F Tã =@ A9B-C* [ o h01 O P Œ, œ- /9 d Zì( /š Üç+, Q/01 ª^Zì ( ¼HC,- *O P?. ; œ ZÄ01 -ÉO P [ o A9B-C* ~ o 01 =@,- /9 " b /01 ¼HC(mis-matching),-* Ø»I? " -~Ë?. UO! Z< YF ±! P>0i ¼;O c * a œ9/) K K,- 01 ) ¼Æ F ½ 1 1Ü P œ=!?. ; -ÉO P ½Ø Ú.úû[ 9 =@ ØF!½ dà ñ O ª^( [ P i à, ¼HC,- Z<( [ P K * -É 2? +i a/) K /9 #³F,- *O P Xp/) ; /9 G )Zì( "01 ñ I?. 1. Takafumi Fujita, LSI -, -,, , pp , Hisao Tomita, Isolation Technology for Micro-Vibration in Semiconductor Factories, 55/12/1989, pp (1989). 3.,,!"#, $%& '()* +,-. / ) :2 ;<, 2=>?,-'@A, '94 B9@CDA EFG pp (1994). 4.!"#, HI-,,, $%& '( <J) D2 -KLIM) :2 ;<, 2=>?, -'@A, '94 B9@CDA EFG pp (1994). 5., HI-, NO, PQ,. RS (T6 +,-./ C) :2 ;<(HDD CELL,-./), '95 DA EFG p (1995). 6.,, VW, XYWZ[\W0 ]2 ^RS (T6,-_]`.a brc) :2 ; <, 2=>?,-'@Ad, 6(3), pp (1996). 7. Hong-Ki Lee, Hae-Dong Park, Hyun Choi, Doo-Hoon Kim, Sa-soo Kim, A New Method of Determining Vibration Criteria for a Vibration Sensitive Equipment Using Frequency Response Function, INTER-NOISE 96, Proceeding Book 3 pp , August (1996). 8. C.G Gordon, Vibration prediction and control in microelectronics facilities, INTER-NOISE 96, Proceeding Book 1 pp , August Eric E. Ungar, Vibration control design of high technology facilities, Journal of Sound and Vibration, July (1990). Journal of KSSE Vol. 1, No. 1, 2002

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