High performance components from Gencoa for Research and Development Simply better tools to build your devices

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2 High performance components from Gencoa for Research and Development Simply better tools to build your devices

3 With the range of Gencoa advanced thin film development tools at your disposal your research investment can reach its full potential Transmission Electron Microscopy on an Fe/Si multilayer (photo courtesy of EPFL) Daresbury Lab.

4 Gencoa offer the following catagories of products for thin film Research & Development Circular Magnetrons Planar Magnetrons Rotatable Magnetrons Plasma Sources Reactive Gas Control

5 Magnetic options for Gencoa Circular magnetrons Unrivalled in the market, unique products BP φ Standard 2 pole (SW/PP) VT variable High Yield HY HY HU High Uniformity MRS - Multi-ring static FFE Hybrid FFE Magnetic Materials Magnetic packs available for circular range 2, 3 4, 6, 8, 10, 12, 14 & 16

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7 Gencoa circular Magnetrons have a wide range of accessories Such as head tilt and shutters

8 Let Gencoa create the design you need Choose from the range of mechanical options below Standard internal mounting on a shaft 25mm-80mm OD or KF / CF port connection Vacuum wall feed through for sliding / clamping of shaft mounted version incorporates linear bearing for large versions External mounting with or without integral anode (with anode standard) Argon gas injection over target from single connection point which exits the cathode with the water and power connections (i.e. at atmosphere) Sputter chimney facility to aid gas separation and low pressure sputtering and prevent cross contamination Precision and easy tilting of the magnetron head by unique plunger adjustment Optionally electrically floating or biased anodes for reactive dielectric deposition - pulsed DC or AC Plasma fibre optic link for reactive gas control of process A wide variety of shutters: manual, electro-pneumatic, sliding, tilting, sliding & tilting combined, split blades for confined spaces, electrically floating

9 Gencoa circular magnetron mounting can be adapted to suit every need Gencoa have 5 design engineers Creo (ProE) 3D CAD

10 Gencoa gas injection avoid passing gas between anode and cathode Injected within the anode to exit at target surface A single atmosphere side gas connection point to uniform injection over the target surface. Avoids passing gas between anode and cathode to avoid side plasma s.

11 Gencoa High Yield (HY) and High Uniformity (HU) magnetic arrays Available on 150mm (6 ) targets or larger Gencoa s unique target clamping and anode design allows sputtering to the target edge for higher target use and greater cleanliness High Yield type magnetic arrays will deliver 40-50% target use High Uniformity magnetics optimize the uniformity on the substrate (multi-ring plasma) DC, RF and Hipims power connections Water cooled and biased anodes

12 Gencoa ffe Full Face Erosion magnetrons for reduced defects Dynamic plasma movement for 75mm (3 ) and larger ffe75 ffe75 ffe100 ffe75 ffe100 ffe for clean target sputtering High target use Fewer arcs and coating defects ffe75

13 Gencoa ffe Magnetrons internal or external mounts All circular range options available including tilt ffe100 ffe200 ffe75 Ideal for high cost and compound targets, Hipims processes, reactive gas processes, defect free layers.

14 Gencoa V tech Magnetrons for magnetic field property control Changes the field strength, balanced / unbalance VT75UHV Ideal for defining the optimum magnetic field and plasma properties for your process.

15 V tech type magnetrons for plasma adjustments Easy adjustment of the field even during the process

16 V tech type magnetrons work by changing the position of the inner and outer magnets This relative movement creates large field changes VT150 fully unbalanced position 73.5mm VT150 fully balanced position 127mm VT75UHV VT150 middle balanced position 111mm

17 V tech type magnetrons for plasma adjustments Illustration of field changes for a VT150

18 Small rectangular sources for R&D with the option of V tech fully adjustable magnetics

19 Small rectangular sources for R&D with variable target to substrate separation

20 V tech type fully variable magnetics, varies field strength, shape and balance/unbalance Can be used with DC, pulsed DC, AC & RF power modes. Manual or stepper motor controlled with touch screen HMI.

21 Gencoa Rectangular Magnetrons for Research and Development A variety of customized mounting styles

22 Gencoa IM75 plasma source for Research and Development A multi-functional plasma beam A powerful new tool for thin film research. Fits into the space of a typical magnetron and has head tilt adjustment. Self neutralized plasma - no substrate surface charging. Variable plasma energy. Automatic gas feedback control via the IM300 power supply (any gas). Robust design with no maintenance. Can replace RF substrate etching. Multiple uses - ion assistance, patterning, pre-cleaning, coating stripping, PECVD

23 Gencoa IM75 plasma source for flexible Research and Development No research tool should be without them Based upon the inverted magnetron principle. True plasma source for beam neutrality. DC power technology for low cost of ownership. Graphite anode and cathode to avoid etching and maintenance. Beam voltage and current can be adjusted, as can the gas type or mixture. Gas regulation via automatic feedback control from within the IM300 power supply

24 Gencoa provide a unique customer built power supply that automatically regulates the gas flow for ease of operation Output voltage Up to 2500V ( 3000V ignition voltage ) Output current 300 ma Output Power 2000V Output polarity Positive Regulation Mode Current 0-0.3A Output connector Fischer, type 105, 10kV rating for RG213 coax cable Dimensions Standard Rack 19 3U Weight 8kg Cooling Forced air cooling Working temperature C

25 Schematic of the ion source with power supply and automatic gas regulation Removes beam variation I & V regulated Chamber IM-300- BDS-VT Power Cable MFC cable (for MKS's MFC), D9- D15 Shielded GENCOA I M75 Power Supply MKS MFC Pump Gas MFC Spec: MKS 1179A Db15 ±15V

26 IM600 at 300mA - gas Ar - Example of voltage tracking feature via auto control of gas

27 Gencoa Rotatable Magnetrons for Research & Development End Block Target Dia Target Length Power Capacity Gencoa GRS mm 2m 80 kw Gencoa GRS-C mm 2m 80 kw SCI MM mm 2.5m 100 kw Anode is at zero height compared to target to reduce coating build-up which reduces defects, arc s and prevents electrical shorts caused by flaking from the anode SCI MC mm 2m 4m 200 kw Low profile anode below target surface

28 Gencoa Rotatable System (GRS) has a number of advantages for web Low defects and high reliability less arcing due to clean target surface Better reactive oxide layers via clean targets and AC or bipolar DC power modes Represents the production environment easy scale-up for successful processes Ultimate flexibility same GRS can perform multiple process types by switching magnetic arrays: coating when compared to planar magnetrons DC, AC, RF & RF/DC sputter processes PECVD processes ARC processes Hipims processes GenSys75-400mm long with standard type DLIM magnetics and 16kW AC oxygen plasma

29 Gencoa Rotatable System (GRS) is an ultra-compact rotatable magnetron that increases the number of targets within a chamber The small size of the GRS allows more targets to occupy the space which means development tools can be as compact and low cost as possible. As and example a dual GRS75 can replace a single 125mm target width planar. GenSys75-400mm long with standard type DLIM magnetics and 16kW AC oxygen plasma

30 Gencoa have developed a wide range of magnet bar options for the GRS75 magnetrons in order to control the plasma better Gencoa Rotatable Magnet Bar Products GRS75 LS Low strength RF Radio frequency SSF Standard Strength HS High Strength PP-RT Unbalanced ion assist processes TCO Transparent conduction oxide films LH/Web Single cathode with lower heating of substrate DLIM For better dual cathode AC discharges DLIM-DC-TCO Single anode shared between 2 cathodes for TCO Applications Low strength for higher voltage sputtering Strength optimized for RF power modes with active anode Standard field strength of 410 Gauss over the target with balanced field design Higher field strength of 730 Gauss over the target with balanced field design Single and multi-cathode unbalanced magnetic designs for high levels of ion assistance for deco and hard coatings Single cathode magnetics with active anode for reduced resistivity TCO layers for DC and DC pulsed operation (patented) Single cathode magnetics with active anode for reduced heat loads during vacuum web coating for DC and DC pulsed operation (patented) Double cathode Low Impedance Magnetics for high rate reactive deposition of oxides with lower substrate heating and plasma interference (patented) Double cathode low TCO resistivity magnetics for DC powered double magnetrons with an additional active anode (patented) Component parts supplied Magnet pack Active magnetically guided anode

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32 Example of low substrate deposition temperature at high deposition rates from GRS75 rotatable dual magnetrons Rotatable magnetic configuration to minimize the substrate temperature for effective metallizing of temperature sensitive substrates and devices.

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34 Process Control Loop Demanded plasma intensity etc Controller Voltage Out Actuator Gas Flow Process (Speedflo) (MFC) (Reactive Sputtering) Voltage In Sensor (PEM, Lambda etc) Plasma intensity etc

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36 Cost of ownership of reactive feedback elements Line speed increase x 3-5 Return on Speedflo (reactive controller) investment < 30 days

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39 P.E.M requires the light signal from the plasma to be transmitted Gencoa have a range of optical components

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42 Speedflo spectrometer based sensor displays the full plasma spectrum information Up to 4 different wavelengths can be combined

43 Reactive deposition A ready made solution Large area reactive sputtering 30 years old Mature processing products available Reactive sputtering in the high rate metal mode is highly unstable process so appropriate process control the critical factor Gencoa have implemented reactive process control over many different production plants with > 3m glass sizes More than 600 Speedflo systems controlling reactive production plants around the world Gencoa can set-up the process control on-site or connect remotely to the Speedflo box

44 The data processing in the Speedflo box (not PC) for high speed robust operation Digital software drive process controller Typical closed loop feedback times of 5-20 msec from signal receipt to gas delivery in the target area.

45 Different sensor control modes possible for collecting the signal from the process Penning-PEM O 2 gas Lambda Target V Process-PEM

46 Example of reactive gas control for Al2O3 on web for ultra-barrier applications

47 Two simulation tools have been designed to offer a virtual experience of tuning and operating the Speedflo control system. The aim being to interactively teach the skills required for faster and more effective control system tuning and commissioning. The basic version teaches tuning the algorithm and the advanced tools includes other parameter variables Gencoa Speedflo Simulator & process tuning aids

48 Gencoa Speedflo Auto-tuner The tuning of reactive sputtering process requires some time and experience in order to determine the best tuning parameters for a specific process. To a large degree the process is trial and error input different parameters and observe the process response. To simplify this process Gencoa have developed an advanced process tuning capability within the Speedflo controller. By selecting this feature the tuner will control the plasma and find the best parameters. Signals (%) PEM (Al) Autotuned MFC (O2) Autotuned Setpoint PEM (Al) Default MFC (O2) Default Time (s)

49 Gencoa Key Advantages for Research & Development GENCOA have spent 17 years perfecting devices for thin film research to provide the best process solutions combined with highly robust components:

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