Intel 266MHz 32-Bit Pentium II (Klamath) Processor
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1 Construction Analysis Intel 266MHz 32-Bit Pentium II (Klamath) Processor Report Number: SCA Global Semiconductor Industry the Serving Since N. 75th Street Scottsdale, AZ Phone: Fax: Internet:
2 INDEX TO TEXT TITLE PAGE INTRODUCTION 1 MAJOR FINDINGS 1 TECHNOLOGY DESCRIPTION Assembly 2 Die Process 2-3 ANALYSIS RESULTS I Assembly 4-5 ANALYSIS RESULTS II Die Process and Design 6-9 ANALYSIS PROCEDURE 10 TABLES Overall Evaluation 11 Package Markings 12 Wirestrength Results 12 Die Material Analysis 12 Horizontal Dimensions 13 Vertical Dimensions 14 - i -
3 INTRODUCTION This report describes a construction analysis of the Intel 266MHz Pentium II (Klamath) Processor. Two samples were used for the analysis. The devices were received in 540-pin BGA (Ball Grid Array) packages with a metal heatsink. MAJOR FINDINGS Questionable Items: 1 Quality of die manufacturing was good and we found no areas of quality concerns. Special Features: Four metal, P-epi, CMOS process (not BiCMOS). All metal levels employed stacked tungsten via/contact plugs. Chemical-mechanical-planarization (CMP). Oxide-filled shallow-trench isolation. Titanium silicided diffusion structures. Aggressive feature sizes (reported 0.28 micron, measured 0.25 micron gates). Beveled die edges at top of die. 1 These items present possible quality or reliability concerns. They should be discussed with the manufacturer to determine their possible impact on the intended application
4 TECHNOLOGY DESCRIPTION Assembly: The devices were packaged in 540-pin BGA (Ball Grid Array) packages. A metal heatsink was employed on the top of the package. The die was mounted cavity down. Eight decoupling capacitors were present on top of the package. The BGA was constructed of fiberglass in which the package cavity was employed. The package was covered with a green conformal coating. The cavity was filled with black plastic material. Triple tier package lands plated with gold. Ultrasonic wedge wirebonding using gold wire. Wirebonds (to the die and package lands) had double footprints. Sawn dicing (full depth). The edges of the die had been beveled at the surface. Silver-epoxy die attach. The backside of the die was plated with gold. Die Process: Fabrication process: Oxide-filled shallow-trench isolation, CMOS process apparently employing twin-wells in a P-epi on a P substrate. Die coat: A thin patterned polyimide die coat was present over the entire die. Final passivation: A single layer of nitride
5 TECHNOLOGY DESCRIPTION (continued) Metallization: Four levels of metal defined by dry-etch techniques. All consisted of aluminum with titanium-nitride caps (except M4). Metal 4 employed a substantial titanium adhesion layer. There appeared to be evidence of very thin titanium adhesion layers under metals 1-3. Tungsten plugs were employed for all vertical interconnect. Metals 2-4 employed tungsten plugs with stubs underneath, for improved contact. The stubs penetrated into the metal below the tungsten plus. This is a unique processing feature. All plugs were lined with titanium-nitride. Stacked vias were employed at all levels. Interlevel dielectrics 1, 2 and 3: The interlevel dielectric between all metals consisted of the same structure. A very thin glass was deposited first, followed by two thick layers of glass. The second layer had rounded corners around metal sidewalls. The third layer of glass was planarized by CMP. Pre-metal glass: A thick layer of glass followed by a thin layer of glass. This dielectric was also planarized by CMP. Polysilicon: A single layer of dry-etched polycide (poly and titanium-silicide). This layer was used to form all gates on the die. Nitride sidewall spacers were used to provide the LDD spacing. Diffusions: Implanted N+ and P+ diffusions formed the sources/drains of transistors. Titanium was sintered into the diffusions (salicide process). No bipolar devices appeared to be present. Isolation: Isolation consisted of oxide-filled shallow-trenches. Wells: Twin-wells in a P-epi on a P substrate. SRAM: On-chip Level 1 data and instruction Cache memory cell arrays (16KByte each) were employed. The memory cells used a 6T CMOS SRAM cell design. No redundancy fuses were found
6 ANALYSIS RESULTS I Assembly : Figures 1-8 Questionable Items: 1 None. Special Features: Beveled die edges. Unique double footprint wirebonding technique. Extremely tight bond pitch (80 microns). General items: The devices were packaged in 540-pin BGAs. A metal heatsink was employed on top of the packages. The die was mounted cavity down. They were constructed of fiberglass and were covered with a green conformal coating. The cavity was filled with black plastic material. Eight decoupling capacitors were employed on top of the packages. Overall package quality: Good. No defects were found on the external or internal portions of the packages. Solder ball placement was good. No voids were noted in the plastic cavity fill. Wirebonding: Ultrasonic wedge bond method using 0.9 mil gold wire. All wirebonds had a double footprint which is the first time we ve seen this type of bonding used on these types of devices. A three tier package land structure was used. Wire spacing and placement was good. Bond pitch was very close (80 microns); however, no problems were noted. 1 These items present possible quality or reliability concerns. They should be discussed with the manufacturer to determine their possible impact on the intended application
7 ANALYSIS RESULTS I (continued) Die attach: Silver-epoxy die attach of good quality. No voids were noted in the die attach. The backside of the die was plated with gold. Die dicing: Die separation was by full depth sawing and showed normal quality workmanship. No large chips or cracks were present at the die edges. The top edges of the die had been beveled (see Figures 7 and 8). This is highly unusual and it is not apparent why it is done
8 ANALYSIS RESULTS II Die Process and Design: Figures 9-49 Questionable Items: 1 No items of concern were found in the area of die fabrication. Special Features: Four metal, twin-well, P-epi, CMOS process. All vertical interconnect employed tungsten via/contact plugs. Chemical-mechanical-planarization (CMP). Oxide-filled shallow-trench isolation. Titanium salicided diffusion structures. Aggressive feature sizes (0.25 micron gates). General Items: Fabrication process: Oxide-filled shallow-trench isolation, CMOS process apparently employing twin-wells in a P-epi on a P substrate. No problems were found in the process. Design implementation: Die layout was clean and efficient. Alignment was good at all levels. Design features: Slotted bus lines were employed to relieve stress. Anti-dishing patterns were employed for planarization purposes. Numerous unconnected metal 4 vias (which appear to be used for probing purposes) were present. Surface defects: No toolmarks, masking defects, or contamination areas were found
9 ANALYSIS RESULTS II (continued) Die coat: A patterned polyimide die coat was present over the entire die surface. Final passivation: A single layer of nitride. Coverage was good. Edge seal was also good as the passivation extended to the scribe lane to seal the metallization. Metallization: Four levels of metallization. All consisted of aluminum with titanium-nitride caps (except M4). Metal 4 employed a fairly thick titanium adhesion layer. The other levels probably used a titanium layer too thin to detect. Tungsten plugs were employed under all metals. Holes (voids) were noted in the center of some tungsten plugs (mainly metals 3 and 4). Although this indicates incomplete fill of the via holes no problems are foreseen. All plugs were lined with titanium-nitride underneath and the presumed titanium layer over top. Metal patterning: All metal levels were defined by a dry etch of good quality. Metal lines were widened (where needed), where vias made contact to them from above. Metal defects: None. No voiding, notching or cracking of the metal layers was found. No silicon nodules were found following removal of the metal layers. Metal step coverage: No metal (aluminum) thinning was present at the connections to the tungsten via plugs. The absence of thinning is due to the good control of plug height and the planarization technique employed. Vias and contacts: All via and contact cuts were defined by a dry etch of good quality. Again, alignment of the metals and plugs was good. Metals 2-4 employed tungsten stubs at the bottom of the tungsten plugs. These unique features consisted of stubs of tungsten metallization that penetrate into the underlying aluminum. The profiles of the stubs varied quite a lot indicating inconsistency in the processing. Vias and contacts were placed directly over one another (stacked vias). No problems were noted
10 ANALYSIS RESULTS II (continued) Interlevel dielectrics: The interlevel dielectric between metal levels consisted of the same oxide structure. A very thin glass was deposited first, followed by two thick layers of glass. The third layer of glass was subjected to CMP which left the surface very planar. The appearance of the second glass layer on ILD 1 was somewhat unusual; however, it does not appear to present a problem. No problems were found with any of these layers. Pre-metal glass (under metal 1): A thick layer of silicon-dioxide followed by a thin layer of glass. This layer also appeared to have been planarized by chemicalmechanical-planarization. No problems were found. Polysilicon: A single level of polycide (poly and titanium-silicide) was used. It formed all gates and word lines in the array. Definition was by dry etch of good quality. Nitride sidewall spacers were used throughout and left in place. No problems were found. Isolation: The device used oxide-filled shallow-trench isolation. The step at the oxide transition was somewhat larger than normally seen. Diffusions: Implanted N+ and P+ diffusions were used for sources and drains. Titanium was sintered into the diffusions (salicide process) to reduce series resistance. An LDD process was used employing nitride sidewall spacers. No problems were found. No bipolar devices were found on these parts which makes them the first non BiCMOS Pentium parts we ve seen. Wells: Apparent twin-wells were used in a P-epi on a P substrate. Definition was normal. Buried contacts: Not used
11 ANALYSIS RESULTS II (continued) SRAM: On-chip Level 1 data and instruction Cache memory cell arrays (16KByte each) were employed. The memory cells used a 6T CMOS SRAM cell design. Metal 4 distributed GND and Vcc to Metal 3. Metal 3 distributed GND and Vcc (via metals 1 and 2) and formed piggyback word lines. Metal 2 formed bit lines and metal 1 provided cell interconnect and provided GND and Vcc throughout the cells. Polycide formed the N-channel select and storage transistors and the P- channel pull-up transistors. Cell pitch was 4.1 x 4.8 microns (19 microns 2 ). No redundancy fuses were noted
12 PROCEDURE The devices were subjected to the following analysis procedures: External inspection X-ray Inspect assembly features Die optical inspection Wirepull test Delayer to metal 4 and inspect Aluminum removal (metal 4) and inspect tungsten plugs Delayer to metal 3 and inspect Aluminum removal (metal 3) and inspect tungsten plugs Delayer to metal 2 and inspect Aluminum removal (metal 2) and inspect tungsten plugs Delayer to metal 1 and inspect Aluminum removal (metal 1) and inspect tungsten plugs Delayer to polycide/substrate and inspect Die sectioning (90 for SEM) * Measure horizontal dimensions Measure vertical dimensions Die material analysis * Delineation of cross-sections is by silicon etch unless otherwise indicated
13 OVERALL QUALITY EVALUATION : Overall Rating: Normal DETAIL OF EVALUATION Package integrity Package markings Die placement Wirebond placement Wirebond quality Dicing quality Die attach quality Die attach method Dicing method Wirebond method G N G G (tight wirebond pitch) G (double footprints) G (beveled edges) G Silver-epoxy Sawn Ultrasonic wedge bonds using 0.9 mil gold wire. Die surface integrity: Toolmarks (absence) Particles (absence) Contamination (absence) Process defects (absence) General workmanship Passivation integrity Metal definition Metal integrity Metal registration Contact coverage Via/contact registration Etch control (depth) G G G N N G N G N N N N G = Good, P = Poor, N = Normal, NP = Normal/Poor
14 PACKAGE MARKINGS TOP (heatsink) Sample 1 C (plus coded markings) Sample 2 (only coded markings) WIREBOND STRENGTH # of wires pulled: 90 (30 each tier) Bond lifts: 0 Force to break - high: 10g - low: 5g - avg.: 6.7g - std. dev.: 0.9 DIE MATERIAL ANALYSIS Overlay passivation: Single layer of nitride. Metallization 4: Aluminum with a titanium adhesion layer. Interlevel dielectrics 1, 2 and 3: Metallization 1-3: a Via/contact plugs (M1 - M4) Pre-metal dielectric: Polycide: Salicide on diffusions: A thin layer of glass followed by two thick layers of glass. Aluminum with a titanium-nitride cap and probably very thin titanium adhesion layer. Tungsten (lined with titanium-nitride). Thick layer of silicon-dioxide followed by a thin glass. (No reflow glass). Titanium-silicide on polysilicon. Titanium-silicide
15 HORIZONTAL DIMENSIONS Die size: 13.3 x 14.6 mm (525 x 575 mils) Die area: 195 mm 2 (301,875 mils 2 ) Min pad size: 0.07 x 0.15 mm (3 x 5.9 mils) Min pad window: 0.06 x 0.14 mm (2.4 x 5.3 mils) Min pad space: 4 microns Min metal 4 width: 1.6 micron Min metal 4 space: 1.1 micron Min metal 3 width: 0.6 micron Min metal 3 space: 0.55 micron Min metal 2 width: 0.55 micron Min metal 2 space: 0.5 micron Min metal 1 width: 0.4 micron Min metal 1 space: 0.55 micron Min via (M4-to-M3): 0.6 micron Min via (M3-to-M2): 0.6 micron Min via (M2-to-M1): 0.5 micron Min contact: 0.5 micron Min diffusion space: 0.4 micron Min polycide width: 0.25 micron Min polycide space: 0.5 micron Min gate length * - (N-channel): 0.25 micron - (P-channel): 0.25 micron Min gate-to-contact space: 0.3 micron SRAM cell size: 19.7 microns 2 SRAM cell pitch: 4.1 x 4.8 microns * Physical gate length
16 VERTICAL DIMENSIONS Die thickness: 0.5 mm (20 mils) Layers: Passivation: 0.7 micron Metal 4 - aluminum: 1.7 micron - barrier: 0.1 micron - plugs: 0.9 micron (not including stub ) Interlevel dielectric 3 - glass 3: micron - glass 2: 0.4 micron - glass 1: 0.1 micron Metal 3 - cap: 0.05 micron (approximate) - aluminum: 0.75 micron - plugs: 0.7 micron (not including stub ) Interlevel dielectric 2 - glass 3: micron - glass 2: 0.35 micron - glass 1: 0.1 micron Metal 2 - cap: 0.05 micron (approximate) - aluminum: 0.8 micron - plugs: 0.6 micron (not including stub ) Interlevel dielectric 1 - glass 3: micron - glass 2: 0.25 micron - glass 1: 0.1 micron Metal 1 - cap: 0.05 micron (approximate) - aluminum: 0.55 micron - plugs: micron Pre-metal glass - glass 2: 0.13 micron - glass 1: micron Polycide - silicide: 0.07 micron (approximate) - poly: 0.27 micron Trench oxide: 0.4 micron N+ S/D: 0.2 micron P+ S/D: 0.25 micron N-well: 0.8 micron (approximate) P-epi: 1.6 micron
17 INDEX TO FIGURES ASSEMBLY Figures 1-8 DIE LAYOUT AND IDENTIFICATION Figures 9-11 PHYSICAL DIE STRUCTURES Figures COLOR DRAWING OF DIE STRUCTURE Figure 41 MEMORY CELL Figures GENERAL CIRCUITRY Figure 49 - ii -
18 Mag. 1.3x Mag. 1.3x Mag. 1.2x Figure 1. Package photographs and x-ray view of the Intel Pentium II Processor.
19 Mag. 1.25x Mag. 3x Figure 2. Cavity views of the package.
20 Mag. 30x BONDING TIERS GOLD PLATED LAND GOLD WIRES Mag. 260x GOLD PLATED LAND DOUBLE FOOTPRINT Mag. 1000x GOLD WIRE Figure 3. SEM views of typical wirebonding. 60.
21 ALUMINUM BOND PAD Mag. 410x GOLD WIRE Mag. 500x, 60 DIE COAT DOUBLE FOOTPRINT Mag. 1000x, 60 PAD PUSHOUT DIE COAT Figure 4. Optical and SEM views illustrating bond pad pitch and typical bonds.
22 BOND PASSIVATION Mag. 3500x METAL 4 (BOND PAD) METAL 4 (FROM PAD) METAL 3 Mag. 9000x METAL 2 (TO CIRCUITRY) METAL 1 POLY GATE PAD WINDOW CUTOUT PASSIVATION METAL 4 (BOND PAD) Mag. 10,000x Figure 5. SEM section views of the pad structure.
23 PASSIVATION METAL 4 METAL 4 (FROM PAD) METAL 3 METAL 2 POLY GATE METAL 1 SHALLOW TRENCH OXIDE N+ S/D Figure 6. SEM section views of an I/O structure. Mag. 6000x.
24 Mag. 80x DIE ATTACH BEVEL Mag. 160x DIE ATTACH DIE SURFACE BEVELED EDGE Mag. 350x Figure 7. SEM views of a die corner illustrating dicing and die attach. 60.
25 DIE SURFACE Mag. 800x BEVELED EDGE DIE SURFACE BEVEL Mag. 1600x PASSIVATION METAL 4 METAL 3 Mag. 6500x METAL2 METAL 1 N+ Figure 8. SEM section views of the edge seal structure.
26 Figure 9. Whole die photograph of the Intel Pentium II Processor. Mag 14x.
27 Figure 10. Die identification markings. Mag. 100x.
28 Figure 11. Optical views of die corners. Mag. 225x.
29 PASSIVATION METAL 4 METAL 2 M3 PLUG METAL 3 M2 PLUG POLY GATES M1 PLUG METAL 1 N+ S/D Figure 12. SEM section view illustrating general device structure. Mag. 6500x.
30 PASSIVATION METAL 4 M4 PLUG METAL 3 Mag. 8000x METAL 1 METAL 2 N+ M1 PLUG PASSIVATION METAL 4 M4 PLUG METAL 3 Mag. 8400x METAL 2 POLY GATE METAL 1 M1 PLUG N+ S/D PASSIVATION METAL 4 METAL 3 M3 PLUG Mag. 9000x TRENCH OXIDE M2 PLUG M1 PLUGS METAL 2 METAL 1 N+ Figure 12a. SEM section views illustrating general device structure.
31 METAL 4 ILD 3 METAL 3 METAL 2 ILD 2 METAL 1 ILD 1 POLY GATE M1 PLUGS METAL 4 METAL 3 ILD 3 DELINEATION ARTIFACTS METAL 2 M3 PLUGS M2 PLUG METAL 1 METAL 4 METAL 3 ILD 3 ILD 2 M3 PLUG M2 PLUG ILD 1 METAL 1 POLY TRENCH OXIDE Figure 13. Glass etch section views illustrating general structure. Mag. 9000x.
32 Mag. 2800x Mag. 5700x Figure 14. SEM views of general passivation coverage. 60.
33 PASSIVATION METAL 4 Mag. 10,000x METAL 3 METAL 2 PASSIVATION Mag. 13,000x METAL 4 ILD 3 PASSIVATION ALUMINUM 4 Mag. 26,000x Ti BARRIER Figure 15. SEM section views of metal 4 line profiles.
34 Figure 16. Topological SEM view of metal 4 patterning. Mag. 3700x, 0. Mag. 3700x Mag. 7400x Figure 17. SEM views of general metal 4 coverage. 50.
35 PASSIVATION METAL 4 Mag. 20,000x ILD 3 M4 PLUG METAL 3 STUB PASSIVATION METAL 4 M4 PLUGS Mag. 15,000x METAL 3 ALUMINUM 4 Ti BARRIER VOIDS W PLUG Mag. 35,000x STUB METAL 3 Figure 18. SEM section views of metal 4-to-metal 3 vias.
36 VOIDS METAL 3 M4 PLUGS Mag. 25,000x VOID W PLUG METAL 3 Mag. 35,000x Figure 19. SEM section views of metal 4 plugs. 55.
37 ILD 3 METAL 3 ILD 2 METAL 2 Mag. 20,000x ILD 3 TiN CAP DELINEATION ARTIFACT ALUMINUM 3 Mag. 26,000x Figure 20. SEM section views of metal 3 line profiles.
38 METAL 3 VIAS (M3-M2) Mag. 6000x METAL 3 VIAS (M3-M2) Mag. 8000x Figure 21. Topological SEM views of metal 3 patterning. 0.
39 Mag. 9000x METAL 3 Mag. 30,000x W PLUG METAL 2 TiN CAP ALUMINUM 3 Mag. 34,000x W PLUG METAL 2 Figure 22. SEM views of metal 3 coverage. 55.
40 VOIDS METAL 2 M3 PLUGS Mag. 27,000x VOID W PLUG METAL 2 Mag. 35,000x Figure 23. SEM views of metal 3 plugs. 50.
41 METAL 3 VOID VOID Mag. 20,000x M3 PLUGS METAL 2 TiN CAP ALUMINUM 3 VOID Mag. 40,000x W PLUG METAL 2 STUB METAL 3 M3 PLUG Mag 30,000x ILD 2 METAL 2 Figure 24. SEM section views of metal 3-to-metal 2 vias.
42 METAL 3 ILD 2 METAL 2 Mag. 20,000x ILD 2 TiN CAP DELINEATION ARTIFACT ALUMINUM 2 ILD 1 Mag. 26,000x Figure 25. SEM section views of metal 2 line profiles.
43 METAL 2 PLUG (M3-M2) Mag. 7000x METAL 2 VIA (M2-M1) Mag. 8000x Figure 26. Topological SEM views of metal 2 patterning. 0.
44 Mag. 12,500x METAL 2 Mag. 26,000x M2 PLUGS METAL 1 TiN CAP ALUMINUM 2 Mag. 35,000x W PLUG METAL 1 Figure 27. SEM views of general metal 2 coverage. 55.
45 METAL 3 M3 PLUG STUB METAL 2 M2 PLUG METAL 1 STUB Mag. 22,000x METAL 2 ILD 1 STUB METAL 1 Mag. 35,000x Figure 28. SEM section views of metal 2-to-metal 1 vias.
46 METAL 1 ILD 1 PRE-METAL DIELECTRIC Mag. 26,000x ILD 1 TiN CAP ALUMINUM 1 Mag. 52,000x Figure 29. SEM section views of metal 1 line profiles.
47 METAL 1 PLUGS (M2-M1) PLUG (M2-M1) METAL 1 CONTACTS Figure 30. Topological SEM views of metal 1 patterning. Mag. 7000x, 0.
48 METAL 1 Mag. 9000x Mag. 13,500x Figure 31. SEM views of general metal 1 coverage. 55.
49 M1 PLUG M1 PLUG POLY Mag. 25,000x W PLUG POLY W PLUG DIFFUSION Mag. 40,000x Figure 32. SEM views of metal 1 plugs. 50.
50 M3 PLUG M2 PLUG Mag. 13,000x METAL 1 M1 PLUG N+ POLY M2 PLUG METAL 1 Mag. 30,000x M1 PLUG POLY TRENCH OXIDE N+ ILD 1 METAL 1 PRE-METAL DIELECTRIC M1 PLUG Mag. 30,000x POLY TRENCH OXIDE N+ Figure 33. SEM section views of metal 1 contacts.
51 POLY GATES P+ N+ Mag. 5000x POLY GATES Mag. 6500x N+ P+ Mag. 7000x POLY Figure 34. Topological SEM view of poly patterning. 0.
52 POLY Mag. 8400x TRENCH OXIDE DIFFUSION POLY Mag. 10,000x POLY GATE POLY GATE Mag. 32,000x DIFFUSION Figure 35. Perspective SEM views of poly coverage. 55.
53 METAL 2 ILD 1 METAL 1 M1 PLUG POLY GATES Mag. 13,000x N+ S/D METAL 1 M1 PLUG PRE-METAL DIELECTRIC Mag. 26,000x POLY GATE N+ S/D POLY GATE M1 PLUG Mag. 52,000x N+ S/D GATE OXIDE Figure 36. SEM section views of N-channel transistors.
54 POLY GATE P+ S/D GATE OXIDE Ti SILICIDE NITRIDE SIDEWALL SPACER POLY Ti SALICIDE glass etch Figure 37. SEM section views of P-channel transistors. Mag. 52,000x.
55 METAL 2 M1 PLUG METAL 1 Mag. 13,000x TRENCH OXIDE N+ S/D METAL 1 POLY M1 PLUG Mag. 26,000x TRENCH OXIDE N+ S/D M1 PLUG POLY Mag. 52,000x TRENCH OXIDE N+ S/D GATE OXIDE Figure 38. SEM section view of unique transistor structure.
56 SUBSTRATE (DIFFUSION) TRENCH OXIDE Mag. 10,000x, 55 Mag. 15,000x TRENCH OXIDE DIFFUSIONS Mag. 30,000x TRENCH OXIDE N+ DIFFUSION Figure 39. SEM views illustrating anti-dishing patterns.
57 POLY Mag. 50,000x TRENCH OXIDE GATE OXIDE POLY Mag. 50,000x TRENCH OXIDE GATE OXIDE Mag. 800x P-EPI N-WELL P SUBSTRATE Figure 40. Section views illustrating trench oxide and well structure.
58 METAL 4 PLUG 4 PASSIVATION INTERLEVEL DIELECTRIC 3 INTERLEVEL DIELECTRIC 2 INTERLEVEL DIELECTRIC 1 PRE-METAL GLASS Intel Pentium II Processor METAL 3 PLUG 3 METAL 2 PLUG 2 METAL 1,,,,,,,, TRENCH OXIDE N-WELL POLY SILICIDE PLUG 1 P+ S/D P SUBSTRATE P-WELL SILICIDE N+ S/D Orange = Nitride, Blue = Metal, Yellow = Oxide, Green = Poly, Red = Diffusion, and Gray = Substrate Figure 41. Color cross section drawing illustrating device structure. P-EPI
59 GND PIGGYBACK WORD LINE V CC PIGGYBACK CONNECTION GND V CC Intel Pentium II Processor BIT LINE BIT LINE metal 3 V CC metal 2 BIT LINE CONTACTS PIGGYBACK WORD LINES metal 1 GND Figure 42. Topological SEM views of Cache SRAM cells illustrating piggyback word line connections. Mag. 6000x, 0. poly POLY WORD LINES
60 GND V CC metal 1 P-WELL N-WELL P-WELL poly Figure 43. Topological SEM views of the Cache SRAM array. Mag. 5000x, 0.
61 PIGGYBACK WORD LINES GND GND BIT LINE Intel Pentium II Processor V CC BIT LINE metal 3 metal 2 POLY WORD LINES V CC GND metal 1 poly Figure 44. Perspective SEM views of the Cache SRAM array. Mag. 7400x, 55.
62 BIT CONTACTS GND V CC metal 1 POLY WORD LINE N-CHANNEL DEVICES P-CHANNEL DEVICES delayered Figure 45. Detail SEM views of Cache SRAM cells. Mag. 14,000x, 55.
63 BIT GND V CC metal 1 BIT BIT GND GND V CC delayered 6 4 BIT 2 WORD 3 4 BIT 1 2 BIT 5 6 Figure 46. Topological SEM views and schematic of a Cache SRAM cell. Mag. 15,000x, 0.
64 METAL 4 METAL 3 Mag. 9000x METAL 1 POLY WORD LINES N+ S/D BIT LINE CONTACT METAL 1 Mag. 13,000x P+ N+ S/D POLY SELECT GATE M1 PLUG Mag. 52,000x N+ S/D GATE OXIDE N+ S/D Figure 47. SEM section views of a Cache SRAM cell (perpendicular to word lines).
65 METAL 4 METAL 3 Mag. 9000x POLY WORD LINES POLY METAL 2 METAL 2 POLY WORD LINES Mag. 15,000x POLY TRENCH OXIDE TRENCH OXIDE METAL 1 POLY WORD LINE Mag. 26,000x TRENCH OXIDE N-CHANNEL DEVICES P-CHANNEL DEVICES Figure 48. SEM section views of a Cache SRAM cell (parallel to storage and pull-up transistors).
66 Mag. 410x NON-CONNECTED VIAS Mag. 1015x Figure 49. Optical views of general circuit layout.
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