1 On the evolution of InAs thin films grown by molecular beam epitaxy on the GaAs(0 0 1) surface vorgelegt von Diplom-Physiker Jan Grabowski aus Güstrow Von der Fakultät II Mathematik und Naturwissenschaften der Technischen Universität Berlin zur Erlangung des akademischen Grades Doktor der Naturwissenschaften Dr. rer. nat. genehmigte Dissertation Promotionsausschuss: Vorsitzender: Prof. Dr. rer. nat. Michael Lehmann Berichter: Prof. Dr. rer. nat. Mario Dähne Berichter: Dr. rer. nat. Lutz Geelhaar Tag der wissenschaftlichen Aussprache: 14. Dezember 2010 Berlin 2010 D 83
3 Der Beginn aller Wissenschaften ist das Erstaunen, dass die Dinge sind, wie sie sind. Aristoteles
4 Zusammenfassung Halbleiternanostrukturen sind zurzeit von großem Interesse für weitreichende Anwendungen in der Elektronik und Optoelektronik. Viele dieser Bauteile, insbesondere für die optische Datenübertragung im Bereich großer Wellenlängen, die von grundlegender Bedeutung in der modernen Kommunikationstechnik ist, basieren auf InAs/GaAs-Quantenpunktstrukturen (QD). Auch wenn die Eigenschaften der InAs/GaAs-QDs bereits intensiv untersucht wurden, so ist doch immer noch nur sehr wenig über die Benetzungsschicht (WL) bekannt. Im Rahmen dieser Arbeit wurde der Verlauf der Entstehung dieses InAs-WL im Detail untersucht. Dazu wurden mittels Molekularstrahlepitaxie (MBE) dünne InAs-Schichten im Bereich einer Monolage (ML) auf die GaAs(0 0 1) Oberfläche aufgedampft und anschließend mit reflektiver hochenergetischer Elektronenbeugung (RHEED) und insbesondere mit der Rastertunnelmikroskopie (STM) untersucht. Die dünnen InAs Schichten wurden in den beiden typischen Wachstumsbereichen gewachsen, auf der GaAs-c(4 4) und der GaAs-β2(2 4) rekonstruierten Oberfläche, mit variabler Schichtdicke von Submonolagen mit 0,09 ML InAs bis zu 1,65 ML InAs, bei der die kritische Schichtdicke für das QD-Wachstum überschritten wird. Dabei wurden drei grundsätzliche Wachstumsphasen entdeckt. Bei niedrigen InAs-Bedeckungen adsorbiert das Indium bevorzugt an energetisch günstigen Positionen auf der Oberfläche in Ansammlungen von durchschnittlich acht Indiumatomen. In den STM-Aufnahmen erscheinen diese Ansammlungen als deutliche helle Signaturen. Es werden ein Strukturentwicklungsmodell vorgestellt und die elektronischen Eigenschaften sowie die Gitterverspannung diskutiert. Bei einer InAs-Bedeckung von 0,67 ML transformiert die ursprüngliche Oberfläche in eine (4 3) rekonstruierte In 2/3 Ga 1/3 As-ML und deren detaillierte Struktur und Verspannungseigenschaften werden aufgezeigt. Weiter aufgedampftes InAs bildet dann eine zweite Lage auf der InGaAs-ML, gekennzeichnet durch eine typische zick-zack Anordnung von (2 4) rekonstruierten Einheitszellen, die eine abwechselnde α2/α2-m Konfiguration besitzen. Im Gegensatz zu den vorherigen Oberflächenrekonstruktionen, bei denen die strukturelle Gitterverspannung effizient abgebaut werden kann, staut sich in dieser zweiten (2 4) rekonstruierten Schicht mit dem weiteren Einbau von Indiumatomen eine kompressive Gitterverspannung an. Wenn diese zweite Schicht vervollständigt ist, beinhaltet der resultierende doppelschichtige WL eine Gesamtmenge von 1,42 ML InAs. An diesem Punkt führt die angestaute Gitterverspannung zum Stranski - Krastanow (SK) Wachstumsübergang vom zweidimensionalen zum dreidimensionalen Wachstum, und weiteres aufgewachsenes InAs sammelt sich in typischen dreidimensionalen Inseln, den QDs. Darüber hinaus führt die Gitterverspannung im WL zur Verlagerung von Material aus dem WL in die QDs. Dieser Reifungsprozess, letztendlich auch auf Kosten von Teilen des WL, kann eingeschränkt werden, wenn das Substrat direkt nach dem Wachstum sehr schnell abgekühlt wird (quenching).
5 Abstract Semiconductor nanostructures are currently of high interest for a wide variety of electronic and optoelectronic applications. A large number of devices, in particular for the optical data transmission in the long-wavelength range, essential in modern communication, are based on InAs/GaAs quantum dot (QD) structures. Though the properties of the InAs/GaAs QDs have been extensively studied, only little is known about the formation and structure of the wetting layer (WL) yet. In the present work, the pathway of the InAs WL evolution is studied in detail. For this purpose, InAs thin films in the range of one monolayer (ML) are deposited on the GaAs(0 0 1) surface by molecular beam epitaxy (MBE) and studied by reflection high energy electron diffraction (RHEED) and in particular by scanning tunneling microscopy (STM). The InAs thin films are grown in both typical growth regimes, on the GaAs-c(4 4) and the GaAs-β2(2 4) reconstructed surface, in a variety of thicknesses starting from submonolayers with 0.09 ML of InAs up to 1.65 ML of InAs exceeding the critical thickness for QD growth. In principle, three growth stages are found. At low InAs coverages, the indium adsorbs in agglomerations of typically eight In atoms at energetically preferable surface sites. In the STM images, the signatures of these In agglomerations appear with a clear bright contrast. A structural model for the initial formation of these signatures is presented, and its electronic and strain related properties are discussed. At an InAs coverage of about 0.67 ML the initial surface transforms into a (4 3) reconstructed In 2/3 Ga 1/3 As ML and the detailed structure and strain properties of this surface are unraveled. On top of the InGaAs ML further deposited InAs forms a second layer, characterized by a typical zig-zag alignment of (2 4) reconstructed unit cells, with an alternating α2/α2-m configuration. In contrast to the previous surface reconstructions, where structural strain is sufficiently reduced, this second (2 4) reconstructed InAs layer accumulates unfavorable amounts of compressive strain from the InAs incorporation. With a fully evolved second layer the complete two-layer WL contains a total amount of 1.42 ML of InAs. At this point, the accumulated amount of strain induces the Stranski - Krastanow (SK) growth transition from two-dimensional to three-dimensional growth, and further deposited InAs accumulates in typical three-dimensional islands, the QDs. Moreover, the unfavorable strain in the WL leads to a relocation of InAs material from the WL into the QDs. This QD ripening, eventually at the account of parts of the WL, can be reduced by rapid quenching of the substrate immediately after growth.
7 List of publications Parts of this work have been published in: Evolution of the InAs wetting layer on GaAs(001)-c(4 4) on the atomic scale, J. Grabowski, C. Prohl, B. Höpfner, M. Dähne, and H. Eisele, Appl. Phys. Lett. 95, (2009) Atomic structure of the (4 3) reconstructed InGaAs monolayer on GaAs(001), H. Eisele, B. Höpfner, C. Prohl, J. Grabowski, and M. Dähne, Surf. Sci. 604, 283 (2010) Atomic structure and strain of the InAs wetting layer growing on GaAs(001)-c(4 4), C. Prohl, B. Höpfner, J. Grabowski, M. Dähne, and H. Eisele, J. Vac. Sci. Technol. B 28, C5E13 (2010) Further publications: Low Budget UHV STM Built by Physics Students for Use in a Laboratory Exercises Course, R. Timm, H. Eisele, A. Lenz, S. K. Becker, J. Grabowski, T.-Y. Kim, L. Müller-Kirsch, K. Pötschke, U. W. Pohl, D. Bimberg, and M. Dähne, AIP Conf. Proc. 696, 216 (2003) Structure and intermixing of GaSb/GaAs quantum dots, R. Timm, H. Eisele, A. Lenz, S.K. Becker, J. Grabowski, T.-Y. Kim, L. Müller-Kirsch, K. Pötschke, U.W. Pohl, D. Bimberg, and M. Dähne, Appl. Phys. Lett. 85, 5890 (2004) Formation and atomic structure of GaSb nanostructures in GaAs studied by cross-sectional scanning tunnelling microscopy, R. Timm, J. Grabowski, H. Eisele, A. Lenz, S.K. Becker, L. Müller-Kirsch, K. Pötschke, U.W. Pohl, D. Bimberg, and M. Dähne, Physica E 26, 231 (2005) A cross-sectional scanning tunneling microscopy study of GaSb/GaAs nanostructures, R. Timm, A. Lenz, J. Grabowski, H. Eisele, and M. Dähne, Springer Proceedings in Physics 107, 479 (2005) Formation and Atomic Structure of GaSb Quantum Dots in GaAs Studied by Cross-Sectional Scanning Tunneling Microscopy, R. Timm, A. Lenz, J. Grabowski, H. Eisele, K. Pötschke, U.W. Pohl, D. Bimberg, and M. Dähne, in: Proceedings of EW-MOVPE XI, ed. by E. Kapon and A. Rudra (Lausanne 2005), p. 39
9 Acknowledgments In the very beginning, I would like to express my gratitude to the many people, who contributed to these studies and to the completion of this work. First of all, my sincere thanks belong to Prof. Dr. Mario Dähne, who gave me this great opportunity to explore challenging fields of science, to study and research freely in his group, and to complete my work in writing this thesis. I would like to further thank Dr. Lutz Geelhaar for his interest in my work and his willingness to referee this thesis, and Prof. Dr. Michael Lehmann for his willingness to chair the final discussion. Sincere thanks go to Prof. Dr. Karl Jacobi, who kindly provided the experimental setup for this study, and certainly to Dr. Yevgeniy Temko, who introduced me to the mysteries of MBE and this setup in particular, and who teached me essential know-how of conducting growth experiments using this setup. Spasibo bolьxoe. Special thanks belong to Peter Geng, who gave me a helping hand dealing with many technical issues especially during the early days of my studies. Furthermore, my sincere thanks go to Kathrin Schatke for her supportive assistance in dealing with all the different kinds of harmful and hazardous substances and for many pieces of advice. I am very thankful to my former students and co-workers Sylvia Hagedorn, Britta Höpfner, and Christopher Prohl for their great contributions to this work. Thank you for your assistance during experiments and also repair, for fruitful discussions and a nice working environment, and for your effort in establishing our small MBE-STM-Team here. I would also like to acknowledge Dr. Holger Eisele for his scientific contributions. Many thanks belong to the former and present members of the Dähne working group, who created a nice and friendly atmosphere and whom I enjoyed sharing time with. My special thanks go to Dr. Rainer Timm and Dr. Andrea Lenz, who introduced me to the STM technique, provided continuous support during my first STM steps and shared their knowledge with me. I would like to thank Martin Franz, Dr. Kai Hodeck, Angela Berner and Gerd Pruskil for many nice discussions and a great time. I would like to express my special thanks to Prof. Dr. Hans-Eckhardt Gumlich for his motivation and kindness and exceptionally for initiating great discussions about the ethics and philosophy of science. My deepest thanks belong to Dr. Lena Ivanova and Dr. Martina Wanke for so many great years of working together. Thank you for your support and for becoming such great friends. Schlußendlich möchte ich mich auch bei meinen Freunden und meiner Familie bedanken. Ich danke Anja Brostowski und Tai-Yang Kim, die mich durchs Studium begleitet haben, und dabei halfen, so manche Durststrecke zu überstehen. Ich danke allen meinen Freunden, die schon viel Rücksicht auf mich und meine Arbeit nehmen mußten und trotzdem immer noch geduldig mit mir sind und hinter mir stehen. Ein ganz besonderer Dank aber gilt meiner Familie für das Interesse an meiner Arbeit und die Unterstützung über die vielen Jahre meines Studiums und meiner wissenschaftlichen Arbeit. Vielen lieben Dank!
11 11 Contents 1. Introduction 15 Part I. Theoretical and experimental background 2. Semiconductor surfaces properties and growth Gallium arsenide a III/V semiconductor The electron counting rule The GaAs(0 0 1) surface The GaAs(0 0 1)-c(4 4) surface reconstruction The GaAs(0 0 1)-β2(2 4) surface reconstruction Semiconductor nanostructures Epitaxial growth Stranski - Krastanow growth of InAs/GaAs quantum dots Molecular beam epitaxy (MBE) Ultra high vacuum (UHV) Evaporation Theory of evaporation Knudsen cells Material distribution Material flux Beam equivalent pressure Surface growth mechanisms Reflection high energy electron diffraction (RHEED) Formation of diffraction patterns Growth control Scanning tunneling microscopy (STM) The STM principle Surface imaging Modes of operation Contrast mechanisms
12 12 Contents 5. Experimental setup The UHV chamber system setup The MBE setup The STM setup The setup for preparation and further analysis Sample storage and handling Preparation of the experimental setup Preparation of the STM tips Preparation of the sample substrate Calibration of the sample temperature Part II. Results and discussion 6. Homoepitaxial growth on GaAs(0 0 1) Introduction Experimental details Sample preparation Determination of the growth rate The GaAs(0 0 1)-c(4 4) reconstructed surface Sample growth parameters STM results Summary The GaAs(0 0 1)-β2(2 4) reconstructed surface Sample growth parameters STM results Summary InAs thin film growth on GaAs(0 0 1)-c(4 4) Introduction Experimental details Sample preparation Determination of the growth rate InAs thin films at submonolayer coverages Sample growth parameters STM results Discussion: Formation and structure of the InAs signatures Summary InAs thin films at coverages close to one monolayer Sample growth parameters STM results
13 Contents Discussion: Formation and structure of the In 2/3 Ga 1/3 As monolayer Discussion: Formation and structure of the InAs islands on top of the In 2/3 Ga 1/3 As monolayer Summary InAs thin films during quantum dot growth Sample growth parameters STM results Discussion: The InGaAs/InAs wetting layer during quantum dot formation Summary Strain effects during the evolution of the InAs wetting layer Strain at the GaAs(0 0 1)-c(4 4) surface Strain related to the InAs signatures on the GaAs-c(4 4) surface Strain at the In 2/3 Ga 1/3 As-(4 3) reconstructed monolayer Strain at the InAs-(2 4) reconstructed second layer Strain during quantum dot formation Summary InAs thin film growth on GaAs(0 0 1)-β2(2 4) Introduction Experimental details Sample preparation Estimation of the growth rate InAs thin films on GaAs(0 0 1)-β2(2 4) Sample growth parameters STM results Discussion Summary Conclusion 129 Appendix 133 A. Data of the beam equivalent pressure (BEP) B. Determination of the deposited InAs coverage C. Sample heating data List of Abbreviations 145 Bibliography 147
14 14 Contents
15 15 1. Introduction In the 20 th century, the ongoing industrialization with its growing need for advanced technology has become a strong motor for scientific progress in many fields. Yet, among all those fields, the fast evolving information and communication technology probably has branded this century most . Its electronic devices have become so essential for everyday life, a world without seems hardly imaginable. In retrospective, the introduction of the semiconductor-based transistor in 1948  may be considered the starting point of this technological development and of the semiconductor industry. Semiconductors soon became the key material for electronic and optoelectronic applications, for their compounds are versatilely tunable in electronic and structural properties to meet many applicational needs . Since then, there has been an ongoing progress to further improve the efficiency of such devices, while decreasing their size concurrently. Computers that once filled whole rooms now fit the palm of one s hand. Undoubtedly, this process of miniaturization eventually facilitated the broad acceptance of electronics in everyday life and fundamentally changed the way we live. However, the ongoing ambition to further minimize the size of electronics has also created novel challenges to modern physics in recent decades . On the nanoscale, quantum effects that were negligible before, now become dominating the electronic properties of such devices . Lateral confinement of charge carriers causes the quantization of energy states, leading to a complete discretization when charge carriers are localized in all three dimensions [6,7]. In such a quantum dot (QD) the occupation of only certain energy levels is allowed, comparable to the electronic structure of a single atom . Low-dimensional semiconductor structures (LDS) were predicted to be promising for novel applications, as low-threshold laser diodes [9 12], high-speed transistors , single photon detectors/emitters  or quantum memories [15, 16]. An important step towards the systematic usage of quantum effects by manipulating matter on the nanoscale is marked by the discovery of self-organization mechanisms in epitaxial growth of lattice mismatched compound semiconductor material systems in 1985 . Basic material for most optoelectronic nanostructure applications are III/V compound semiconductors. Their energy band gap can be tuned by adapting the chemical composition of the alloy [18, 19] which allows, e.g., the adjustment of the light emission wavelength . Likewise the lattice constant of the crystal structure is tunable to some ex-
16 16 1. Introduction tent [21, 22]. Although many material compositions have been investigated for their structural and electronic properties, only some are yet used commercially. Among those, the indium arsenide/gallium arsenide (InAs/GaAs) material system is currently one of the technologically most important. Low-dimensional InAs/GaAs nanostructures, e.g. QDs, are currently of high interest for the use in ultra-fast electronics , storage devices  and in particular in optoelectronic applications, especially for optical data transmission in the long-wavelength range [25 29]. Recently, also InAs/GaAs QD precursors, so-called submonolayer quantum dots have come into focus for the use in high power disk lasers , infrared photo detectors , as well as very fast light emitters for optical chip-to-chip connections [32 34]. Thus, the InAs/GaAs QD system has been studied extensively in the recent years. It is well established that the quantum dots form in the Stranski - Krastanow growth mode [8, 35, 36] and their size and shape have been investigated in detail [37 43]. However, detailed knowledge about the evolution of an InAs monolayer (ML) before the transition from twodimensional growth to three-dimensional growth (2D 3D transition) is still missing . On the other hand, information on the atomic structure and the strain induced formation principles of the intermixed InGaAs wetting layer (WL) is fundamental for the detailed understanding of QD growth and even more for the formation of submonolayer QDs. Moreover, the atomic ordering in the WL creates a strain profile at the surface, affecting the adsorption of further deposited material and influencing its crystal structure and its optoelectronic properties . In this work, the evolution of the InAs/GaAs wetting layer from the bare GaAs(0 0 1) surface to the critical thickness of QD formation is investigated on the atomic scale. Increasing amounts of InAs material were deposited on the GaAs(0 0 1) surface by molecular beam epitaxy (MBE) and studied in-situ by reflection high electron diffraction (RHEED) and in particular by scanning tunneling microscopy (STM). In the first part of this thesis, a brief introduction on the material system and growth is given in Chapter 2. Chapters 3 and 4 focus on the experimental techniques MBE/RHEED and STM, respectively. Chapter 5 then provides an overview on the experimental setup and the sample preparation. The second part of this thesis is dedicated to the presentation and interpretation of the experimental results. In Chapter 6 the principles of homoepitaxy are introduced and homoepitaxy on both the GaAs(0 0 1)-c(4 4) and the GaAs(0 0 1)-β2(2 4) surface is used to derive basic information on the growth parameters, such as the appropriate V/III ratio and the growth rate or on the calibration of the substrate temperature. In addition, STM images of these well-known surface reconstructions are used to calibrate the STM instrument. Chapter 7 presents the experimental findings on the InAs thin film evolution during InAs growth on the GaAs(0 0 1)-c(4 4) surface from very low submonolayer coverages to the critical thickness for QD growth. The discussion hereby mainly focuses on the formation processes and the structural properties of the different growth stages of the InAs thin film
17 17 and on the effects of structural strain. Chapter 8 presents the experimental findings on the InAs thin film evolution during growth on the GaAs(0 0 1)-β2(2 4) surface. It is shown that the principal growth mechanisms during the InAs thin film evolution are similar in both growth regimes. Finally, Chapter 9 summarizes the fundamental conclusions that could be drawn from the presented findings and gives an outlook on prospective experiments to unravel further aspects of InAs/GaAs growth.
18 18 1. Introduction
19 19 Part I. Theoretical and experimental background
21 21 2. Semiconductor surfaces properties and growth 2.1. Gallium arsenide a III/V semiconductor Gallium arsenide (GaAs) is a binary semiconductor, and similarly to most III-V materials it crystallizes in the zincblende crystal structure. As the chemical bond between arsenic and gallium atoms is of both ionic and covalent nature, the covalence leads to the formation of sp 3 -hybridized electron orbitals of the bulk atoms. This sp 3 -hybridization is responsible for the tetrahedral alignment of the bulk atoms, characteristic for the zincblende crystal structure. Each atom is thereby equidistantly surrounded by four atoms of the other kind as illustrated in Fig. 2.1 [45, 46]. The energies of the hybridized orbitals from As and Ga atoms are located in the valence band (VB) and the conduction band (CB) of the semiconductor, respectively . If the symmetry of the crystal structure is reduced, e.g. at the surface where the crystal is no longer infinite, the hybridized orbitals cannot form bonds and will remain unsaturated (dangling bonds). This surface structure is commonly referred to as bulk-truncated. These Figure 2.1: The GaAs zincblende bulk crystal structure. The lattice parameter a = nm  is defined as the side length of the cubic unit cell. Gallium atoms are illustrated in blue and arsenic atoms in light gray.
22 22 2. Semiconductor surfaces properties and growth dangling bonds are partly filled with electrons and thus cause additional surface states, which increase the surface energy of the semiconductor . On the GaAs surface this bulk-truncated surface energy can be lowered by an electron transfer from the Ga dangling bonds in the CB to the As dangling bonds in the VB. With a depleted CB and a completely filled VB the semiconductivity at the surface is restored. Naturally, such an electron transfer is only trivial on stoichiometric non-polar surfaces, where the number of group-iii and group-v atoms is equal, e.g. the GaAs(1 1 0) oriented surface [50 52]. Surface Ga atoms would swap from sp 3 -hybridization to sp 2 -hybridization providing the excess electrons to fill the dangling bonds of the As atoms, allowing them to remain in sp 3 -hybridization. The now sp 2 -hybridized Ga atoms finally cause a change in the crystal surface geometry leading to a relaxation of Ga and As atoms, the so-called buckling, as illustrated in Fig. 2.2 [53 55]. Most low-index crystal surfaces, including the GaAs(0 0 1)-surface that was used for the investigations in this work, do not fulfill the stoichiometry criteria for such a simple relaxation and therefore undergo rearrangement processes to form stable reconstructed surfaces that will regain the semiconductivity at the surface as well as minimize the number of dangling bonds. The reconstructed surface thereby usually is the one with least free energy in the kinematically available range of possible reconstructions (see, e.g., ). Yet, as this kinematically available range is highly affected by the ambient conditions such as temperature and vapor pressure, different reconstructions for the same bulk-truncated surface are possible . High-index bulk-truncated surfaces usually transform into reconstructions of small areas of low-index surfaces (facets) or into the terraced reconstruction of a low-index surface with similar orientation (vicinal surfaces). On the other hand, stable high-index GaAs surfaces, such as GaAs(1 1 4) [58, 59] and GaAs(2 5 11) [60, 61], have also been found. Figure 2.2: Side view of the relaxed GaAs(1 1 0) surface. The hybridization transition of the uppermost Ga atoms from sp 3 to sp 2 leads to a retraction of these Ga atoms under the surface plane and thus an outstretching of neighboring surface As atoms. White arrows indicate this so-called buckling. The corresponding filled As dangling bonds are illustrated by gray ovals, empty Ga dangling bonds by white ovals. Smaller circles depict atoms located lower than the figure plane.
23 2.2. The electron counting rule The electron counting rule The complete annihilation of surface charges caused by dangling bonds on the bulktruncated surface is an appropriate criterion for the possible existence of stable surfaces and reconstructions, resulting in the principle of the electron counting rule (ECR). The ECR requires the number of available surface state electrons (i.e. from states that are not of bulk nature) to exactly fill all dangling bond states in the VB, leaving those in the CB completely depleted, in order to restore the surface semiconductivity [47, 55, 62, 63]. For III-V semiconductors in zincblende structure, such as GaAs, each atom has covalent bonds to four tetrahedrally aligned atoms of the other kind. Each bond is filled with two electrons of which gallium, as the trivalent part, contributes 3 /4 electrons and arsenic, as the pentavalent part, 5 /4 electrons. As an example, on the GaAs(1 1 0) surface, a filled As dangling bond requires two electrons and the Ga dangling bond has to be empty. The surface stoichiometry delivers 3 /4 electrons from Ga and 5 /4 electrons from As, so that the electron transfer during surface relaxation [49, 55] will fulfill the ECR (Eq. 2.1): electrons available : 3/4 e (Ga db ) + 5 /4 e (As db ) = 2 e (2.1) electrons required : 0 e (Ga db ) + 2 e (As db ) = 2 e Although the vast majority of stable surface configurations fulfill the ECR, it is only an indicating condition, as stable configurations that do not fulfill the ECR have been found as well . The determining factor is the minimization of surface free energy, which does not necessarily require a semiconducting surface The GaAs(0 0 1) surface Figure 2.3: (a) Top view and (b) side view of the GaAs(0 0 1) bulk-truncated surface. The surface unit cell is marked by a yellow square. The As dangling bonds are illustrated by gray ovals. Atoms below the figure plane are depicted by smaller circles. For reasons of clarity the lower Ga atom plane is not shown in the top view image.
24 24 2. Semiconductor surfaces properties and growth The bulk-truncated GaAs(0 0 1) surface, as shown in Fig. 2.3, is either group-iii or group- V terminated. To lower the surface energy, rearrangement processes of the surface atoms lead to surface reconstructions that minimize the number of dangling bonds. Thereby the GaAs(0 0 1) surface shows a large variety of reconstructions, depending on the ambient circumstances, reaching from highly Ga-rich to extremely As-rich stages . A schematic overview of the different reconstruction domains observed by RHEED is given in Fig In principle two growth regimes for epitaxial growth of InAs on the GaAs(0 0 1) surface exist, separated by the phase transition of the GaAs(0 0 1) surface reconstruction from the As-rich GaAs-c(4 4) reconstructed surface to the As-rich GaAs(0 0 1)-β2(2 4) reconstructed surface between C . However, this transition is not completely abrupt and thus hysteresis effects led to the assumption of an interstitial stage of (2 1) periodicity in the RHEED observations in Ref. . Recently, the co-existence of both the c(4 4) and the β2(2 4) reconstruction was observed during the phase transition. These STM studies found no evidence for a stable interstitial reconstruction . The c(4 4) and the β2(2 4) surface reconstructions are both of high relevance for applications and thus the basic substrate reconstructions for the studies in this work. Therefore both will be discussed here in more detail. Figure 2.4: The surface phase diagram of reconstruction phases observed by RHEED on GaAs(0 0 1) in relation to the substrate temperature T S and the As 4 /Ga flux ratio, published in Ref. . The narrow region of (2 1) structure between the c(4 4) and the (2 4) structure is ascribed to hysteresis effects of the transition.
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