Protein Patterning on a Glass Substrate with a Capillary Force Lithography Process Enhanced by Surface Treatment Processes

Size: px
Start display at page:

Download "Protein Patterning on a Glass Substrate with a Capillary Force Lithography Process Enhanced by Surface Treatment Processes"

Transcription

1 Journal of the Korean Physical Society, Vol. 51, No. 3, September 2007, pp Protein Patterning on a Glass Substrate with a Capillary Force Lithography Process Enhanced by Surface Treatment Processes Choonghan Ryu, Chijung Kim and Heeyeop Chae Department of Chemical Engineering, Sungkyunkwan University, Suwon Jae Do Nam Department of Polymer Science and Engineering, Sungkyunkwan University, Suwon (Received 13 November 2006) Protein patterning on a glass surface was achieved with a capillary force lithography (CFL) process with a self-assembled monolayer surface treatment in this work. A polystyrene line and space pattern was fabricated on the glass substrate by using a polydimethylsiloxane (PDMS) stamp with a capillary force lithography process. With this approach, it is possible to avoid high pressure, UV exposure, and high temperature. The thin polystyrene residual layer on the glass surface was removed by CF 4/O 2 plasma etching to complete the polystyrene pattern, and an O 2 plasma process was applied to make the exposed glass surface hydrophilic. The oxidized polystyrene area was modified into a hydrophobic one by using vaporized toluene to reduce non-specific protein binding. A self-assembled monolayer (SAM), 3-aminopropyltriethoxysiloxane (3-APTES), was used to amine-functionalize glass surface. The protein patterning was achieved and verified by immobilizing fluorescent labeled protein, fluorescein isothiocyanate conjugate - bovine serum albumin (FITC-BSA), on the amine-functionalized microscale line and space pattern. Surface adsorption of protein and 3-APTES was confirmed by analyzing the nitrogen and the oxygen compositions with an X-ray photoelectron spectrometer. The nitrogen peak showed a stronger signal when a 3-APTES layer was formed, and the signal gets stronger with protein adsorption on the 3-APTES layer. As a result, chemical patterning was achieved in this work by using a capillary force lithography process and was verified by protein patterning. PACS numbers: Dn, Fg, b Keywords: Surface treatment, Capillary force, Protein patterning I. INTRODUCTION The applications for protein patterning are expanding due to increased demand for high throughput screening, micro-arrays of bio-molecules, and diagnosis systems in various fields of the biotechnology [1 3]. Protein patterning is a crucial technique in bio- micro electronic mechanical system (bio-mems) technology and makes it possible to use significantly reduced amount of sample and to get diagnostic results within significantly reduced times. One of the popular approaches for the protein patterning is photolithography, which is widely accepted in the fabrication of highly integrated microelectronic devices. Recently developed new approaches include micro-contact printing (µcp) [4], nano-imprint lithography (NIL) [5], and capillary force lithography (CFL) [6, 7]. Photolithography and a photo-sensitive method hchae@skku.edu; Fax: [8,9] are limited by high-cost equipment and many processing steps. In this work capillary force lithography is adopted as a patterning process with surface modification. A self assembled monolayer (SAM) is typically defined as a well organized monolayer spontaneously covering a substrate. A SAM is applied to various applications, such as protein immobilization [10, 11], mineralization [12], or surface modification [13] by utilizing two different functional groups, at each end of the SAM molecule. The self-assembled molecules are divided into three parts - head group, end group, and chain part. The head group chemically bonds to the surface, and the end group is typically exposed toward the outside, opposite the surface. 3-aminopropyltriethoxysiloxane (3-APTES) was used as a SAM material to immobilize the bovine serum-albumin-labeled fluorescent material (FITC-BSA) on the glass substrate in this work. The head group bonds with the glass surface, and the end group bonds with proteins in peptide bonding.

2 Protein Patterning on a Glass Substrate with a Capillary Choonghan Ryu et al Fig. 1. PDMS stamp fabrication with photolithography: a) preparation of slide glass ( cm), b) photo-resistant spin coating, c) placement of the mask on the glass and exposure under UV light, d) removal of the mask, e) pouring the PDMS solution onto the glass patterned, and f) release of the PDMS stamp from the glass after hardening. II. EXPERIMENTS The experimental procedure can be divided into the following steps: i) mold and stamp fabrication, ii) capillary force lithography, iii) plasma etching of the residual layer and surface treatment, and iv) SAM application and protein immobilization. Molds were made by using a photolithography process with an AZ4903 photoresist (AZ electronic materialr) on glass, and polydimethylsiloxane (PDMS) from Dow Corning c was used to make the stamps. The PDMS stamp fabrication process is shown in Figure 1. The AZ4903 photoresist was coated on the slide glass by spin coating with three steps: 2000 rpm for 5 sec, 1000 rpm for 40 sec, and 1000 rpm for 5 sec (Figure 1(b)). The mask was placed on the photoresistcoated glass and was exposed to the UV light for 2 min (Figure 1(c)). The UV-exposed photoresist is developed in the developer solution for 5 to 10 min, followed by high-pressure nitrogen brushing (Figure 1(d)). The PDMS solution was applied on top of the photoresistpatterned surface and hardened at 60 C for 12 hours. The PDMS and the curing agent were mixed in a 10 : 1 ratio (37-g PDMS : 3.7-g curing agent) to get the PDMS solution (Figure 1(e)). Finally, the PDMS stamp was completed by releasing from the slide glass after 12 hours (Figure 1(f)). After the PDMS stamp fabrication, protein pattern was achieved by using the capillary force lithography (CFL) process, followed by the residual removal using a plasma etch and various surface modification pro- Fig. 2. Process flow of protein patterning in this work. The process includes capillary force lithography, etching, surface modification, and protein immobilization with SAM. cesses. CFL was adopted for the polystyrene patterning as shown in Figures 2(a) to (c). A 10 wt% polystyrene solution was made with toluene solvent, and the solution was spin-coated on the slide glass ( cm 2 ) at 1000 rpm for 10 sec and 2000 rpm for 20 sec. Then, the toluene was volatilized, and the polystyrene remains in the solid phase. (Figure 2(a)) After the PDMS stamp was placed on the glass-coated polystyrene, it was heated at 120 C for 30 min in an oven. The polystyrene solid state changes into rubbery state at this temperature, and polystyrene fills the gap formed by the stamp (Figure 2(c)). The PDMS stamp was released, and the polystyrene pattern was replicated on the glass substrate [7,14]. This gap filling process step leaves an undesired thin residual layer of polystyrene on the glass surface. The plasma etching step in an inductively-coupled tubular plasma reactor (ICP) was adopted to remove the residual from the glass surface as followed condition - 2-sccm CF 4 and 2-sccm O 2, a 260-mTorr chamber pressure, and a 250-W source power for 3 min (Figure 2(d)). The thin residual layer formed after the CFL process was removed at about a 300 nm/min etch rate. Additional multiple surface modification processes were employed to complete the protein patterning at a desired location of the glass surface (Figure 2(e)-(g)).

3 Journal of the Korean Physical Society, Vol. 51, No. 3, September 2007 Fig. 3. Surface modification with vaporized toluene. The PS surface become smooth and hydrophobic by using vaporized toluene. Fig APTES monolayer on the glass surface. Modifying the exposed glass surface into -OH terminated groups is necessary to form the monolayer of 3APTES. A variety of surface modification processes were compared to select the most efficient method for surface modification as shown in Figure 1. As a result, the H2 O2 /H2 SO4 wet process and O2 plasma treatment are shown to be the effective methods. The O2 plasma was selected in this work because it is more consistent for our experimental conditions. Other processes require high temperatures and toxic solutions. The O2 plasma was generated in an inductively coupled tubular reactor, and the O2 treatment was employed to modify the glass surface with the following condition - 7-sccm O2, 0.32-Torr chamber pressure and 10-W source power for 30 min. The glass surface was modified mainly by O radicals generated from the O2 plasma. The polystyrene area, which is modified into a hydrophilic surface after the O2 plasma treatment, tends to cause nonspecific binding of protein on the polystyrene surface, so the oxidized polystyrene area has to be modified into a hydrophobic one to reduce undesired adhesion of protein while the glass surface is kept hydrophilic (Figure 2(f)). The patterned slide glass was placed upside down in a chamber at 120 C to modify the polystyrene area into a hydrophobic one by using vaporized toluene (Figure 3). The self-assembled monolayer material used in this work is 3-aminopropyltriethoxysilane (3-APTES (H2 C=C(CH3 )CO(OCH2 CH2 )no2 CC (CH3 )=CH2 )) from Sigma-Aldrichr, and it forms the monolayer on the glass surface. A two-µmol% 3-APTES solution is prepared by stirring with toluene for 2 hours at room temperature. The monolayer was selectively formed on the glass surface after soaking the patterned slide glass in the 3-APTES solution for 40 min at room temperature [15] (Figure 4). For the final step of the protein patterning, fluorescein Fig. 5. Images of the PDMS stamp under a field-emission scanning electron microscope (FE-SEM). (a) The master mold is a silicon wafer patterned on a scale of 50 µm, and (b) The PDMS stamp is transferred from the master mold. isothiocyanate conjugate - bovine serum albumin (FITCBSA) from Sigma-Aldrichr was used in this work, and FITC-BSA has luminance in the green region of the visible spectrum. Phosphate-buffered saline (PBS) was prepared as a buffer solution, and it had a ph of ethyl-3-(3-dimethylaminopropyl) carbodiimide (EDC, PierceTM) and 1 mg of N-hydroxy succinimide (NHS, PierceTM) were used as cross-linkers to help the protein bind with the NH2 functional group at the end of the 3-APTES molecule (Figure 2(h)). Five-mg FITC-BSA, 10-mg EDC, 1-mg NHS and 1200-µl PBS were mixed at RT for 30 min without exposure to light. The 150µl FITC-BSA solution was dropped onto the slide glass patterned with polystyrene, and the dropped glass was incubated for 3 hour at RT without exposure to light. After a DI water rinse the adhesion of the protein and the 3-APTES was confirmed by using a fluorescent microscope (Nikon Eclipse 80i). The surface composition was also investigated by using X-ray photoelectron spectroscopy (XPS) for an elemental composition analysis. III. RESULT AND DISCUSSION FE-SEM images of the silicon master mold and the replicated PDMS stamp are shown in Figure 5. The

4 Protein Patterning on a Glass Substrate with a Capillary Choonghan Ryu et al Table 1. Surface treatment effect for protein immobilization (1000-msec exposure time). High value of fluorescent intensity is represented by asterisk (*). Sample Condition Process of Treatment Fluorescent Intensity Note 1 Bare glass Reference Glass (H2 O2, H2 SO4 10 min) Wet process * Toxic 3 Glass (400 C, 4 hour) Thermal process High Temp. 4 Glass (Tesla coil) Tesla coil Short maintain span 5 Glass (O2 plasma) Plasma process * Non-toxicLow temp.long maintain span Fig. 6. Images of the polystyrene pattern on the glass substrate under a FE-SEM. (a) The scale is 50 µm and line : space = 1 : 2. (b) The whole PS thickness is about 3 µm, and the pattern thickness is about 2 µm. structure of the master mold and the PDMS stamp is a 50-µm line and 100-µm space. The depth of stamp is about 2 µm. The depth is perfectly transferred from master mold. Due to the low surface energy of PDMS, the SEM image of the PDMS shows a little dust on the surface. Stiction is a challenge in the use of PDMS, especially for a small ratio of width to depth. The ratio of width to depth, however, is large enough in this work. Figure 6 shows the structure of polystyrene patterned on the glass by using CFL process, as analyzed by using field emission scanning electron microscope (FE-SEM). The 2-µm-deep wall represents the pattern formed by the capillary force in rubbery polystyrene at 120 C. The thickness of the residual layer is about 1 µm. Therefore, an etching process is necessary for the 1-µm residual (Figure 6(b)). In self-assembled monolayer formation, typical major process parameters include the water content, the reaction temperature, and the surface chemistry. The water contents in the SAM solution and the reaction temperature were adopted from other research results [16]. For an effective silanization reaction between 3-APTES and the surface, the surface should be modified so as to become OH-terminated. A variety of surface treatments for OH groups are compared, wet process, thermal process, and plasma process, as shown in Table 1. In wet treatment, the glass surface is treated in a piranha solution (H2 SO4 : H2 O2 = 7 : 3) for 10 min and shows the strongest fluorescent intensity of 254. This wet treatment is popular in semiconductor surface cleaning processes, but it requires toxic solutions, and the solutions can cause undesirable reactions in polystyrene, such as floating of the polystyrene layer. Thermal processes are often used for surface modification, and one of the typical conditions is tested in this work. Thermal processes have advantages of being non-toxic and requiring minimal equipment. The glass surface was treated at 400 C in a chamber for 4 h. The thermal process showed the minimum signal intensity among the tested processes. In this work, the thermal process is not a good candidate because it requires high temperature and can deform the polymer pattern on surface. The Tesla coil is also a popular way for surface modification and was tested here. The glass surface was treated by using a Tesla coil for 5 min and showed a fluorescent intensity of 201. To verify the durability of the surface after Tesla coil treatment, we analyzed the contact angle of the surface as a function of time. The Tesla-coil-treated surface could not maintain a low contact angle for more than a day. The contact angle was significantly increased from 4 to 24 in 24 hours. The O2 plasma surface treatment was verified as being the most efficient technique for forming a 3-APTES monolayer and showed a strong fluorescent intensity of 240. Moreover, the process does not require a high temperature or a toxic solution. The contact angle did not change over a day, unlike with the Tesla coil treatment. As a result, the O2 plasma surface treatment is the most efficient and suitable due to its being a non

5 Journal of the Korean Physical Society, Vol. 51, No. 3, September 2007 Fig. 7. Images of the polystyrene pattern and the BSA pattern.(a) FE-SEM image of the polystyrene pattern with a 50-µm line and a 100-µm space (1 : 2) on glass, (b) BSA pattern s fluorescent digital microscope image (exposure time: 500 msec, gain: 10.02) with a bright area mean average of 141 and a dark area mean intensity a 125 (fluorescent intensity of background is 118). toxic, low-temperature process. 3-APTES was applied on the polystyrene-patterned glass surface to immobilize the protein in a peptide bond. The protein was immobilized on the glass surface, and a topographical image obtained by using fluorescent digital microscopy is shown in Figure 7. Figure 7(a) shows the FE-SEM image of a 50-µm polystyrene pattern. Figure 7(b) shows a fluorescent digital microscopy image of the same pattern. Bovine serum albumin (BSA) is luminescent with a green color. As Figure 7(b) shown, the bright green area verifies that the protein (BSA) was immobilized on the glass along the green line. The dark area represents the polystyrene line pattern. The signal intensities of the protein and the polystyrene were 23 and 7, respectively, after the background signal of 118 was subtracted. The fluorescent intensity of the protein is two times stronger than one of the polystyrene. Protein physical immobilization with CFL is reported by Suh and coworkers [17, 18]. Since the protein is bound to the surface by physical adsorption, the bonding strength is believed to be not strong, so the protein can be detached by a solution such as blood or buffer solution in a fluidic system. In this work, the protein Fig. 8. X-ray photoelectron spectrometer analysis to verify monolayer formation and protein adsorption for different samples: (a) graph of the N component and (b) graph of the C component. is chemically immobilized on the glass surface, and the bonding strength is believed to be stronger than physical immobilization. XPS analysis was adopted to verify the 3-APTES layer on the glass and the protein binding on the 3-APTES monolayer. Three surfaces were analyzed in sequence, bare glass, glass surface coated by 3-APTES, and glass surface with protein on a 3-APTES monolayer, as shown in Figure 8. The analyzed components are nitrogen (N) and carbon (C) for the protein and the 3-APTES layer. The N and the C components should increase if the 3APTES and the protein adhere well because the N and the C components should be included in the 3-APTES and the protein. The N peak increases in the following order, as expected, due to adhesion of 3-APTES and protein: bare glass, glass surface coated by 3-APTES, and glass surface with protein on a 3-APTES monolayer. In the carbon case, the C component peak also increases, as predicted, for the same reason (Figure 8(b)). The ad-

6 Protein Patterning on a Glass Substrate with a Capillary Choonghan Ryu et al sorption of 3-APTES and protein was verified by comparing the N and the C peaks. IV. CONCLUSION We have demonstrated a novel process for the patterning of bio-molecules with controlled surface properties on a microscale. A combination of CFL and surface treatment was presented as an economical and useful technique for protein patterning. Various surface treatments were compared, and oxygen plasma treatment was verified as a strong technique for protein patterning. We presented data for successful and reproducible immobilization of FITC-BSA molecules on 50-µm-wide lines with an adhered 3-APTES film. The protein immobilization technique demonstrated in this work can provide a platform for the immobilization of various proteins other than BSA by controlling the surface properties. ACKNOWLEDGMENTS The author gratefully acknowledges Taeil Kim for support with capillary force lithography. This paper was supported by Faculty Research Fund, Sungkyunkwan University, REFERENCES [1] S. H. Yeo, C. R. Choi, D. Jung and H. Y. Park, J. Korean Phys. Soc. 48, 1325 (2006). [2] A. Kramer, E. Vakalopoulou, W. D. Schleuning and J. S. Merneger, Mol. Immunol. 32, 459 (1995). [3] S. Fodor, L. Stryer, J. Winkler, C. Holmes and D. Solas, US patent [4] Y. Xia and G. M. Whitesides, J. Am. Chem. Soc. 117, 3274 (1995). [5] S. Y. Chou, P. R. Krauss and P. J. Renstrom, Science 272, 85 (1996). [6] D. Y. Khang and H. H. Lee, Adv. Mater. 16, 176 (2004). [7] K. Y. Suh, Y. S. Kim and H. H. Lee, Adv. Mater. 13, 18 (2001). [8] A. S. Blawas and W. M. Reichert, Biomaterials 19, 595 (1998). [9] J. F. Mooney, A. J. Hunt, J. R. McIntosh, C. A. Liberko, D. M. Walba and C. T. Rogers, Proc. Natl. Acad. Sci. 93, (1996). [10] Y. J. Oh, W. Jo, J. A. Kim and S. Park, J. Korean Phys. Soc. 48, 1642 (2006). [11] S. Kim, T. W. Kwon, J. Y. Kim, H. Shin, J. G. Lee and M. M. Sung, J. Korean Phys. Soc. 49, 736 (2006). [12] H. J. Shin, D. K. Jeong, J. G. Lee, M. M. Sung and J. Y. Kim, Adv. Mater. 16, 1197 (2004). [13] R. Maboudian, W. R. Ashurst and C. Carraro, Sens. Actuators A Phys. 82, 219 (2000). [14] K. Y. Suh and H. H. Lee, Adv. Funct. Mater. 12, 6 (2002). [15] A. N. Parikht, D. L. AUara, I. B. Azouz and F. Rondelez, J. Phys. Chem. 98, 7577 (1994). [16] J. B. Brzoska, I. Ben Azouz and F. Rondelez, Langmuir 10, 4367 (1994). [17] K. Y. Suh, J. Seong, A. Khademhosseini, P. E. Laibinis and R. Langer, Biomaterials 25, 557 (2004). [18] A. Khademhosseini, S. Jon, K. Y. Suh, T. T. Tran, George Eng, J. Yeh, J. Seong and R. Langer, Adv. Mater. 15, 1995 (2003).

Supporting Online Material for

Supporting Online Material for www.sciencemag.org/cgi/content/full/1162193/dc1 Supporting Online Material for Polymer Pen Lithography Fengwei Huo, Zijian Zheng, Gengfeng Zheng, Louise R. Giam, Hua Zhang, Chad A. Mirkin* *To whom correspondence

More information

Study of Surface Reaction and Gas Phase Chemistries in High Density C 4 F 8 /O 2 /Ar and C 4 F 8 /O 2 /Ar/CH 2 F 2 Plasma for Contact Hole Etching

Study of Surface Reaction and Gas Phase Chemistries in High Density C 4 F 8 /O 2 /Ar and C 4 F 8 /O 2 /Ar/CH 2 F 2 Plasma for Contact Hole Etching TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS Vol. 16, No. 2, pp. 90-94, April 25, 2015 Regular Paper pissn: 1229-7607 eissn: 2092-7592 DOI: http://dx.doi.org/10.4313/teem.2015.16.2.90 OAK Central:

More information

Photolithography. Class: Figure 12.1. Various ways in which dust particles can interfere with photomask patterns.

Photolithography. Class: Figure 12.1. Various ways in which dust particles can interfere with photomask patterns. Photolithography Figure 12.1. Various ways in which dust particles can interfere with photomask patterns. 19/11/2003 Ettore Vittone- Fisica dei Semiconduttori - Lectio XIII 16 Figure 12.2. Particle-size

More information

Study of tungsten oxidation in O 2 /H 2 /N 2 downstream plasma

Study of tungsten oxidation in O 2 /H 2 /N 2 downstream plasma Study of tungsten oxidation in O 2 /H 2 /N 2 downstream plasma Songlin Xu a and Li Diao Mattson Technology, Inc., Fremont, California 94538 Received 17 September 2007; accepted 21 February 2008; published

More information

Conductivity of silicon can be changed several orders of magnitude by introducing impurity atoms in silicon crystal lattice.

Conductivity of silicon can be changed several orders of magnitude by introducing impurity atoms in silicon crystal lattice. CMOS Processing Technology Silicon: a semiconductor with resistance between that of conductor and an insulator. Conductivity of silicon can be changed several orders of magnitude by introducing impurity

More information

Protease Peptide Microarrays Ready-to-use microarrays for protease profiling

Protease Peptide Microarrays Ready-to-use microarrays for protease profiling Protocol Protease Peptide Microarrays Ready-to-use microarrays for protease profiling Contact us: InfoLine: +49-30-97893-117 Order per fax: +49-30-97893-299 Or e-mail: peptide@jpt.com www: www.jpt.com

More information

Rapid Prototyping and Development of Microfluidic and BioMEMS Devices

Rapid Prototyping and Development of Microfluidic and BioMEMS Devices Rapid Prototyping and Development of Microfluidic and BioMEMS Devices J. Sasserath and D. Fries Intelligent Micro Patterning System Solutions, LLC St. Petersburg, Florida (T) 727-522-0334 (F) 727-522-3896

More information

Covalent Conjugation to Cytodiagnostics Carboxylated Gold Nanoparticles Tech Note #105

Covalent Conjugation to Cytodiagnostics Carboxylated Gold Nanoparticles Tech Note #105 Covalent Conjugation to Cytodiagnostics Carboxylated Gold Nanoparticles Tech Note #105 Background Gold nanoparticle conjugates have been widely used in biological research and biosensing applications.

More information

h e l p s y o u C O N T R O L

h e l p s y o u C O N T R O L contamination analysis for compound semiconductors ANALYTICAL SERVICES B u r i e d d e f e c t s, E v a n s A n a l y t i c a l g r o u p h e l p s y o u C O N T R O L C O N T A M I N A T I O N Contamination

More information

A Study of Haze Generation as Thin Film Materials

A Study of Haze Generation as Thin Film Materials A Study of Haze Generation as Thin Film Materials Ju-Hyun Kang, Han-Sun Cha*, Sin-Ju Yang, Chul-Kyu Yang, Jin-Ho Ahn*, Kee-Soo Nam, Jong-Min Kim**, Manish Patil**, Ik-Bum Hur** and Sang-Soo Choi** Blank

More information

Module 7 Wet and Dry Etching. Class Notes

Module 7 Wet and Dry Etching. Class Notes Module 7 Wet and Dry Etching Class Notes 1. Introduction Etching techniques are commonly used in the fabrication processes of semiconductor devices to remove selected layers for the purposes of pattern

More information

Damage-free, All-dry Via Etch Resist and Residue Removal Processes

Damage-free, All-dry Via Etch Resist and Residue Removal Processes Damage-free, All-dry Via Etch Resist and Residue Removal Processes Nirmal Chaudhary Siemens Components East Fishkill, 1580 Route 52, Bldg. 630-1, Hopewell Junction, NY 12533 Tel: (914)892-9053, Fax: (914)892-9068

More information

CAPITOLO III MATERIALI ASSEMBLATI E AUTOASSEMBLATI. Photonics and Biophotonics Organics Synthesis - PhoBOS

CAPITOLO III MATERIALI ASSEMBLATI E AUTOASSEMBLATI. Photonics and Biophotonics Organics Synthesis - PhoBOS CAPITOLO III MATERIALI ASSEMBLATI E AUTOASSEMBLATI 1 Outline and motivation SA mono and multilayers on silica and silicon native oxide The chemistry of the process the effect of moisture the effect of

More information

Dry Etching and Reactive Ion Etching (RIE)

Dry Etching and Reactive Ion Etching (RIE) Dry Etching and Reactive Ion Etching (RIE) MEMS 5611 Feb 19 th 2013 Shengkui Gao Contents refer slides from UC Berkeley, Georgia Tech., KU, etc. (see reference) 1 Contents Etching and its terminologies

More information

Supporting information

Supporting information Supporting information Ultrafast room-temperature NH 3 sensing with positively-gated reduced graphene oxide field-effect transistors Ganhua Lu 1, Kehan Yu 1, Leonidas E. Ocola 2, and Junhong Chen 1 * 1

More information

Plasma Cleaner: Physics of Plasma

Plasma Cleaner: Physics of Plasma Plasma Cleaner: Physics of Plasma Nature of Plasma A plasma is a partially ionized gas consisting of electrons, ions and neutral atoms or molecules The plasma electrons are at a much higher temperatures

More information

OPTIMIZING OF THERMAL EVAPORATION PROCESS COMPARED TO MAGNETRON SPUTTERING FOR FABRICATION OF TITANIA QUANTUM DOTS

OPTIMIZING OF THERMAL EVAPORATION PROCESS COMPARED TO MAGNETRON SPUTTERING FOR FABRICATION OF TITANIA QUANTUM DOTS OPTIMIZING OF THERMAL EVAPORATION PROCESS COMPARED TO MAGNETRON SPUTTERING FOR FABRICATION OF TITANIA QUANTUM DOTS Vojtěch SVATOŠ 1, Jana DRBOHLAVOVÁ 1, Marian MÁRIK 1, Jan PEKÁREK 1, Jana CHOMOCKÁ 1,

More information

Processing Procedures for CYCLOTENE 4000 Series Photo BCB Resins DS2100 Puddle Develop Process

Processing Procedures for CYCLOTENE 4000 Series Photo BCB Resins DS2100 Puddle Develop Process Revised: March 2009 Processing Procedures for CYCLOTENE 4000 Series Photo BCB Resins DS2100 Puddle Develop Process 1. Introduction The CYCLOTENE 4000 Series advanced electronic resins are I-line-, G-line-,

More information

Adhesive Bonding of Natural Stone

Adhesive Bonding of Natural Stone Adhesive Bonding of Natural Stone Section I: Basics of Stone Adhesion Adhesive Theory There are many theories concerning the forces that are at work in forming an adhesive bond between two (2) different

More information

一 Development of microchip integrated with electrochemical sensor in conjunction with indium tin oxide electrode

一 Development of microchip integrated with electrochemical sensor in conjunction with indium tin oxide electrode 一 Development of microchip integrated with electrochemical sensor in conjunction with indium tin oxide electrode We developed a microchips integrated with electrochemical sensor which uses indium tin oxide

More information

Light management for photovoltaics using surface nanostructures

Light management for photovoltaics using surface nanostructures Light management for photovoltaics using surface nanostructures Roberta De Angelis Department of Industrial Engineering and INSTM, University of Rome Tor Vergata New Materials For Optoelectronics webnemo.uniroma2.it

More information

Nanoparticle Deposition on Packaging Materials by the Liquid Flame Spray

Nanoparticle Deposition on Packaging Materials by the Liquid Flame Spray Nanoparticle Deposition on Packaging Materials by the Liquid Flame Spray Hannu Teisala a, Mikko Tuominen a, Mikko Aromaa b, Jyrki M. Mäkelä b, Milena Stepien c, Jarkko J. Saarinen c, Martti Toivakka c

More information

BNG 331 Cell-Tissue Material Interactions. Biomaterial Surfaces

BNG 331 Cell-Tissue Material Interactions. Biomaterial Surfaces BNG 331 Cell-Tissue Material Interactions Biomaterial Surfaces Course update Updated syllabus Homework 4 due today LBL 5 Friday Schedule for today: Chapter 8 Biomaterial surface characterization Surface

More information

Fabrication of Nanopattern by Nanoimprint Lithography for the Application to Protein Chip

Fabrication of Nanopattern by Nanoimprint Lithography for the Application to Protein Chip BIOCHIP JOURNAL, Vol. 3, No. 1, 76-81, March 2009 Fabrication of Nanopattern by Nanoimprint Lithography for the Application to Protein Chip Ho-Gil Choi 1, Dong-Sik Choi 2, Eun-Wook Kim 3, Gun-Young Jung

More information

Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography

Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithography Wen-Di Li*, Wei Wu** and R. Stanley Williams Hewlett-Packard Labs *Current address: University

More information

SCREEN PRINTING INSTRUCTIONS

SCREEN PRINTING INSTRUCTIONS SCREEN PRINTING INSTRUCTIONS For Photo-Imageable Solder Masks and Idents Type 5600 Two Part Solder Masks and Idents Mega Electronics Ltd., Mega House, Grip Industrial Estate, Linton, Cambridge, ENGLAND

More information

Coating of TiO 2 nanoparticles on the plasma activated polypropylene fibers

Coating of TiO 2 nanoparticles on the plasma activated polypropylene fibers Coating of TiO 2 nanoparticles on the plasma activated polypropylene fibers Renáta Szabová*, Ľudmila Černáková, Magdaléna Wolfová, Mirko Černák a Department of Plastics and Rubber, Institute of Polymer

More information

Concepts and principles of optical lithography

Concepts and principles of optical lithography 1/56 2/56 Concepts and principles of optical lithography Francesc Pérez-Murano Institut de Microelectrònica de Barcelona (CNM-IMB, CSIC) Francesc.Perez@cnm.es 10 cm mà blia 1 cm Gra de sorra Xip 1 mm 100

More information

JOURNAL INTEGRATED CIRCUITS AND SYSTEMS, VOL 1, NO. 3, JULY 2006. 39

JOURNAL INTEGRATED CIRCUITS AND SYSTEMS, VOL 1, NO. 3, JULY 2006. 39 JOURNAL INTEGRATED CIRCUITS AND SYSTEMS, VOL 1, NO. 3, JULY 2006. 39 Self-Assembled Polystyrene Micro-Spheres Applied for Photonic Crystals and Templates Fabrication Daniel S. Raimundo 1, Francisco J.

More information

A Microfluidic Chemiluminescence Immunoassay for Measurement of Testosterone in Serum and Urine

A Microfluidic Chemiluminescence Immunoassay for Measurement of Testosterone in Serum and Urine Electronic Supplementary Material (ESI) for Analyst. This journal is The Royal Society of Chemistry 2015 Supporting Information for A Microfluidic Chemiluminescence Immunoassay for Measurement of Testosterone

More information

UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE BOARD OF PATENT APPEALS AND INTERFERENCES

UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE BOARD OF PATENT APPEALS AND INTERFERENCES UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE BOARD OF PATENT APPEALS AND INTERFERENCES Ex parte ELIZABETH G. PAVEL, MARK N. KAWAGUCHI, and JAMES S. PAPANU Appeal 2009-002463 Technology Center 1700

More information

Lecture 11. Etching Techniques Reading: Chapter 11. ECE 6450 - Dr. Alan Doolittle

Lecture 11. Etching Techniques Reading: Chapter 11. ECE 6450 - Dr. Alan Doolittle Lecture 11 Etching Techniques Reading: Chapter 11 Etching Techniques Characterized by: 1.) Etch rate (A/minute) 2.) Selectivity: S=etch rate material 1 / etch rate material 2 is said to have a selectivity

More information

Introduction to VLSI Fabrication Technologies. Emanuele Baravelli

Introduction to VLSI Fabrication Technologies. Emanuele Baravelli Introduction to VLSI Fabrication Technologies Emanuele Baravelli 27/09/2005 Organization Materials Used in VLSI Fabrication VLSI Fabrication Technologies Overview of Fabrication Methods Device simulation

More information

Synthesis, characterization and application of a novel mercapto- and new kind of

Synthesis, characterization and application of a novel mercapto- and new kind of SUPPLEMENTARY MATERIAL Synthesis, characterization and application of a novel mercapto- and new kind of polyaminophenol-bifunctionalized MCM-41 for dispersive micro solid phase extraction of Ni(II) prior

More information

J H Liao 1, Jianshe Tang 2,b, Ching Hwa Weng 2, Wei Lu 2, Han Wen Chen 2, John TC Lee 2

J H Liao 1, Jianshe Tang 2,b, Ching Hwa Weng 2, Wei Lu 2, Han Wen Chen 2, John TC Lee 2 Solid State Phenomena Vol. 134 (2008) pp 359-362 Online available since 2007/Nov/20 at www.scientific.net (2008) Trans Tech Publications, Switzerland doi:10.4028/www.scientific.net/ssp.134.359 Metal Hard

More information

Pattern & device transfer processes

Pattern & device transfer processes Journée Trans GDR «Micronanomanipulation pour les micro et nano systèmes» Besançon, 11 Avril 2012 Pattern & device transfer processes A. Bosseboeuf 1*, G. Schelcher 1, V. Beix 1,2, S. Brault 2, S. Nazeer

More information

Good Boards = Results

Good Boards = Results Section 2: Printed Circuit Board Fabrication & Solderability Good Boards = Results Board fabrication is one aspect of the electronics production industry that SMT assembly engineers often know little about.

More information

Emerging new non conventional tools

Emerging new non conventional tools Emerging new non conventional tools Near field lithography Near field lithography Near field lithography through local electrochemistry example of gold a) Surface water condensation b) Monolayer of oxidized

More information

CYCLOTENE Advanced Electronics Resins (Photo BCB) Processing Procedures for 20µm Photo-BCB Layers Using XUS35078 type 3

CYCLOTENE Advanced Electronics Resins (Photo BCB) Processing Procedures for 20µm Photo-BCB Layers Using XUS35078 type 3 Processing Procedures CYCLOTENE Advanced Electronics Resins (Photo BCB) Processing Procedures for 20µm Photo-BCB Layers Using XUS35078 type 3 Regional Product Availability Introduction Spin Curves North

More information

THE USE OF OZONATED HF SOLUTIONS FOR POLYSILICON STRIPPING

THE USE OF OZONATED HF SOLUTIONS FOR POLYSILICON STRIPPING THE USE OF OZONATED HF SOLUTIONS FOR POLYSILICON STRIPPING Gim S. Chen, Ismail Kashkoush, and Rich E. Novak AKrion LLC 633 Hedgewood Drive, #15 Allentown, PA 1816, USA ABSTRACT Ozone-based HF chemistry

More information

TAIYO PSR-4000 AUS703

TAIYO PSR-4000 AUS703 TAIYO PSR-4000 AUS703 LIQUID PHOTOIMAGEABLE SOLDER MASK Designed for Flip Chip Packaging Applications Halogen-Free (300ppm) Excellent Thermal and Crack Resistance Low Water Absorption RoHS Compliant Excellent

More information

Chemical Reactions During Wet-Etching Process of LSMO/PZT/LSMO-Structured Device Fabrication

Chemical Reactions During Wet-Etching Process of LSMO/PZT/LSMO-Structured Device Fabrication Ferroelectrics, 380:1, 97-101, 2009 Reprints available directly from the publisher DOI: 10.1080/00150190902873295 UR L: http://dx.doi.org/10.1080/00150190902873295 2009 Taylor & Francis ISSN: 0015-0193

More information

The chemical interactions of the template molecule are primarily dependent on the choice of polymer

The chemical interactions of the template molecule are primarily dependent on the choice of polymer Study of the Surface Morphology of Methyl 4-nitrobenzoate Template Thin-film Molecularly Imprinted Polymers Gary Kaganas Dartmouth College and Center for Nanomaterials Research at Dartmouth, Hanover NH

More information

the runnerless types of molds are explained post molding operations are described the basic methods of applied decoration methods are examined

the runnerless types of molds are explained post molding operations are described the basic methods of applied decoration methods are examined Training Objectives After watching the video and reviewing this printed material, the viewer will gain knowledge and understanding of the various plastic finishing processes used in industry and their

More information

Printed Circuits. Danilo Manstretta. microlab.unipv.it/ danilo.manstretta@unipv.it. AA 2012/2013 Lezioni di Tecnologie e Materiali per l Elettronica

Printed Circuits. Danilo Manstretta. microlab.unipv.it/ danilo.manstretta@unipv.it. AA 2012/2013 Lezioni di Tecnologie e Materiali per l Elettronica Lezioni di Tecnologie e Materiali per l Elettronica Printed Circuits Danilo Manstretta microlab.unipv.it/ danilo.manstretta@unipv.it Printed Circuits Printed Circuits Materials Technological steps Production

More information

Improved Contact Formation for Large Area Solar Cells Using the Alternative Seed Layer (ASL) Process

Improved Contact Formation for Large Area Solar Cells Using the Alternative Seed Layer (ASL) Process Improved Contact Formation for Large Area Solar Cells Using the Alternative Seed Layer (ASL) Process Lynne Michaelson, Krystal Munoz, Jonathan C. Wang, Y.A. Xi*, Tom Tyson, Anthony Gallegos Technic Inc.,

More information

Millimeter-scale contact printing of aqueous solutions using a stamp made out of paper and tape

Millimeter-scale contact printing of aqueous solutions using a stamp made out of paper and tape COMMUNICATION www.rsc.org/loc Lab on a Chip Millimeter-scale contact printing of aqueous solutions using a stamp made out of paper and tape Chao-Min Cheng, Aaron D. Mazzeo, Jinlong Gong, Andres W. Martinez,

More information

DNA NANOWIRES USING NANOPARTICLES ECG653 Project Report submitted by GOPI KRISHNA.ARI,arig@unlv.nevada.edu,Fall-2008

DNA NANOWIRES USING NANOPARTICLES ECG653 Project Report submitted by GOPI KRISHNA.ARI,arig@unlv.nevada.edu,Fall-2008 DNA NANOWIRES USING NANOPARTICLES ECG653 Project Report submitted by GOPI KRISHNA.ARI,arig@unlv.nevada.edu,Fall-2008 INTRODUCTION: Deoxyribonucleic acid (DNA) has been a key building block in nanotechnology

More information

PLASMA TECHNOLOGY OVERVIEW

PLASMA TECHNOLOGY OVERVIEW PLASMA TECHNOLOGY OVERVIEW Plasmas are not a lab curiosity. Plasma processing has been an essential production tool for more than 30 years in the fabrication of microelectronic devices for example. Over

More information

Amorphous Silicon Backplane with Polymer MEMS Structures for Electrophoretic Displays

Amorphous Silicon Backplane with Polymer MEMS Structures for Electrophoretic Displays Amorphous Silicon Backplane with Polymer MEMS Structures for Electrophoretic Displays J.H. Daniel 1, a, B.S. Krusor 1, N. Chopra 2, R.A. Street 1, P.M. Kazmaier 2, S.E. Ready 1, J.H. Ho 1 1 Palo Alto Research

More information

www.gbo.com/bioscience Tissue Culture 1 Cell/ Microplates 2 HTS- 3 Immunology/ HLA 4 Microbiology/ Bacteriology Purpose Beakers 5 Tubes/Multi-

www.gbo.com/bioscience Tissue Culture 1 Cell/ Microplates 2 HTS- 3 Immunology/ HLA 4 Microbiology/ Bacteriology Purpose Beakers 5 Tubes/Multi- 11 Cryo 5 Tubes/Multi 2 HTS 3 Immunology / Immunology Technical Information 3 I 2 96 Well ELISA 3 I 4 96 Well ELISA Strip Plates 3 I 6 8 Well Strip Plates 3 I 7 12 Well Strip Plates 3 I 8 16 Well Strip

More information

MICROPOSIT LOL 1000 AND 2000 LIFTOFF LAYERS For Microlithography Applications

MICROPOSIT LOL 1000 AND 2000 LIFTOFF LAYERS For Microlithography Applications Technical Data Sheet MICROPOSIT LOL 1000 AND 2000 LIFTOFF LAYERS For Microlithography Applications Regional Product Availability Description Advantages North America Europe, Middle East and Africa Latin

More information

Basic Properties and Application of Auto Enamels

Basic Properties and Application of Auto Enamels Basic Properties and Application of Auto Enamels Composition of Ceramic Automotive Glass Enamels Ceramic automotive glass colours are glass enamels that fire on to the glass during the bending process

More information

1. PECVD in ORGANOSILICON FED PLASMAS

1. PECVD in ORGANOSILICON FED PLASMAS F. FRACASSI Department of Chemistry, University of Bari (Italy) Plasma Solution srl SURFACE MODIFICATION OF POLYMERS AND METALS WITH LOW TEMPERATURE PLASMA OUTLINE METAL TREATMENTS 1 low pressure PECVD

More information

Pulsed laser deposition of organic materials

Pulsed laser deposition of organic materials Pulsed laser deposition of organic materials PhD theses Gabriella Kecskeméti Department of Optics and Quantum Electronics University of Szeged Supervisor: Dr. Béla Hopp senior research fellow Department

More information

DURABILITY OF MORTAR LININGS IN DUCTILE IRON PIPES Durability of mortar linings

DURABILITY OF MORTAR LININGS IN DUCTILE IRON PIPES Durability of mortar linings DURABILITY OF MORTAR LININGS IN DUCTILE IRON PIPES Durability of mortar linings I. S. MELAND SINTEF Civil and Environmental Engineering, Cement and Concrete, Trondheim, Norway Durability of Building Materials

More information

Results Overview Wafer Edge Film Removal using Laser

Results Overview Wafer Edge Film Removal using Laser Results Overview Wafer Edge Film Removal using Laser LEC- 300: Laser Edge Cleaning Process Apex Beam Top Beam Exhaust Flow Top Beam Scanning Top & Top Bevel Apex Beam Scanning Top Bevel, Apex, & Bo+om

More information

Polyimide labels for Printed Circuit Boards

Polyimide labels for Printed Circuit Boards Polyimide labels for Printed Circuit Boards The right match for any PCB labelling application Labels on Printed Circuit Boards Matching product performance with application needs Printed Circuit Boards

More information

Effect of Dissolved CO 2 in De-ionized Water in Reducing Wafer Damage During Megasonic Cleaning in MegPie. Arizona 85721, USA. Arizona 85721, USA

Effect of Dissolved CO 2 in De-ionized Water in Reducing Wafer Damage During Megasonic Cleaning in MegPie. Arizona 85721, USA. Arizona 85721, USA Effect of Dissolved CO 2 in De-ionized Water in Reducing Wafer Damage During Megasonic Cleaning in MegPie S. Kumari a, M. Keswani a, S. Singh b, M. Beck c, E. Liebscher c, L. Q. Toan d and S. Raghavan

More information

Discovering the Properties of Magic Sand

Discovering the Properties of Magic Sand NNIN Nanotechnology Education Teacher s Preparatory Guide Discovering the Properties of Magic Sand Purpose Explore the properties of molecular bonding Introduce students to the engineering of hydrophobic

More information

Technical Synopsis of Plasma Surface Treatments

Technical Synopsis of Plasma Surface Treatments Technical Synopsis of Plasma Surface Treatments Wesley Taylor Advisor: Dr. Bruce Welt University of Florida, Gainesville, FL December, 2009 Abstract Surface treatment technology delves into some of the

More information

Projet ConProMi : convergence Microtechnologie / Plasturgie dans la fabrication des outillages et l intégration des capteurs

Projet ConProMi : convergence Microtechnologie / Plasturgie dans la fabrication des outillages et l intégration des capteurs Projet ConProMi : convergence Microtechnologie / Plasturgie dans la fabrication des outillages et l intégration des capteurs The ConProMi project : converging Microtechnology / Polymer technologies for

More information

... complement Information for Processing

... complement Information for Processing AZ nlof 2xx Negative Resist... complement Information for Processing revised 25--7 General Information AZ nlof 2xx is a family of negative s, with the exposed remaining on the substrate after development.

More information

T.M.M. TEKNIKER MICROMACHINING

T.M.M. TEKNIKER MICROMACHINING T.M.M. TEKNIKER MICROMACHINING Micro and Nanotechnology Dapartment FUNDACION TEKNIKER Avda. Otaola. 20 Tel. +34 943 206744 Fax. +34 943 202757 20600 Eibar http://www.tekniker.es TMM FACILITIES -Clean Room

More information

Modification of Pd-H 2 and Pd-D 2 thin films processed by He-Ne laser

Modification of Pd-H 2 and Pd-D 2 thin films processed by He-Ne laser Modification of Pd-H 2 and Pd-D 2 thin films processed by He-Ne laser V.Nassisi #, G.Caretto #, A. Lorusso #, D.Manno %, L.Famà %, G.Buccolieri %, A.Buccolieri %, U.Mastromatteo* # Laboratory of Applied

More information

Human serum albumin (HSA) nanoparticles stabilized with. intermolecular disulfide bonds. Supporting Information

Human serum albumin (HSA) nanoparticles stabilized with. intermolecular disulfide bonds. Supporting Information Human serum albumin (HSA) nanoparticles stabilized with intermolecular disulfide bonds Wentan Wang, Yanbin Huang*, Shufang Zhao, Ting Shao and Yi Cheng* Department of Chemical Engineering, Tsinghua University,

More information

Optimization of Photosensitive Polyimide Process for Cost Effective Packaging

Optimization of Photosensitive Polyimide Process for Cost Effective Packaging Optimization of Photosensitive Polyimide Process for Cost Effective Packaging Peter Cheang, Lorna Christensen, Corinne Reynaga Ultratech Stepper, Inc. San Jose, CA 95134 Recent developments in the use

More information

Development of an innovative bio-based structural adhesive

Development of an innovative bio-based structural adhesive Development of an innovative bio-based structural adhesive Blanca Palomo, R&D Engineer blanca.palomo@rescoll.fr RESCOLL Independent research company located in Pessac (33) specialized in technologic innovation

More information

Opaline Photonic Crystals: How Does Self-Assembly Work?

Opaline Photonic Crystals: How Does Self-Assembly Work? Opaline Photonic Crystals: How Does Self-Assembly Work? David J. Norris Chemical Engineering & Materials Science, University of Minnesota 1μm silica spheres See: D. J. Norris, E. G. Arlinghaus, L. Meng,

More information

Radiation Curable Components and Their use in Hard, Scratch Resistant Coating Applications

Radiation Curable Components and Their use in Hard, Scratch Resistant Coating Applications Radiation Curable Components and Their use in Hard, Scratch Resistant Coating Applications William Schaeffer Steven Tyson Indu Vappala Robert Kensicki Sartomer USA, LLC 502 Thomas Jones Way Exton, PA 19343

More information

Performance of Carbon-PTFE Electrodes and PTFE Separators in Electrochemical Double Layer Capacitors (EDLCs)

Performance of Carbon-PTFE Electrodes and PTFE Separators in Electrochemical Double Layer Capacitors (EDLCs) Performance of Carbon-PTFE Electrodes and PTFE Separators in Electrochemical Double Layer Capacitors (EDLCs) David Zuckerbrod, Robert Sassa, Marianne Szabo, Meagan Mizenko Abstract: W. L. Gore & Associates

More information

Guide to Reverse Phase SpinColumns Chromatography for Sample Prep

Guide to Reverse Phase SpinColumns Chromatography for Sample Prep Guide to Reverse Phase SpinColumns Chromatography for Sample Prep www.harvardapparatus.com Contents Introduction...2-3 Modes of Separation...4-6 Spin Column Efficiency...7-8 Fast Protein Analysis...9 Specifications...10

More information

Non Specific Binding (NSB) in Antigen-Antibody Assays

Non Specific Binding (NSB) in Antigen-Antibody Assays Non Specific Binding (NSB) in Antigen-Antibody Assays Chem 395 Spring 2007 Instructor : Dr. James Rusling Presenter : Bhaskara V. Chikkaveeraiah OUTLINE Immunoassays Introduction Factors contributing to

More information

Welding of Plastics. Amit Mukund Joshi. (B.E Mechanical, A.M.I.Prod.E)

Welding of Plastics. Amit Mukund Joshi. (B.E Mechanical, A.M.I.Prod.E) Welding of Plastics Amit Mukund Joshi (B.E Mechanical, A.M.I.Prod.E) Introduction Mechanical fasteners, adhesives, and welding processes can all be employed to form joints between engineering plastics.

More information

SULFUR IMPREGNATION ON ACTIVATED CARBON FIBERS BY H 2 S OXIDATION FOR Hg REMOVAL

SULFUR IMPREGNATION ON ACTIVATED CARBON FIBERS BY H 2 S OXIDATION FOR Hg REMOVAL SULFUR IMPREGNATION ON ACTIVATED CARBON FIBERS BY H 2 S OXIDATION FOR Hg REMOVAL Wenguo Feng 1, Seokjoon Kwon 2, Xue Feng 1, 3, Eric Borguet 3, and Radisav Vidic 1 * 1 Department of Civil and Environmental

More information

III. Wet and Dry Etching

III. Wet and Dry Etching III. Wet and Dry Etching Method Environment and Equipment Advantage Disadvantage Directionality Wet Chemical Solutions Atmosphere, Bath 1) Low cost, easy to implement 2) High etching rate 3) Good selectivity

More information

lung cancer targeted photodynamic therapy and imaging

lung cancer targeted photodynamic therapy and imaging 99m Tc-Hematoporphyrin linked albumin nanoparticles for lung cancer targeted photodynamic therapy and imaging Su-Geun Yang, Ji-Eun Chang, Byungchul Shin, Sanghyun Park, Kun Na and Chang-Koo Shim* *Corresponding

More information

Keystone Review Practice Test Module A Cells and Cell Processes. 1. Which characteristic is shared by all prokaryotes and eukaryotes?

Keystone Review Practice Test Module A Cells and Cell Processes. 1. Which characteristic is shared by all prokaryotes and eukaryotes? Keystone Review Practice Test Module A Cells and Cell Processes 1. Which characteristic is shared by all prokaryotes and eukaryotes? a. Ability to store hereditary information b. Use of organelles to control

More information

Waterproofing System for Wastewater Tanks in Petrochemical Industries and Refineries

Waterproofing System for Wastewater Tanks in Petrochemical Industries and Refineries Waterproofing System for Wastewater Tanks in Petrochemical Industries and Refineries Introduction Wastewater of petrochemical industries and refineries contains high amounts of emulsified aliphatic or

More information

Chemical Bonds. Chemical Bonds. The Nature of Molecules. Energy and Metabolism < < Covalent bonds form when atoms share 2 or more valence electrons.

Chemical Bonds. Chemical Bonds. The Nature of Molecules. Energy and Metabolism < < Covalent bonds form when atoms share 2 or more valence electrons. The Nature of Molecules Chapter 2 Energy and Metabolism Chapter 6 Chemical Bonds Molecules are groups of atoms held together in a stable association. Compounds are molecules containing more than one type

More information

The Water Race: Hydrophobic & Hydrophilic Surfaces

The Water Race: Hydrophobic & Hydrophilic Surfaces tudent Worksheet The Water Race: Hydrophobic & Hydrophilic urfaces In the water molecule, the hydrogen atoms tend to have a slightly positive charge and the oxygen atoms a slightly negative charge. Water

More information

Comprehensive Investigation of Sequential Plasma Activated Si/Si Bonded Interface for Nano-integration

Comprehensive Investigation of Sequential Plasma Activated Si/Si Bonded Interface for Nano-integration Comprehensive Investigation of Sequential Plasma Activated Si/Si Bonded Interface for Nano-integration M G Kibria, F Zhang, T H Lee, M J Kim and M M R Howlader Dept. Electrical and Computer Engineering,

More information

Desmear and Plating Through Hole Considerations and Experiences for Green PCB Production

Desmear and Plating Through Hole Considerations and Experiences for Green PCB Production Desmear and Plating Through Hole Considerations and Experiences for Green PCB Production Gerd Linka, (Neil Patton) Atotech Deutschland GmbH Berlin, Germany Abstract With the latest legislations from RoHS

More information

Estimation of Long-Term Change in Physical Property of Optical Fiber Coating Considering Effect of Humidity

Estimation of Long-Term Change in Physical Property of Optical Fiber Coating Considering Effect of Humidity INFOCOMMUNICATIONS Estimation of Long-Term Change in Physical Property of Optical Fiber Coating Considering Effect of Humidity Kazuyuki SOHMA*, Noriaki IWAGUCHI, Takehiko KAWANO, Takashi FUJII and Yasushi

More information

Photolithography. Source: Dr. R. B. Darling (UW) lecture notes on photolithography

Photolithography. Source: Dr. R. B. Darling (UW) lecture notes on photolithography Photolithography Source: Dr. R. B. Darling (UW) lecture notes on photolithography Why Lithography? Simple layers of thin films do not make a device. To create a device such as a transistor, layers of thin

More information

In this experiment, we will use three properties to identify a liquid substance: solubility, density and boiling point..

In this experiment, we will use three properties to identify a liquid substance: solubility, density and boiling point.. Identification of a Substance by Physical Properties 2009 by David A. Katz. All rights reserved. Permission for academic use provided the original copyright is included Every substance has a unique set

More information

Electroplating with Photoresist Masks

Electroplating with Photoresist Masks Electroplating with Photoresist Masks Revised: 2014-01-17 Source: www.microchemicals.com/downloads/application_notes.html Electroplating - Basic Requirements on the Photoresist Electroplating with photoresist

More information

and LUMINOUS CHEMICAL VAPOR DEPOSITION INTERFACE ENGINEERING HirotsuguYasuda University of Missouri-Columbia Columbia, Missouri, U.S.A.

and LUMINOUS CHEMICAL VAPOR DEPOSITION INTERFACE ENGINEERING HirotsuguYasuda University of Missouri-Columbia Columbia, Missouri, U.S.A. LUMINOUS CHEMICAL VAPOR DEPOSITION and INTERFACE ENGINEERING HirotsuguYasuda University of Missouri-Columbia Columbia, Missouri, U.S.A. MARCEL MARCEL DEKKER. NEW YORK DEKKER Contents Preface iii Part I.

More information

How to Build a Printed Circuit Board. Advanced Circuits Inc 2004

How to Build a Printed Circuit Board. Advanced Circuits Inc 2004 How to Build a Printed Circuit Board 1 This presentation is a work in progress. As methods and processes change it will be updated accordingly. It is intended only as an introduction to the production

More information

Building materials thermal conductivity measurement and correlation with heat flow meter, laser flash analysis and TCi

Building materials thermal conductivity measurement and correlation with heat flow meter, laser flash analysis and TCi J Therm Anal Calorim DOI 10.1007/s10973-011-1760-x Building materials thermal conductivity measurement and correlation with heat flow meter, laser flash analysis and TCi Junghoon Cha Jungki Seo Sumin Kim

More information

forum Microplates for Enzyme Linked Immunosorbent Assays (ELISA) No. 9, November 2008 Content

forum Microplates for Enzyme Linked Immunosorbent Assays (ELISA) No. 9, November 2008 Content forum No. 9, November 2008 T e c h n i c a l N o t e s a n d A p p l i c a t i o n s f o r L a b o r a t o r y W o r k Content Microplates for Enzyme Linked Immunosorbent Assays (ELISA) 1. Introduction

More information

Sensitivity to both h- and i-line makes AZ 9200 photoresist capable for both broadband and i-line steppers.

Sensitivity to both h- and i-line makes AZ 9200 photoresist capable for both broadband and i-line steppers. Product Data Sheet AZ 9200 Photoresist 1µm Film Thickness 4.6 µm High-Resolution Thick Resist AZ 9200 thick film photoresist is designed for the more demanding higher-resolution thick resist requirements.

More information

The Anatomy of a Label

The Anatomy of a Label The Anatomy of a Label Three key elements make up a label: face stock, release liner, and adhesive. Face Stock: Face stock is the material of the label that carries the imprint. The print can be applied

More information

MAKING A BETTER MARK WITH INK JET As substrates, industry regulations and customer demands change, fluids are also evolving

MAKING A BETTER MARK WITH INK JET As substrates, industry regulations and customer demands change, fluids are also evolving MAKING A BETTER MARK WITH INK JET As substrates, industry regulations and customer demands change, fluids are also evolving By Dan Laird, technical support chemist, Videojet Technologies Inc. On the surface,

More information

ECL Western Blotting Substrate INSTRUCTIONS FOR USE OF PRODUCTS W1001 AND W1015.

ECL Western Blotting Substrate INSTRUCTIONS FOR USE OF PRODUCTS W1001 AND W1015. Technical Manual ECL Western Blotting Substrate INSTRUCTIONS FOR USE OF PRODUCTS W1001 AND W1015. PRINTED IN USA. 6/09 ECL Western Blotting Substrate All technical literature is available on the Internet

More information

Scotch-Weld TM. Acrylic Adhesives. DP8405NS Green. Product Data Sheet. Date: March 2014 Supersedes: August 2013

Scotch-Weld TM. Acrylic Adhesives. DP8405NS Green. Product Data Sheet. Date: March 2014 Supersedes: August 2013 Scotch-Weld TM Product Data Sheet Acrylic Adhesives Date: Supersedes: August 2013 Product Description 3M TM Scotch-Weld Acrylic Adhesives are high performance, twopart acrylic adhesives that offer good

More information

Mold Preventing I nterior System

Mold Preventing I nterior System interior insulation and renovation boards A system of components that have been designed to work perfectly together to repair damage caused by mold. The system consists of boards, insulation wedges, reveal

More information

WATERPROOFING OF WET ROOMS

WATERPROOFING OF WET ROOMS WATERPROOFING OF WET ROOMS Waterproofing under tiles For longterm enjoyment of a wetroom area a complete and resistant waterproofing system is an important precondition. Most tiles are by themselves waterproof

More information

Coating Technology: Evaporation Vs Sputtering

Coating Technology: Evaporation Vs Sputtering Satisloh Italy S.r.l. Coating Technology: Evaporation Vs Sputtering Gianni Monaco, PhD R&D project manager, Satisloh Italy 04.04.2016 V1 The aim of this document is to provide basic technical information

More information

DETECTION OF COATINGS ON PAPER USING INFRA RED SPECTROSCOPY

DETECTION OF COATINGS ON PAPER USING INFRA RED SPECTROSCOPY DETECTION OF COATINGS ON PAPER USING INFRA RED SPECTROSCOPY Eduard Gilli 1,2 and Robert Schennach 1, 2 1 Graz University of Technology, 8010 Graz, Austria 2 CD-Laboratory for Surface Chemical and Physical

More information